公开(公告)号：US5978094A

公开(公告)日：1999-11-02

申请号：US940289

申请日：1997-09-30

申请人： Tsuyoshi Narabe ,  Kei Nara ,  Masamitsu Yanagihara

发明人： Tsuyoshi Narabe ,  Kei Nara ,  Masamitsu Yanagihara

IPC分类号： G01B11/27 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F7/70358 ,  G01B11/27 ,  G03F9/70

摘要： An alignment device includes an image pickup optical system for picking up an image of a first reference mark disposed on a mask and an image of a second reference mark disposed on a photosensitive substrate through an image pickup optical system, a memory for storing information associated with the imaging characteristics of the image pickup optical system, and a correction system for correcting the positions of the first and second reference marks, detected using image information from the image pickup system, on the basis of the information associated with the imaging characteristics of the image pickup optical system.

摘要翻译： 对准装置包括：图像拾取光学系统，用于拾取设置在掩模上的第一参考标记的图像和通过图像拾取光学系统设置在感光基板上的第二参考标记的图像;存储器，用于存储与 图像拾取光学系统的成像特性，以及用于校正使用来自图像拾取系统的图像信息检测的第一和第二参考标记的位置的校正系统，其基于与图像的成像特性相关联的信息 拾取光学系统。

公开(公告)号：US5760881A

公开(公告)日：1998-06-02

申请号：US540458

申请日：1995-10-10

申请人： Seiji Miyazaki ,  Kei Nara ,  Hiroshi Shirasu ,  Tsuyoshi Narabe

发明人： Seiji Miyazaki ,  Kei Nara ,  Hiroshi Shirasu ,  Tsuyoshi Narabe

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70216 ,  G03F7/70358 ,  G03F9/70

摘要： An exposure apparatus, having an illumination optical system for radiating a light beam from a light source to a pattern area of a mask for transferring the image of the pattern area onto a photosensitive substrate by the light beam passing through the mask, is provided with plural sets of a first reference mark and a second reference mark arranged on the mask and the photosensitive substrate at positions corresponding to each other, and a light-shielding device for shielding the light beams radiated toward the second reference marks, whereby it is possible to re-use the second reference marks in a post-process by preventing the first reference marks on the mask from being superposed on the second reference marks on the photosensitive substrate or from being transferred onto a part near the second reference marks.

摘要翻译： 一种曝光装置，具有照明光学系统，用于将来自光源的光束照射到掩模的图案区域，用于通过通过掩模的光束将图案区域的图像转印到感光基板上，具有多个 设置在彼此对应的位置处的掩模和感光基板上的第一参考标记和第二参考标记的集合，以及用于屏蔽朝向第二参考标记辐射的光束的遮光装置，由此可以重新 - 通过防止掩模上的第一参考标记叠加在感光基板上的第二参考标记上或者被转印到靠近第二参考标记的部分上，从而在后处理中使用第二参考标记。

公开(公告)号：US5625436A

公开(公告)日：1997-04-29

申请号：US689691

申请日：1996-08-13

申请人： Masamitsu Yanagihara ,  Susumu Mori ,  Tsuyoshi Naraki ,  Masami Seki ,  Seiji Miyazaki ,  Tsuyoshi Narabe ,  Hiroshi Chiba

发明人： Masamitsu Yanagihara ,  Susumu Mori ,  Tsuyoshi Naraki ,  Masami Seki ,  Seiji Miyazaki ,  Tsuyoshi Narabe ,  Hiroshi Chiba

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/70275 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70358 ,  G03F7/70858 ,  G03F7/70883 ,  G03F9/70

摘要： In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification.

摘要翻译： 在扫描型曝光装置中，通过以与所述掩模和所述基板相对于所述投影光学系统的倍率相对于投影光学系统沿预定方向扫描所述掩模上的图案区域的整个表面， 提供了多个照明光学系统，用于利用来自各个光源的各个光束照射掩模上的图案区域的各个区域; 多个投影光学系统被布置为对应于各个照明光学系统，所述投影光学系统将由各个照明光学系统照射的区域的各个图像投射到所述基板上的相应的投影区域上; 用于获取和存储基板的形状变化的存储装置; 放大率改变装置，用于根据基板的形状变化来改变至少一个投影光学系统的放大率; 以及成像位置改变装置，用于根据放大率的变化改变经由至少一个投影光学系统投影的所述图像的位置。

公开(公告)号：US5777722A

公开(公告)日：1998-07-07

申请号：US654382

申请日：1996-05-28

申请人： Seiji Miyazaki ,  Tsuyoshi Narabe ,  Kei Nara ,  Tomohide Hamada ,  Kazuaki Saiki ,  Hideji Goto ,  Muneyasu Yokota

发明人： Seiji Miyazaki ,  Tsuyoshi Narabe ,  Kei Nara ,  Tomohide Hamada ,  Kazuaki Saiki ,  Hideji Goto ,  Muneyasu Yokota

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/32 ,  G01B11/00

CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： A scanning exposure apparatus is arranged to illuminate a mask, to project an image of the mask through a projection optical system onto a photosensitive substrate, and to move the mask and the photosensitive substrate relative to the projection optical system, thereby effecting exposure of an entire surface of the mask on the photosensitive substrate, and the exposure apparatus comprises a position detector which detects a relative positional relation between the mask and the photosensitive substrate; a memory which stores positional information obtained by the position detector; a position correcting device which corrects the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory device; and a controller which makes the position detector detect the relative positional relation between the mask and the photosensitive substrate while the mask and the photosensitive substrate are carried past a projection region of the projection optical system to an exposure start position, and makes the position correcting device correct the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory, while the mask and the photosensitive substrate are stopped at the exposure start position and/or during the exposure.

摘要翻译： 扫描曝光装置被布置为照亮掩模，通过投影光学系统将光掩模的图像投射到感光基板上，并且使掩模和感光基板相对于投影光学系统移动，从而实现整个曝光 感光基板上的掩模表面，曝光装置包括检测掩模和感光基板之间的相对位置关系的位置检测器; 存储器，其存储由所述位置检测器获取的位置信息; 基于从存储装置读出的位置信息来校正掩模和感光基板之间的相对位置关系的位置校正装置; 以及控制器，其使得位置检测器在将掩模和感光基板通过投影光学系统的投影区域到曝光开始位置时检测掩模和感光基板之间的相对位置关系，并使位置校正装置 基于从存储器读出的位置信息，掩模和感光基板在曝光开始位置和/或曝光期间停止时，校正掩模和感光基板之间的相对位置关系。

公开(公告)号：US5850279A

公开(公告)日：1998-12-15

申请号：US619981

申请日：1996-03-20

申请人： Kei Nara ,  Masaki Kato ,  Kinya Kato ,  Tsuyoshi Narabe

发明人： Kei Nara ,  Masaki Kato ,  Kinya Kato ,  Tsuyoshi Narabe

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G01B11/00

CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： Disclosed is a projection exposure method for transferring a pattern formed on a mask onto a photosensitive substrate through a projection optical system. A light beam having a first wavelength for exposure is radiated through the projection optical system onto a first mark area including a fiducial mark on a fiducial plate installed on a substrate stage, reflected light from the first mark area is detected to obtain a position of the fiducial mark. A light beam having a second wavelength to which the photosensitive substrate is not photosensitive is radiated through the projection optical system onto the first mark area, reflected light from the first mark area is detected to obtain a position of the fiducial mark. A positional discrepancy of the fiducial mark caused by the difference in wavelength between the first and second wavelengths is previously calculated on the basis of results of the detection. The light beam having the second wavelength is radiated through the projection optical system onto an alignment mark on the photosensitive substrate, reflected light therefrom is detected to obtain a position of the photosensitive substrate under the light beam having the second wavelength. A positional discrepancy of the photosensitive substrate is corrected on the basis of a result of the detection and the calculation, and thus positional alignment for the photosensitive substrate is performed, followed by actual exposure.

摘要翻译： 公开了一种投影曝光方法，用于通过投影光学系统将形成在掩模上的图案转印到感光基板上。 将具有用于曝光的第一波长的光束通过投影光学系统辐射到安装在基板台上的基准板上的包括基准标记的第一标记区域上，检测来自第一标记区域的反射光， 基准标记。 具有感光基片不感光的第二波长的光束通过投影光学系统辐射到第一标记区域上，检测来自第一标记区域的反射光以获得基准标记的位置。 基于检测结果预先计算由第一和第二波长之间的波长差导致的基准标记的位置偏差。 具有第二波长的光束通过投影光学系统辐射到感光基板上的对准标记上，检测其反射光，以获得具有第二波长的光束下的感光基板的位置。 基于检测和计算的结果校正感光性基板的位置偏差，由此进行感光性基板的位置对准，然后实际曝光。

公开(公告)号：US5798822A

公开(公告)日：1998-08-25

申请号：US950964

申请日：1997-10-15

申请人： Seiji Miyazaki ,  Hiroshi Shirasu ,  Kazuaki Saiki ,  Tsuyoshi Narabe

发明人： Seiji Miyazaki ,  Hiroshi Shirasu ,  Kazuaki Saiki ,  Tsuyoshi Narabe

IPC分类号： G03F7/207 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G01B11/00

CPC分类号： G03F7/70691 ,  G03F7/70358 ,  G03F9/7026

摘要： A pair of reference plates is so arranged as to have a predetermined positional relationship on a carriage that integrally holds a mask and a photosensitive substrate such that the mask and the photosensitive substrate oppose each other on two sides of a projecting optical system. By periodically detecting the positional relationship between the reference plates in the optical axis direction, a variation with time occurring in the detection characteristics of position detecting devices is detected. Both stable image formation characteristics and a high throughput are realized by correcting a driving signal to be supplied to a driving device in accordance with the detected variation.

摘要翻译： 一对参考板被布置为在一体地保持掩模和感光基板的托架上具有预定的位置关系，使得掩模和感光基板在投影光学系统的两侧彼此相对。 通过周期性地检测基准板在光轴方向上的位置关系，检测位置检测装置的检测特性中随时间的变化。 通过根据检测到的变化来校正要提供给驱动装置的驱动信号，实现稳定的图像形成特性和高吞吐量。

公开(公告)号：US5617211A

公开(公告)日：1997-04-01

申请号：US515783

申请日：1995-08-16

申请人： Kei Nara ,  Toshio Matsuura ,  Muneyasu Yokota ,  Yukio Kakizaki ,  Yoshio Fukami ,  Seiji Miyazaki ,  Tsuyoshi Narabe

发明人： Kei Nara ,  Toshio Matsuura ,  Muneyasu Yokota ,  Yukio Kakizaki ,  Yoshio Fukami ,  Seiji Miyazaki ,  Tsuyoshi Narabe

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B11/00 ,  G01U21/86 ,  G06K7/015 ,  G03B27/52

CPC分类号： G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： This invention relates to an exposure apparatus for synchronously scanning a mask and a photosensitive substrate with respect to a plurality of projection optical systems, thereby properly transferring an entire pattern area on the mask onto the photosensitive substrate. A plurality of sets of mask-side reference marks and substrate-side reference marks are arranged at positions corresponding to each other on the mask surface and the photosensitive substrate surface and at least at two positions conjugate with the plurality of projection optical systems. The displacement amount between an image of a mask-side reference mark or a substrate-side reference mark formed on the corresponding substrate-side reference mark or mask-side reference mark through the projection optical system and the position of the substrate-side reference mark and the mask-side reference mark is measured. The imaging characteristics of the plurality of projection optical systems are corrected in accordance with the displacement amount.

摘要翻译： 本发明涉及一种用于相对于多个投影光学系统同时扫描掩模和感光基板的曝光装置，从而将掩模上的整个图案区域适当地转印到感光基板上。 多个掩模侧参考标记和基板侧参考标记组被布置在掩模表面和感光基板表面上并且至少在与多个投影光学系统共轭的两个位置处彼此对应的位置处。 掩模侧基准标记的图像或通过投影光学系统形成在相应的基板侧参考标记或掩模侧参考标记上的基板侧参考标记之间的位移量和基板侧参考标记的位置 并且测量掩模侧参考标记。 根据位移量校正多个投影光学系统的成像特性。