公开(公告)号：US09298111B2

公开(公告)日：2016-03-29

申请号：US13405882

申请日：2012-02-27

申请人： Viktor Kulitzki ,  Bernhard Gellrich ,  Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Peter Deufel ,  Andreas Wurmbrand

发明人： Viktor Kulitzki ,  Bernhard Gellrich ,  Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Peter Deufel ,  Andreas Wurmbrand

IPC分类号： G03B27/52 ,  G03B27/54 ,  G03B27/32 ,  G03F7/20 ,  G02B7/00

CPC分类号： G03F7/70916 ,  G02B7/00 ,  G03F7/70233 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70891

摘要： An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement.

摘要翻译： 光学装置包括多个光学元件和承载光学元件的载体结构。 载体结构由至少两个可释放地互连的模块组成。 每个模块由至少一个载体结构子元件组成。 子载体由多个载体结构子元件和/或模块产生。 子结构具有至少在区域中对应于投影曝光装置中的可用光束路径而变化的几何形状，可用光束路径被定义为可以在场平面中从所有场点传播的所有光束的包络 到投影曝光装置的像平面。 用于EUV光刻的投影曝光装置包括这种光学装置。