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公开(公告)号：US09411250B2
公开(公告)日：2016-08-09
申请号：US13062872
申请日：2009-04-30
Applicant: Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Vladimir Mihailovitch Krivtsun
Inventor： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Vladimir Mihailovitch Krivtsun
CPC classification number: G03F7/70916 , G03F7/70175 , G03F7/70858 , G03F7/70983 , H05G2/003 , H05G2/005
Abstract: A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector.
Abstract translation: 辐射系统被配置为产生辐射束。 辐射系统包括被配置为产生发射辐射和碎屑的等离子体的辐射源，以及被配置为将收集的辐射引导到辐射束发射孔径的辐射收集器。 磁场发生器被配置为产生具有磁场强度梯度的磁场，以将等离子体引导离开辐射收集器。
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公开(公告)号：US20110170079A1
公开(公告)日：2011-07-14
申请号：US13062872
申请日：2009-04-30
Applicant: Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Vladimir Mihailovitch Krivtsun
Inventor： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Vladimir Mihailovitch Krivtsun
CPC classification number: G03F7/70916 , G03F7/70175 , G03F7/70858 , G03F7/70983 , H05G2/003 , H05G2/005
Abstract: A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector.
Abstract translation: 辐射系统被配置为产生辐射束。 辐射系统包括被配置为产生发射辐射和碎屑的等离子体的辐射源，以及被配置为将收集的辐射引导到辐射束发射孔径的辐射收集器。 磁场发生器被配置为产生具有磁场强度梯度的磁场，以将等离子体引导离开辐射收集器。
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公开(公告)号：US20100002211A1
公开(公告)日：2010-01-07
申请号：US12484812
申请日：2009-06-15
Applicant: Denis GLUSHKOV , Vadim Yevgenyevich BANINE , Vladimir Vitalevich IVANOV , Konstantin Nikolaevich KOSHELEV , Givi Georgievich ZUKAKISHVILI , Vladimir Mihailovitch KRIVTSUN , Yurii Victorovitch SIDELNIKOV , Kurt GIELISSEN , Oleg YAKUSHEV
Inventor： Denis GLUSHKOV , Vadim Yevgenyevich BANINE , Vladimir Vitalevich IVANOV , Konstantin Nikolaevich KOSHELEV , Givi Georgievich ZUKAKISHVILI , Vladimir Mihailovitch KRIVTSUN , Yurii Victorovitch SIDELNIKOV , Kurt GIELISSEN , Oleg YAKUSHEV
CPC classification number: H05G2/003 , G03F7/70033 , H05G2/008
Abstract: A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.
Abstract translation: 放电产生的等离子体辐射源包括激光束脉冲发生器，其被配置为提供激光束脉冲以触发放电产生的等离子体辐射源的等离子体中的夹点。 激光束脉冲发生器被布置成提供具有大于对于给定放电能量的给定波长的辐射的最大输出的最佳激光束脉冲能量的能量的激光束脉冲。
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公开(公告)号：US20080142736A1
公开(公告)日：2008-06-19
申请号：US11637936
申请日：2006-12-13
Applicant: Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailovitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer
Inventor： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailovitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer
CPC classification number: G03F7/70933 , G03F7/70858 , G03F7/70883 , G03F7/70916 , G03F7/70925 , G03F7/70983 , H05G2/003 , H05G2/005
Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.
Abstract translation: 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。
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5.发明授权Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby 有权辐射发生器件，光刻设备，器件制造方法和由此制造的器件公开(公告)号：US07335900B2
公开(公告)日：2008-02-26
申请号：US11178597
申请日：2005-07-12
Applicant: Konstantin Nikolaevitch Koshelev , Vladimir Vitalevitch Ivanov , Evgenii Dmitreevitch Korob , Givi Georgievitch Zukavishvili , Robert Rafilevitch Gayazov , Vladimir Mihailovitch Krivtsun
Inventor： Konstantin Nikolaevitch Koshelev , Vladimir Vitalevitch Ivanov , Evgenii Dmitreevitch Korob , Givi Georgievitch Zukavishvili , Robert Rafilevitch Gayazov , Vladimir Mihailovitch Krivtsun
IPC: H01J65/04
Abstract: A device for generating radiation or a source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories of the material may be elongated. A laser may be used to cause the discharge more easily. The laser may be directed on the anode of cathode or on a separate material located in between the anode and cathode.
Abstract translation: 基于放电产生辐射或源的装置包括阴极和阳极。 阴极和阳极材料以流体状态供应。 当设备使用时，该材料形成等离子体夹紧。 可选地，可以使用喷嘴来供应材料。 阴极和/或阳极可以形成平坦表面。 材料的轨迹可以是细长的。 可以使用激光器来使放电更容易。 激光可以被引导到阴极的阳极或位于阳极和阴极之间的单独的材料上。
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Patent Agency Ranking
公开(公告)号：US08755032B2
公开(公告)日：2014-06-17
申请号：US13063139
申请日：2009-07-21
Applicant: Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Dzmitry Labetski
Inventor： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Dzmitry Labetski
CPC classification number: G03F7/70933 , G03F7/70033 , G03F7/70916 , G03F7/70983 , H05G2/003
Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.
Abstract translation: 辐射源被配置成产生极紫外辐射。 辐射源包括位于燃料将被辐射束接触以形成等离子体的位置处的等离子体形成位置，被配置为允许气体离开辐射源的出口以及至少部分地位于内部的污染阱 出口。 污染阱被配置成捕集在形成等离子体时产生的碎屑颗粒。
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公开(公告)号：US08598550B2
公开(公告)日：2013-12-03
申请号：US13365758
申请日：2012-02-03
Applicant: Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Johannes Bernardus Ridder , Harm-Jan Voorma , Carolus Ida Maria Antonius Spee , Klaas Timmer
Inventor： Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Johannes Bernardus Ridder , Harm-Jan Voorma , Carolus Ida Maria Antonius Spee , Klaas Timmer
IPC: G03B7/20
CPC classification number: G03B7/20 , B08B7/00 , G01J1/0271 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G03F7/70975
Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
Abstract translation: 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。
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公开(公告)号：US20120307224A1
公开(公告)日：2012-12-06
申请号：US13578468
申请日：2010-12-08
Applicant: Andrei Mikhailovich Yakunin , Vladimir Mihailovitch Krivtsun , Viacheslav Medvedev , Alexandre Kodentsov
Inventor： Andrei Mikhailovich Yakunin , Vladimir Mihailovitch Krivtsun , Viacheslav Medvedev , Alexandre Kodentsov
CPC classification number: G03F7/70191 , G02B5/201 , G02B5/208 , G03F7/70575 , G03F7/70916 , G03F7/70958
Abstract: A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from tungsten-molybdenum alloy or a molybdenum-rhenium alloy or a tungsten-rhenium alloy or a tungsten-molybdenum-rhenium alloy.
Abstract translation: 光谱纯度滤光器包括一组材料，多个孔通过它们延伸。 孔被布置成抑制具有第一波长的辐射并且允许具有第二波长的辐射的至少一部分透射通过孔。 辐射的第二波长比辐射的第一波长短。 材料体由钨钼合金或钼 - 铼合金或钨 - 铼合金或钨 - 钼 - 铼合金形成。
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9.发明申请APPARATUS WITH PLASMA RADIATION SOURCE AND METHOD OF FORMING A BEAM OF RADIATION AND LITHOGRAPHIC APPARATUS 失效具有等离子体辐射源的装置和形成辐射和光刻装置的光束的方法公开(公告)号：US20110013167A1
公开(公告)日：2011-01-20
申请号：US12890256
申请日：2010-09-24
Applicant: Vladimir Mihailovitch KRIVTSUN , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Evgeny Dmitrievich Korop , Konstantin Nikolaevich Koshelev , Yurii Victorovitch Sidelnikov , Oleg Yakushev
Inventor： Vladimir Mihailovitch KRIVTSUN , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Evgeny Dmitrievich Korop , Konstantin Nikolaevich Koshelev , Yurii Victorovitch Sidelnikov , Oleg Yakushev
CPC classification number: G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70858 , G03F7/70883 , G03F7/70983
Abstract: An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.
Abstract translation: 一种用于形成电磁辐射束的装置。 该装置包括等离子体辐射源，设置有基本上平行于来自等离子体源的辐射方向延伸的多个薄箔的箔陷阱以及设置在等离子体辐射源和箔捕获器之间的栅格。 一个空间位于网格和箔陷阱之间。 构造并布置电位施加电路以向电网施加电势，使得电网排斥由等离子体辐射源发射的电子，并在栅格和箔陷阱之间产生正空间电荷，以偏转由等离子体辐射发射的离子 来源于箔陷阱。 栅格和箔阱之间的距离至少等于箔阱的半径的一半。
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公开(公告)号：US07872244B2
公开(公告)日：2011-01-18
申请号：US11889065
申请日：2007-08-08
Applicant: Vladimir Vitalevich Ivanov , Vadim Yevgenyevich Banine , Arno Jan Bleeker , Konstantin Nikolaevich Koshelev , Pavel Stanislavovich Antsiferov , Vladimir Mihailovitch Krivtsun , Dmitriy Victorovich Lopaev
Inventor： Vladimir Vitalevich Ivanov , Vadim Yevgenyevich Banine , Arno Jan Bleeker , Konstantin Nikolaevich Koshelev , Pavel Stanislavovich Antsiferov , Vladimir Mihailovitch Krivtsun , Dmitriy Victorovich Lopaev
CPC classification number: H05G2/003 , B82Y10/00 , G03F7/70033 , H05G2/005
Abstract: A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.
Abstract translation: 公开了一种被配置为产生用于光刻设备的辐射的源。 源包括阳极和阴极。 阴极和阳极被配置为在阳极和阴极之间的放电空间中的燃料中产生放电，以便产生等离子体，阴极和阳极相对于彼此定位，使得在使用中，电流线延伸 在阳极和阴极之间基本上是弯曲的，从而产生基本上径向压缩等离子体的力，仅在接近阴极或阳极的上表面的区域中。
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