LED chip
    1.
    发明授权
    LED chip 有权
    LED芯片

    公开(公告)号:US08299488B2

    公开(公告)日:2012-10-30

    申请号:US12970194

    申请日:2010-12-16

    申请人: Wen-Kun Yang

    发明人: Wen-Kun Yang

    IPC分类号: H01L33/00

    摘要: The present invention provides a LED chip structure. The LED chip structure comprises a substrate and an N type layer disposed on the substrate; a P type layer disposed on the N type layer; a N type contact pad and a P type contact pad disposed below the substrate; conductive through holes disposed through the substrate to electrically connect the N type layer to the N type contact pad and the P type layer to the conduct heat generated by the P type layer and the N type layer downward.

    摘要翻译: 本发明提供一种LED芯片结构。 LED芯片结构包括衬底和设置在衬底上的N型层; 设置在N型层上的P型层; N型接触焊盘和设置在基板下方的P型接触焊盘; 导电通孔设置在基板上,以将N型层与N型接触焊盘和P型层电连接,以将P型层和N型层向下发生传导热。

    METHOD OF PLASMA ETCHING WITH PATTERN MASK
    7.
    发明申请
    METHOD OF PLASMA ETCHING WITH PATTERN MASK 审中-公开
    等离子体蚀刻与图案掩模的方法

    公开(公告)号:US20080268647A1

    公开(公告)日:2008-10-30

    申请号:US12134249

    申请日:2008-06-06

    IPC分类号: H01L21/302

    CPC分类号: H01L21/321 H01L21/31144

    摘要: The present invention provides a method of plasma etching with pattern mask. There are two different devices in the two section of a wafer, comprising silicon and Gallium Arsenide (GaAs). The Silicon section is for general semiconductor. And the GaAs section is for RF device. The material of pad in the silicon is usually metal, and metal oxide is usually formed on the pads. The metal oxide is unwanted for further process; therefore it should be removed by plasma etching process. A film is attached to the surface of the substrate exposing the area need for etching. Then a mask is attached and aligned onto the film therefore exposing the area need for etching. Then plasma dry etching is applied on the substrate for removing the metal oxide.

    摘要翻译: 本发明提供了一种使用图案掩模进行等离子体蚀刻的方法。 在晶片的两个部分中有两种不同的器件,包括硅和砷化镓(GaAs)。 硅部分用于一般半导体。 而GaAs部分用于RF器件。 硅中的焊盘材料通常是金属,金属氧化物通常形成在焊盘上。 金属氧化物对于进一步的处理是不需要的; 因此应该通过等离子体蚀刻工艺去除。 将膜附着到衬底的表面,暴露出需要蚀刻的区域。 然后将掩模附着并对准到膜上,从而暴露该区域对蚀刻的需要。 然后在衬底上施加等离子体干蚀刻以去除金属氧化物。