Method for providing a resistive lens structure for an electron beam
device
    1.
    发明授权
    Method for providing a resistive lens structure for an electron beam device 失效
    提供电子束装置的电阻透镜结构的方法

    公开(公告)号:US6048244A

    公开(公告)日:2000-04-11

    申请号:US017095

    申请日:1998-02-02

    摘要: A method for providing a resistive focusing lens structure for an electron beam device including forming a suspension of particles of a mixture of, by weight, of about 33-50% of an oxidic conductive material including about 40-60% of a lead ruthenate, about 25-38% of a lead titanate and about 2-15% of a ruthenium oxide, and of about 50-67% of a glass including about 30-40% of silicon dioxide (SiO.sub.2), about 3-7.5% alumina (Al.sub.2 O.sub.3), and about 53-67% of lead oxide (PbO) in a suspending medium consisting essentially of a non-acidic liquid having a boiling point of less than 150.degree. C., applying the suspension to an inside surface of a glass member to thereby provide a coating of the particles on the inside surface, firing the coating at a temperature of 700-900.degree. C. and before of after firing the coating, patterning the coating. The present method provides highly reproducible resistive focusing lens structures.

    摘要翻译: 一种用于提供用于电子束装置的电阻聚焦透镜结构的方法,包括形成重量比约33-50%的包含约40-60%的钌酸铅的氧化性导电材料的混合物的混合物的悬浮液, 约25-38%的钛酸铅和约2-15%的氧化钌和约50-67%的玻璃,包括约30-40%的二氧化硅(SiO 2),约3-7.5%的氧化铝( Al 2 O 3)和约53-67%的氧化铅(PbO),其基本上由沸点小于150℃的非酸性液体组成的悬浮介质中,将悬浮液施加到玻璃构件的内表面 从而在内表面上提供颗粒的涂层,在700-900℃的温度下焙烧涂层,并在烧制涂层之后,对涂层进行图案化。 本方法提供高度可重现的电阻聚焦透镜结构。