Abstract:
An embedded chip substrate includes a first insulation layer, a core layer, a chip, a second insulation layer, a first circuit layer, and a second circuit layer. The core layer disposed on the first insulation layer has an opening that exposes a portion of the first insulation layer. The chip is adhered into a recess constructed by the opening and the first insulation layer. The second insulation layer is disposed on the core layer for covering the chip. The first circuit layer is disposed at the outer side of the first insulation layer located between the first circuit layer and the core layer. The second circuit layer is disposed at the outer side of the second insulation layer located between the second circuit layer and the core layer. The first circuit layer is electrically connected to the second circuit layer that is electrically connected to the chip.
Abstract:
A wafer level package including a shield connected to a plurality of conductive elements disposed on a silicon wafer. The conductive elements are arranged to individually enclose micro-structure elements located on the silicon wafer within cavities formed by the conductive elements for better shielding performance. The shield and the conductive elements function as the EMI shield.
Abstract:
The present invention relates to a semiconductor device and method for manufacturing the same. The semiconductor device includes a substrate, a dielectric layer, a metal layer, an interconnection metal and an insulation circular layer. The substrate has at least one through hole. The dielectric layer is disposed adjacent to the substrate. The metal layer is disposed adjacent to the dielectric layer. The interconnection metal is disposed in the at least one through hole. An insulation circular layer surrounds the interconnection metal, wherein the insulation layer has an upper surface and the upper surface contacts the dielectric layer. Whereby, the metal layer can be electrically connected to another surface of the substrate through the interconnection metal.
Abstract:
A semiconductor package structure and a package method thereof are provided. The semiconductor package structure includes a substrate, a sensing chip, a first patterned conductive layer and a electrical connection portion. The substrate has an accommodating portion, a first surface and a second surface opposite to the first surface. The accommodating portion are extended to the second surface from the first surface.
Abstract:
A method for manufacturing a circuit board includes the following steps. First, a core layer is provided, wherein the core layer includes a first dielectric layer, and first and second metallic layers. A through hole is formed in the core layer. The core layer is disposed on a supporting plate, and an embedded component is disposed in the through hole, wherein the second metallic layer contacts the supporting plate, and the embedded component has at least one electrode contacting the supporting plate. The embedded component is mounted in the through hole. The supporting plate is removed. The first and second metallic layers are removed, and the thickness of the electrode of the embedded component is decreased. Third and fourth metallic layers are formed respectively, wherein the fourth metallic layer is electrically connected to the electrode of the embedded component. Finally, the third and fourth metallic layers are patterned so as to respectively form first and second patterned circuit layers.
Abstract:
A method for manufacturing a circuit board includes the following steps. First, a core layer is provided, wherein the core layer includes a first dielectric layer, and first and second metallic layers. A through hole is formed in the core layer. The core layer is disposed on a supporting plate, and an embedded component is disposed in the through hole, wherein the second metallic layer contacts the supporting plate, and the embedded component has at least one electrode contacting the supporting plate. The embedded component is mounted in the through hole. The supporting plate is removed. The first and second metallic layers are removed, and the thickness of the electrode of the embedded component is decreased. Third and fourth metallic layers are formed respectively, wherein the fourth metallic layer is electrically connected to the electrode of the embedded component. Finally, the third and fourth metallic layers are patterned so as to respectively form first and second patterned circuit layers.
Abstract:
A package structure with an embedded capacitor, a fabricating process thereof and applications of the same are provided, wherein the package structure includes a dielectric layer, a first conductive layer, a second conductive layer, a first embedded plate and a second embedded plate. The dielectric layer has a thickness. The first conductive layer with a first potential is located on one side of the dielectric layer. The second conductive layer with a second potential is located on the dielectric layer at the other side thereof opposite to the first conductive layer. The first embedded plate and the second embedded plate that are embedded in the dielectric layer are separated at a distance, wherein the first embedded plate is electrically connected with the first conductive layer, and the second embedded plate is electrically connected with the second conductive layer.
Abstract:
A substrate with an embedded passive element and methods for manufacturing the same are provided, wherein the substrate includes an interlayer circuit board having a first conductive circuit, a dielectric layer, a first electrode, a second electrode, and a second conductive circuit. The dielectric layer formed on the interlayer circuit board has a first recess and a second recess for respectively accommodating the first electrode and the second electrode. The embedded passive element is formed by the first electrode, the second electrode, and the dielectric layer between the first electrode and the second electrode. The second conductive circuit electrically connects the first electrode and the second electrode.
Abstract:
A package structure with an embedded die includes a core layer, a first build-up wiring structure, and a second build-up wiring structure. The core layer has a first surface and a second surface opposite thereto. Besides, the core layer includes a first dielectric layer, a leadframe, a die, a first signal layer, and a second signal layer. The die is disposed on and electrically connected to the leadframe. The die and the leadframe are embedded in the first dielectric layer. The first signal layer is disposed on an upper surface of the first dielectric layer and electrically connected to the leadframe. The second signal layer is disposed on a bottom surface of the first dielectric layer and electrically connected to the leadframe. The first and the second build-up wiring structures are disposed on the first and the second surfaces of the core layer, respectively.
Abstract:
A package structure with an embedded die includes a core layer, a first build-up wiring structure, and a second build-up wiring structure. The core layer has a first surface and a second surface opposite thereto. Besides, the core layer includes a first dielectric layer, a leadframe, a die, a first signal layer, and a second signal layer. The die is disposed on and electrically connected to the leadframe. The die and the leadframe are embedded in the first dielectric layer. The first signal layer is disposed on an upper surface of the first dielectric layer and electrically connected to the leadframe. The second signal layer is disposed on a bottom surface of the first dielectric layer and electrically connected to the leadframe. The first and the second build-up wiring structures are disposed on the first and the second surfaces of the core layer, respectively.