Hologram plate and its fabrication process
    1.
    发明申请
    Hologram plate and its fabrication process 有权
    全息图及其制作工艺

    公开(公告)号:US20050100796A1

    公开(公告)日:2005-05-12

    申请号:US11007355

    申请日:2004-12-09

    IPC分类号: G03H1/20 G03H1/30 G03H1/04

    摘要: The invention provides a hologram plate which is used with the double-focus replication process, and which is integrated with a spacer to impart marring resistance thereto, and is integrated with a light absorbing layer to allow zero-order light and first-order light to have substantially the same intensity. This hologram plate 42 comprises an array of collective element holograms for diffracting parallel light incident thereon at a specific wavelength and a specific incident angle in such a way that the light is converged onto a specific focal length position. The hologram plate 42 is a multilayer structure made up of a first transparent substrate 31, a hologram layer 32, an adhesive layer 33 and a second transparent substrate 41. The second transparent substrate 42 defines a surface in contact with a hologram photosensitive material 53 during hologram replication.

    摘要翻译: 本发明提供了一种全息图板,其与双焦点复制工艺一起使用,并且与间隔物集成以赋予其耐擦伤性,并与光吸收层集成,以使零级光和一级光 具有基本相同的强度。 该全息图板42包括用于以特定波长和特定入射角衍射入射在其上的平行光的聚集元件全息图阵列,使得光会聚到特定焦距位置。 全息图板42是由第一透明基板31,全息图层32,粘合层33和第二透明基板41构成的多层结构。第二透明基板42限定与全息感光材料53接触的表面 全息图复制。

    Hologram plate and its fabrication process
    2.
    发明授权
    Hologram plate and its fabrication process 有权
    全息图及其制作工艺

    公开(公告)号:US06714329B2

    公开(公告)日:2004-03-30

    申请号:US09765373

    申请日:2001-01-22

    IPC分类号: G03H130

    摘要: The invention provides a hologram plate which is used with the double-focus replication process, and which is integrated with a spacer to impart marring resistance thereto, and is integrated with a light absorbing layer to allow zero-order light and first-order light to have substantially the same intensity. This hologram plate 42 comprises an array of collective element holograms for diffracting parallel light incident thereon at a specific wavelength and a specific incident angle in such a way that the light is converged onto a specific focal length position. The hologram plate 42 is a multilayer structure made up of a first transparent substrate 31, a hologram layer 32, an adhesive layer 33 and a second transparent substrate 41. The second transparent substrate 42 defines a surface in contact with a hologram photosensitive material 53 during hologram replication.

    摘要翻译: 本发明提供了一种全息图板,其与双焦点复制工艺一起使用,并且与间隔物集成以赋予其耐擦伤性,并与光吸收层集成,以使零级光和一级光 具有基本相同的强度。 该全息图板42包括用于以特定波长和特定入射角衍射入射在其上的平行光的聚集元件全息图阵列,使得光会聚到特定焦距位置。 全息图板42是由第一透明基板31,全息图层32,粘合层33和第二透明基板41构成的多层结构。第二透明基板42限定与全息感光材料53接触的表面 全息图复制。

    Hologram plate and its fabrication process
    4.
    发明申请
    Hologram plate and its fabrication process 审中-公开
    全息图及其制作工艺

    公开(公告)号:US20060176533A1

    公开(公告)日:2006-08-10

    申请号:US11396557

    申请日:2006-04-04

    IPC分类号: G03H1/30

    摘要: The invention provides a hologram plate which is used with the double-focus replication process, and which is integrated with a spacer to impart marring resistance thereto, and is integrated with a light absorbing layer to allow zero-order light and first-order light to have substantially the same intensity. This hologram plate 42 comprises an array of collective element holograms for diffracting parallel light incident thereon at a specific wavelength and a specific incident angle in such a way that the light is converged onto a specific focal length position. The hologram plate 42 is a multilayer structure made up of a first transparent substrate 31, a hologram layer 32, an adhesive layer 33 and a second transparent substrate 41. The second transparent substrate 42 defines a surface in contact with a hologram photosensitive material 53 during hologram replication.

    摘要翻译: 本发明提供了一种全息图板,其与双焦点复制工艺一起使用,并且与间隔物集成以赋予其耐擦伤性,并与光吸收层集成,以使零级光和一级光 具有基本相同的强度。 该全息图板42包括用于以特定波长和特定入射角衍射入射在其上的平行光的聚集元件全息图阵列,使得光会聚到特定焦距位置。 全息图板42是由第一透明基板31,全息图层32,粘合层33和第二透明基板41构成的多层结构。 第二透明基板42在全息图复制期间限定与全息感光材料53接触的表面。