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11 条记录 (耗时 0.012 秒)

    Sulfonium salts
    4.
    发明申请
    Sulfonium salts 失效
    锍盐

    公开(公告)号：US20070219368A1

    公开(公告)日：2007-09-20

    申请号：US11724221

    申请日：2007-03-15

    申请人： Jun Iwabuchi ,  Yosuke Osawa

    发明人： Jun Iwabuchi ,  Yosuke Osawa

    IPC分类号： C07D285/00 ,  C07C319/00

    CPC分类号： C07C381/12 ,  C07D285/16

    摘要： The present invention provides a sulfonium salt which can serve as a photo-acid-generator, the sulfonium salt not raising the problem of poor compatibility to a photoresist polymer having an acid-dissociable group. The sulfonium salt is represented by formula (1): wherein R1 represents a linear or branched C2 to C9 divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a linear or branched C1 to C3 hydrocarbon group; each of R6 and R7 represents an organic group; R6 and R7 may be linked together to form a divalent organic group; and X− represents an anion.

    摘要翻译： 本发明提供可用作光酸产生剂的锍盐，锍盐不会引起与具有酸解离性基团的光致抗蚀剂聚合物的相容性差。 锍盐由式（1）表示：其中R 1表示直链或支链C 2至C 9二价烃基; R 2至R 5中的每一个表示氢原子或直链或支链C 1至C 3烃基; R 6和R 7中的每一个表示有机基团; R 6和R 7可以连接在一起形成二价有机基团; 而X - > - 表示阴离子。

    Photosensitive resin, and photosensitive composition
    6.
    发明授权
    Photosensitive resin, and photosensitive composition 有权
    感光树脂和感光组合物

    公开(公告)号：US07858287B2

    公开(公告)日：2010-12-28

    申请号：US11947850

    申请日：2007-11-30

    申请人： Takeo Watanabe ,  Hiroo Kinoshita ,  Shinichi Yusa ,  Tomotaka Yamanaka ,  Masamichi Hayakawa ,  Yosuke Osawa ,  Satoshi Ogi ,  Yoshitaka Komuro

    发明人： Takeo Watanabe ,  Hiroo Kinoshita ,  Shinichi Yusa ,  Tomotaka Yamanaka ,  Masamichi Hayakawa ,  Yosuke Osawa ,  Satoshi Ogi ,  Yoshitaka Komuro

    IPC分类号： G03F7/004 ,  G03F7/028 ,  G03F7/039 ,  G08F12/30

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123

    摘要： A photosensitive resin realizes formation of a pattern having a good shape, without introducing poor compatibility between an acid generator and a photoresist primary-component polymer having an acid-dissociable group, and a photosensitive composition containing the photosensitive resin. The photosensitive resin includes a repeating unit represented by formula (1): (wherein R1 represents a C2-C9 linear or branched divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a C1-C3 linear or branched hydrocarbon group; each of R6 and R7 represents an organic group, wherein R6 and R7 may together form a divalent organic group; and X−represents an anion); at least one of a repeating unit represented by formula (2): (wherein R8 represents a C2-C9 linear or branched hydrocarbon group) and a repeating unit represented by formula (3): a repeating unit represented by formula (4): optionally, a repeating unit represented by formula (5).

    摘要翻译： 感光性树脂可以形成具有良好形状的图案，而不会导致酸产生剂和具有酸解离基团的光致抗蚀剂初级组分聚合物之间的相容性差，以及含有感光性树脂的感光性组合物。 光敏树脂包括由式（1）表示的重复单元：（其中R1表示C2-C9直链或支链二价烃基; R2至R5各自表示氢原子或C1-C3直链或支链烃基; R6和R7表示有机基团，其中R6和R7可以一起形成二价有机基团; X代表阴离子）; 由式（2）表示的重复单元中的至少一种：其中R8表示C2-C9直链或支链烃基）和由式（3）表示的重复单元：式（4）表示的重复单元：任选地 ，式（5）表示的重复单元。

    Sulfonium salts
    7.
    发明授权
    Sulfonium salts 失效
    锍盐

    公开(公告)号：US07396960B2

    公开(公告)日：2008-07-08

    申请号：US11724221

    申请日：2007-03-15

    申请人： Jun Iwabuchi ,  Yosuke Osawa

    发明人： Jun Iwabuchi ,  Yosuke Osawa

    IPC分类号： C07D285/00 ,  C07C319/00

    CPC分类号： C07C381/12 ,  C07D285/16

    摘要： The present invention provides a sulfonium salt which can serve as a photo-acid-generator, the sulfonium salt not raising the problem of poor compatibility to a photoresist polymer having an acid-dissociable group. The sulfonium salt is represented by formula (1): wherein R1 represents a linear or branched C2 to C9 divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a linear or branched C1 to C3 hydrocarbon group; each of R6 and R7 represents an organic group; R6 and R7 may be linked together to form a divalent organic group; and X− represents an anion.

    摘要翻译： 本发明提供可用作光酸产生剂的锍盐，锍盐不会引起与具有酸解离性基团的光致抗蚀剂聚合物的相容性差。 锍盐由式（1）表示：其中R 1表示直链或支链C 2至C 9二价烃基; R 2至R 5中的每一个表示氢原子或直链或支链C 1至C 3烃基; R 6和R 7中的每一个表示有机基团; R 6和R 7可以连接在一起形成二价有机基团; 而X - > - 表示阴离子。

    PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION
    10.
    发明申请
    PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION 有权
    感光树脂和感光性组合物

    公开(公告)号：US20090142697A1

    公开(公告)日：2009-06-04

    申请号：US11947850

    申请日：2007-11-30

    申请人： Takeo Watanabe ,  Hiroo Kinoshita ,  Shinichi Yusa ,  Tomotaka Yamanaka ,  Masamichi Hayakawa ,  Yosuke Osawa ,  Satoshi Ogi ,  Yoshitaka Komuro

    发明人： Takeo Watanabe ,  Hiroo Kinoshita ,  Shinichi Yusa ,  Tomotaka Yamanaka ,  Masamichi Hayakawa ,  Yosuke Osawa ,  Satoshi Ogi ,  Yoshitaka Komuro

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123

    摘要： To provide a photosensitive resin which realizes formation of a pattern having a good shape, without involving a problem in terms of poor compatibility between an acid generator and a photoresist primary-component polymer having an acid dissociable group, and a photosensitive composition containing the photosensitive resin.The photosensitive resin includes a repeating unit represented by formula (1): (wherein R1 represents a C2-C9 linear or branched divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a C1-C3 linear or branched hydrocarbon group; each of R6 and R7 represents an organic group, wherein R6 and R7 may together form a divalent organic group; and X− represents an anion); at least one of a repeating unit represented by formula (2): (wherein R8 represents a C2-C9 linear or branched hydrocarbon group) and a repeating unit represented by formula (3): a repeating unit represented by formula (4): optionally, a repeating unit represented by formula (5).

    摘要翻译： 为了提供形成具有良好形状的图案的感光性树脂，不会引起酸产生剂和具有酸解离基团的光致抗蚀剂初级组分聚合物之间的相容性差，并且含有感光性树脂的感光性组合物 。 光敏树脂包括由式（1）表示的重复单元：（其中R1表示C2-C9直链或支链二价烃基; R2至R5各自表示氢原子或C1-C3直链或支链烃基; R6和R7表示有机基团，其中R6和R7可以一起形成二价有机基团; X代表阴离子）; 由式（2）表示的重复单元中的至少一种：其中R8表示C2-C9直链或支链烃基）和由式（3）表示的重复单元：式（4）表示的重复单元：任选地 ，式（5）表示的重复单元。