摘要:
A substrate holder positioning method, capable of positioning a substrate holder without using any positioning jig, includes: measuring a first position of a substrate held on a substrate holder included in a substrate carrying mechanism; carrying the substrate held on the substrate holder to a substrate rotating unit for holding and rotating the substrate; turning the substrate held by the substrate rotating unit through a predetermined angle by the substrate rotating unit; transferring the substrate turned by the substrate rotating unit from the substrate rotating unit to the substrate holder; measuring a second position of the substrate transferred from the substrate rotating unit to the substrate holder; determining the position of the center of rotation of the substrate rotating unit on the basis of the first and the second position; and positioning the substrate holder on the basis of the position of the center of rotation.
摘要:
A transfer point of a transfer arm is detected accurately and stably by using a position detecting wafer having an electrostatic capacitance sensor. A position detecting wafer S is formed in a wafer shape transferable by a transfer arm 20 and includes an electrostatic capacitance sensor 50 for detecting a relative position with respect to a reference object by detecting an electrostatic capacitance in relation with the reference object for a position detection. The electrostatic capacitance sensor 50 includes a detection electrode 52 for forming the electrostatic capacitance in relation with the reference object, and the detection electrode 52 is installed on a rear surface of a main body of the wafer shape. Installed on the main body is a guard electrode 100 covering the detecting electrode 52 when viewed from a front surface thereof, for blocking an electric field oriented toward the detection electrode 52 from the front surface.
摘要:
A substrate processing apparatus can align a substrate with a high precision and a high speed by monitoring a mark formed on a surface of the substrate; operating an amount of misalignment between the center of the substrate and a rotation center of a substrate support member; determining a presence of the misalignment and adjusting the substrate such that the center of the substrate coincides with the rotation center of the substrate support member.
摘要:
A position alignment of a transfer point of a transfer arm is performed by using a position detecting method. The method includes: detecting electrostatic capacitances in relation with a reference object for position alignment by a plurality of electrostatic capacitance detecting electrodes provided on a surface of the substrate body; communicating with each electrostatic capacitance detecting electrode and controlling a detection of each electrostatic capacitance detecting electrode; and calculating coordinates (x, y) of the reference object with respect to the substrate body based on a preset relationship between electrostatic capacitance values of multiple electrostatic capacitance detecting electrodes and a position of the reference object with respect to the substrate body.
摘要:
A substrate transfer apparatus includes forks that are vertically spaced apart from each other with a predetermined distance. When the forks take out the substrates from the first substrate containing part, each of the forks lifts the substrate and supports the same by moving upward from a pre-loading position located below the substrate to be taken out by a predetermined unloading stroke amount. A value of the predetermined distance is set to be equal to the sum of the distance between the substrates contained in the first substrate containing part and the unloading stroke amount.
摘要:
A process block including a group of liquid-process related unit blocks, a first heating-process related block arranged on a carrier block side of the group of unit blocks, and a second heating-process related block arranged on an interface block side of the group of unit blocks. The group of liquid-process unit blocks includes doubled unit blocks for preprocessing for forming an antireflection film and a resist film, doubled unit blocks for post-processing for forming an upper layer film and performing a cleaning operation before exposure, and a unit block for developing. The first heating-process related block heats a substrate coated with a resist liquid and a substrate that has been developed. The second heating-process related block heats a substrate that has been exposed but is not yet developed, a substrate on which an antireflection film has been formed and a substrate on which an upper layer film has been formed.
摘要:
A substrate transfer apparatus includes forks that are vertically spaced apart from each other with a predetermined distance. When the forks take out the substrates from the first substrate containing part, each of the forks lifts the substrate and supports the same by moving upward from a pre-loading position located below the substrate to be taken out by a predetermined unloading stroke amount. A value of the predetermined distance is set to be equal to the sum of the distance between the substrates contained in the first substrate containing part and the unloading stroke amount.
摘要:
A position alignment of a transfer point of a transfer arm is performed by using a position detecting method. The method includes: detecting electrostatic capacitances in relation with a reference object for position alignment by a plurality of electrostatic capacitance detecting electrodes provided on a surface of the substrate body; communicating with each electrostatic capacitance detecting electrode and controlling a detection of each electrostatic capacitance detecting electrode; and calculating coordinates (x, y) of the reference object with respect to the substrate body based on a preset relationship between electrostatic capacitance values of multiple electrostatic capacitance detecting electrodes and a position of the reference object with respect to the substrate body.
摘要:
A process block including a group of liquid-process related unit blocks, a first heating-process related block arranged on a carrier block side of the group of unit blocks, and a second heating-process related block arranged on an interface block side of the group of unit blocks. The group of liquid-process unit blocks includes doubled unit blocks for preprocessing for forming an antireflection film and a resist film, doubled unit blocks for post-processing for forming an upper layer film and performing a cleaning operation before exposure, and a unit block for developing. The first heating-process related block heats a substrate coated with a resist liquid and a substrate that has been developed. The second heating-process related block heats a substrate that has been exposed but is not yet developed, a substrate on which an antireflection film has been formed and a substrate on which an upper layer film has been formed.
摘要:
A substrate transfer apparatus includes forks that are vertically spaced apart from each other with a predetermined distance. When the forks take out the substrates from the first substrate containing part, each of the forks lifts the substrate and supports the same by moving upward from a pre-loading position located below the substrate to be taken out by a predetermined unloading stroke amount. A value of the predetermined distance is set to be equal to the sum of the distance between the substrates contained in the first substrate containing part and the unloading stroke amount.