公开(公告)号：US09632431B2

公开(公告)日：2017-04-25

申请号：US11812919

申请日：2007-06-22

Applicant: Yuichi Shibazaki

Inventor： Yuichi Shibazaki

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/70666 ,  G03F7/70733 ,  Y10T29/49155

Abstract: A lithographic apparatus includes a substrate table capable of holding a substrate, a projection system that projects a patterned beam of radiation onto the substrate held by the substrate table, and a sensor table that is not capable of holding a substrate but that includes a sensor capable of sensing a property of the patterned beam of radiation. In addition, a first positioning system is connected to the substrate table and displaces the substrate table into and out of a path of the patterned beam of radiation, and a second positioning system is capable of positioning the sensor table into the path of the patterned beam of radiation when the substrate table is displaced out of the path of the patterned beam of radiation.

公开(公告)号：US09081301B2

公开(公告)日：2015-07-14

申请号：US13363079

申请日：2012-01-31

Applicant: Yuichi Shibazaki

Inventor： Yuichi Shibazaki

IPC: G01B11/00 ,  G03B27/32 ,  G03B27/42 ,  G03B27/58 ,  G03B27/62 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70775 ,  G01B21/042 ,  G03F7/70341 ,  G03F7/70483 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70975 ,  G03F9/70 ,  G03F9/7046 ,  G03F9/7049 ,  H01L21/68 ,  H01L21/681 ,  Y10T29/49002

Abstract: A controller measures positional information of a stage within an XY plane using three encoders which at least include one each of an X encoder and a Y encoder of an encoder system, and the stage is driven in the XY plane, based on measurement results of the positional information and positional information (p1, q1), (p2, q2), and (p3, q3) in a surface parallel to the XY plane of a head (an encoder) used for measurement of the positional information. Accordingly, it becomes possible to control the movement of the stage with good precision, while switching the head (the encoder) used for control during the movement of the stage using the encoder system which includes a plurality of heads.

Abstract translation: 控制器使用至少包括编码器系统的X编码器和Y编码器中的每一个的三个编码器来测量XY平面内的台的位置信息，并且基于测量结果，在XY平面中驱动该平台 在与用于测量位置信息的头（编码器）的XY平面平行的表面中的位置信息和位置信息（p1，q1），（p2，q2）和（p3，q3）。 因此，在使用包括多个头的编码器系统的台架移动期间切换用于控制的头（编码器）的同时，可以高精度地控制台的移动。

公开(公告)号：US08860925B2

公开(公告)日：2014-10-14

申请号：US11896577

申请日：2007-09-04

Applicant: Yuichi Shibazaki

Inventor： Yuichi Shibazaki

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70975 ,  Y10T29/49117

Abstract: A controller inclines a movable body with respect to an XY plane at an angle α in a periodic direction of a grating, based on a measurement value of an interferometer which measures an angle of inclination of the movable body to the XY plane, and based on a measurement value of an encoder system and information of angle α before and after the inclination, and computes an Abbe offset quantity of the grating surface with respect to a reference surface (e.g., an image plane of a projection optical system) which serves as a reference for position control of the movable body in the XY plane. Then, the controller drives the movable body, based on positional information of the movable body in the XY plane measured by the encoder system and a measurement error of the encoder system corresponding to an angle of inclination of the movable body to the XY plane due to the Abbe offset quantity of the grating surface.

Abstract translation: 控制器基于测量可移动体与XY平面的倾斜角度的干涉仪的测量值，相对于XY平面在光栅的周期方向上以角度α倾斜移动体，并且基于 编码器系统的测量值和倾斜前后的角度α的信息，并且计算相对于参考表面（例如，投影光学系统的像面）的光栅表面的阿贝偏移量，其作为 参考用于XY平面中可动体的位置控制。 然后，控制器基于由编码器系统测量的XY平面中的可移动体的位置信息和与可移动体相对于XY平面的倾斜角相对应的编码器系统的测量误差驱动可移动体，由于 光栅表面的阿贝偏移量。

公开(公告)号：US08711327B2

公开(公告)日：2014-04-29

申请号：US12331863

申请日：2008-12-10

Applicant: Yuichi Shibazaki

Inventor： Yuichi Shibazaki

IPC: G03B27/42 ,  G03B27/58

CPC classification number: G03F7/70775 ,  G03F7/70733

Abstract: Two X encoder heads (X heads) and one Y head are mounted on one wafer stage, and an X scale and a Y scale corresponding to these heads are arranged on a surface facing the wafer stage so that the scales connect the exposure area and the alignment area. The wafer stage is made to move back and forth between the exposure area and the alignment area along a path where the X scale and the Y scale are set, while performing position measurement using three encoder heads. In this case, a switching process between XZ interferometer will not be necessary.

Abstract translation: 两个X编码器头（X头）和一个Y头安装在一个晶片台上，并且与这些磁头相对应的X刻度和Y刻度布置在面向晶片台的表面上，使得刻度尺连接曝光区域和 对齐区域。 在使用三个编码器头执行位置测量的同时，使晶片台沿着X标尺和Y标尺设置的路径在曝光区域和对准区域之间来回移动。 在这种情况下，不需要XZ干涉仪之间的切换处理。

公开(公告)号：US08668191B2

公开(公告)日：2014-03-11

申请号：US13317994

申请日：2011-11-02

Applicant: Yuichi Shibazaki

Inventor： Yuichi Shibazaki

IPC: B25B11/00 ,  H01L39/24

CPC classification number: G03F7/70758 ,  G03F7/70816 ,  Y10T29/49014 ,  Y10T29/49998 ,  Y10T29/53961

Abstract: Because an electromagnetic chuck supplies current to a specific microcoil among a plurality of microcoils and makes an object exert an electromagnetic force working together with a magnet of the object, the object can be held in a state where the object is set at a desired position (a position that corresponds to the microcoil to which current has been supplied) on a base surface. Further, by gas that blows out from a gas supply passage, a levitation force is given to the object, which can reduce effects of a friction force that acts between the object and an upper surface of the electromagnetic chuck when the position of the object is set.

Abstract translation: 由于电磁卡盘将电流供给到多个微线圈之间的特定微线圈，并且使物体施加与物体的磁体一起工作的电磁力，所以可以将物体保持在将物体设置在期望位置的状态（ 一个对应于已经供应了电流的微线圈的位置）。 此外，通过从气体供给通道吹出的气体，向物体施加悬浮力，当物体的位置为物体时，这可以降低作用在物体与电磁卡盘的上表面之间的摩擦力的影响 组。

公开(公告)号：US08553204B2

公开(公告)日：2013-10-08

申请号：US12782310

申请日：2010-05-18

Applicant: Yuichi Shibazaki

Inventor： Yuichi Shibazaki

IPC: G03B27/58 ,  G03B27/42 ,  G01B11/14 ,  G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70775 ,  G03F7/7085

Abstract: A fine movement stage is driven by a controller, based on positional information of the fine movement stage in a measurement direction measured by a measurement system and correction information of a measurement error caused by a tilt of the fine movement stage included in the positional information. Accordingly, driving the fine movement stage with high precision becomes possible, which is not affected by a measurement error included in the positional information in a measurement direction of the measurement system that occurs due to a tilt of the fine movement stage.

Abstract translation: 基于由测量系统测量的测量方向上的精细运动级的位置信息和由位置信息中包括的微动台的倾斜引起的测量误差的校正信息，由控制器驱动精细运动级。 因此，可以高精度地进行微动作阶段的驱动，不会受到微小移动台的倾斜而导致的测量系统的测量方向上的位置信息中包含的测量误差的影响。

公开(公告)号：US08514373B2

公开(公告)日：2013-08-20

申请号：US12805945

申请日：2010-08-25

Applicant: Yuichi Shibazaki

Inventor： Yuichi Shibazaki

IPC: G02B27/58 ,  G02B27/42 ,  G01B11/14 ,  G03F7/20

CPC classification number: G03F7/70775 ,  G01D5/266 ,  G01D5/305 ,  G03F7/70758

Abstract: A laser beam emitted by an encoder main body enters a wafer table via a PBS from the outside, and reaches a grating at a point that is located right under exposure area, and is diffracted by the grating. Then, by receiving interference light of a first polarized component that has returned from the grating and a second polarized component reflected by the PBS, positional information of the wafer table is measured. Accordingly, because the first polarized component, which has passed through PBS passes through the wafer table until it is synthesized with the second polarized component again, does not proceed through the atmosphere outside, position measurement of the wafer table can be performed with high precision without the measurement beam being affected by the fluctuation of the atmosphere around the wafer table.

Abstract translation: 由编码器主体发射的激光束经由PBS从外部进入晶片台，并且在位于曝光区域正下方的点处到达光栅，并被光栅衍射。 然后，通过接收从光栅返回的第一偏振分量的干涉光和由PBS反射的第二偏振分量，测量晶片台的位置信息。 因此，由于通过PBS的第一偏振分量通过晶片台直到与第二偏振分量再次合成，所以不会通过外部的大气进行，所以可以高精度地进行晶片台的位置测量而没有 测量光束受到晶片台周围大气的波动的影响。

公开(公告)号：US20130188159A1

公开(公告)日：2013-07-25

申请号：US13520963

申请日：2010-12-28

Applicant: Yuichi Shibazaki

Inventor： Yuichi Shibazaki

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A liquid immersion member forms a liquid immersion space between the member and a movable object such that an optical path of exposure light is filled with liquid. The liquid immersion member includes: a first plate that is disposed at least partially around the optical path; a second plate that is disposed at least partially around the optical path, and has an upper surface, opposed to at least a part of a lower surface of the first plate, and a lower surface which can be opposed to the object; and a collection port that is disposed outside the first plate with respect to the optical path, can be at least partially opposed to the object, and collects at least some of the liquid from a first space, which the upper surface of the second plate faces, and a second space which the lower surface of the second plate faces.

Abstract translation: 液浸构件在构件和可移动物体之间形成液浸空间，使得曝光光的光路充满液体。 液浸部件包括：至少部分地设置在光路周围的第一板; 第二板，其至少部分地设置在光路周围，并且具有与第一板的下表面的至少一部分相对的上表面和可与物体相对的下表面; 并且相对于光路设置在第一板的外侧的收集口可以至少部分地与物体相对，并且从第二板的上表面的第一空间收集至少一些液体 以及第二板的下表面面对的第二空间。

公开(公告)号：US08358401B2

公开(公告)日：2013-01-22

申请号：US12385577

申请日：2009-04-13

Applicant: Yuichi Shibazaki ,  Hiromitsu Yoshimoto

Inventor： Yuichi Shibazaki ,  Hiromitsu Yoshimoto

IPC: G03B27/62 ,  G03B27/58 ,  G03B27/68 ,  G03B27/42

CPC classification number: G03F7/70783

Abstract: An exposure apparatus comprises a stage main body having a mounting surface, and a correcting mechanism that corrects a shape of the mounting surface.

Abstract translation: 曝光装置包括具有安装表面的台主体和校正安装表面的形状的校正机构。

公开(公告)号：US20120224158A1

公开(公告)日：2012-09-06

申请号：US13469828

申请日：2012-05-11

Applicant: Yuichi SHIBAZAKI

Inventor： Yuichi SHIBAZAKI

IPC: G03B27/42

CPC classification number: G03F7/70775 ,  G03F7/70341 ,  G03F7/70516 ,  G03F7/70725 ,  G03F7/70975 ,  Y10T29/49002 ,  Y10T29/49105 ,  Y10T29/49826

Abstract: A drive unit drives a wafer stage in a Y-axis direction based on a measurement value of an encoder that measures position information of the wafer stage in the Y-axis direction and based on information on the flatness of a scale that is measured by the encoder. In this case, the drive unit can drive the wafer stage in a predetermined direction based on a measurement value after correction in which a measurement error caused by the flatness of the scale included in the measurement value of the encoder is corrected based on the information on the flatness of the scale. Accordingly, the wafer stage can be driven with high accuracy in a predetermined direction using the encoder, without being affected by the unevenness of the scale.