公开(公告)号：US20240151520A1

公开(公告)日：2024-05-09

申请号：US18536402

申请日：2023-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Franciscus Godefridus Casper BIJNEN ,  Junichi KANEHARA ,  Stefan Carolus Jacobus Antonius KEIJ ,  Thomas Augustus MATTAAR ,  Petrus Franciscus VAN GILS

IPC: G01B11/27

CPC classification number: G01B11/272

Abstract: In order to improve the throughput performance and/or economy of a measurement apparatus, the present disclosure provides a metrology apparatus including: a first measuring apparatus; a second measuring apparatus; a first substrate stage configured to hold a first substrate and/or a second substrate; a second substrate stage configured to hold the first substrate and/or the second substrate; a first substrate handler configured to handle the first substrate and/or the second substrate; and a second substrate handler configured to handle the first substrate and/or the second substrate, wherein the first substrate is loaded from a first, second or third FOUP, wherein the second substrate is loaded from the first, second or third FOUP, wherein the first measuring apparatus is an alignment measuring apparatus, and wherein the second measuring apparatus is a level sensor, a film thickness measuring apparatus or a spectral reflectance measuring apparatus.

公开(公告)号：US20220260933A1

公开(公告)日：2022-08-18

申请号：US17628959

申请日：2020-07-16

Applicant: ASML NETHERLANDS B.V.

Inventor： István NAGY ,  Özer DUMAN ,  Arjan GIJSBERTSEN ,  Pieter Jacob HERES ,  Rudolf Michiel HERMANS ,  Erik JANSEN ,  Thomas Augustus MATTAAR ,  Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Petrus Franciscus VAN GILS

IPC: G03F9/00

Abstract: A method of determining a mark measurement sequence for an object comprising a plurality of marks, the method including: receiving location data for the plurality of marks that are to be measured; obtaining a boundary model of a positioning device used for performing the mark measurement sequence; and determining the mark measurement sequence based on the location data and the boundary model.

公开(公告)号：US20210381826A1

公开(公告)日：2021-12-09

申请号：US17412525

申请日：2021-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Franciscus Godefridus Casper BIJNEN ,  Junichi KANEHARA ,  Stefan Carolus Jacobus Antonius KEIJ ,  Thomas Augustus MATTAAR ,  Petrus Franciscus VAN GILS

IPC: G01B11/27

Abstract: In order to improve the throughput performance and/or economy of a measurement apparatus, the present disclosure provides a metrology apparatus including: a first measuring apparatus; a second measuring apparatus; a first substrate stage configured to hold a first substrate and/or a second substrate; a second substrate stage configured to hold the first substrate and/or the second substrate; a first substrate handler configured to handle the first substrate and/or the second substrate; and a second substrate handler configured to handle the first substrate and/or the second substrate, wherein the first substrate is loaded from a first, second or third FOUP, wherein the second substrate is loaded from the first, second or third FOUP, wherein the first measuring apparatus is an alignment measuring apparatus, and wherein the second measuring apparatus is a level sensor, a film thickness measuring apparatus or a spectral reflectance measuring apparatus.

公开(公告)号：US20180321592A1

公开(公告)日：2018-11-08

申请号：US15768446

申请日：2016-08-22

Applicant: ASML NETHERLANDS B.V

Inventor： Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Victor Manuel BLANCO CARBALLO ,  Thomas Augustus MATTAAR ,  Johannes Cornelis Paulus MELMAN ,  Gerben PIETERSE ,  Johannes Theodorus Guillielmus Maria VAN DE VEN ,  Jan-Piet VAN DE VEN ,  Petrus Franciscus VAN GILS

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70725

Abstract: A route for a substrate support that supports a substrate in an immersion lithographic apparatus is calculated to satisfy the following constraints: after the edge of the substrate first contacts the immersion space, the substrate remains in contact with the immersion space until all target portions are exposed; exposures of target portions are performed while the substrate moves in a scan direction; and all movements of the substrate between exposures are, in a plane parallel to its upper surface, either curved or only in one of the scan directions or transverse directions. In order to reduce exposure defects at the edge of the substrate the outside portion of the substrate is avoided from being exposed to the immersion liquid. The transfer routes are designed to overly the substrate surface.