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公开(公告)号：US20240085796A1
公开(公告)日：2024-03-14
申请号：US18380439
申请日：2023-10-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Dzmitry LABETSKI , Christianus Wilhelmus Johannes BERENDSEN , Rui Miguel DUARTE RODRIGUES NUNES , Alexander Igorevich ERSHOV , Kornelis Frits FEENSTRA , Igor Vladimirovich FOMENKOV , Klaus Martin HUMMLER , Arun JOHNKADAKSHAM , Matthias KRAUSHAAR , Andrew David LAFORGE , Marc Guy LANGLOIS , Maksim LOGINOV , Yue MA , Seyedmohammad MOJAB , Kerim NADIR , Alexander SHATALOV , John Tom STEWART , Henricus Gerardus TEGENBOSCH , Chunguang XIA
CPC classification number: G03F7/70033 , G03F7/70916 , H05G2/003 , H05G2/008
Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
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公开(公告)号：US20200089124A1
公开(公告)日：2020-03-19
申请号：US16469689
申请日：2018-01-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Dzmitry LABETSKI , Christianus Wilhelmus Johanne BERENDSEN , Rui Miguel DUARTE RODRIGES NUNES , Alexander Igorevich ERSHOV , Kornelis Frits FEENSTRA , Igor Vladimirovich FOMENKOV , Klaus Martin HUMMLER , Arun JOHNKADAKSHAM , Matthias KRAUSHAAR , Andrew David LAFORGE , Marc Guy LANGLOIS , Maksim LOGINOV , Yue MA , Seyedmohammad MOJAB , Kerim NADIR , Alexander SHATALOV , John Tom STEWART (IV) , Henricus Gerardus TEGENBOSCH , Chunguang XIA
Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
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公开(公告)号：US20210141311A1
公开(公告)日：2021-05-13
申请号：US17155951
申请日：2021-01-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Dzmitry LABETSKI , Christianus Wilhelmus Johannes BERENDSEN , Rui Miguel DUARTE RODRIGUES NUNES , Alexander Igorevich ERSHOV , Kornelis Frits FEENSTRA , Igor Vladimirovich FOMENKOV , Klaus Martin HUMMLER , Arun JOHNKADAKSHAM , Matthias KRAUSHAAR , Andrew David LAFORGE , Marc Guy LANGLOIS , Maksim LOGINOV , Yue MA , Seyedmohammad MOJAB , Kerim NADIR , Alexander SHATALOV , John Tom STEWART , Henricus Gerardus TEGENBOSCH , Chunguang XIA
Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
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4.发明申请
公开(公告)号：US20190200442A1
公开(公告)日：2019-06-27
申请号：US16274378
申请日：2019-02-13
Applicant: ASML Netherlands B.V.
Inventor： Alexander Igorevich ERSHOV , David Evans , Matthew Graham
CPC classification number: H05G2/006 , G03F7/2008 , G03F7/70 , G03F7/70033 , H05G2/005 , H05G2/008
Abstract: A device and method are disclosed in which a source material delivery system can be reoriented so that the path of the source material is not directly towards an irradiation region in operating conditions in which the path is expected to be unpredictable. A shroud provided to protect the flow of source material from being disrupted is segmented so with one part of the shroud being movable with respect to another part of the shroud so that the movable part can avoid interfering with the path of the source material when it is not directly towards the irradiation region.
