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公开(公告)号：US20160179015A1
公开(公告)日：2016-06-23
申请号：US15054010
申请日：2016-02-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Wilhelmus POLET , Henrikus Herman Marie COX , Ronald VAN DER HAM , Wilhelmus Franciscus Johannes SIMONS , Jimmy Matheus Wilhelmus VAN DE WINKEL , Gregory Martin Mason CORCORAN , Frank Johannes Jacobus VAN BOXTEL
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70758 , G03F7/70783
Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.
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2.发明申请POSITIONING SYSTEM, A LITHOGRAPHIC APPARATUS AND A METHOD FOR POSITIONAL CONTROL 有权定位系统，平面设备和位置控制方法
公开(公告)号：US20160077450A1
公开(公告)日：2016-03-17
申请号：US14956110
申请日：2015-12-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans BUTLER , Henrikus Herman Marie COX
IPC: G03F7/20
CPC classification number: G03F7/70775 , G03B27/53 , G03B27/58 , G03F7/70725
Abstract: A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error; wherein the measurement coordinate is different from the control coordinate.
Abstract translation: 一种用于控制光刻设备的第一部件和第二部件之间的相对位置的定位系统，其中每个部件的位置由一组正交坐标定义，所述定位系统包括：测量装置，其被配置为确定 相对于测量坐标中的设定点位置的部件之一的瞬时位置; 以及控制器，被配置为基于所确定的误差来控制所述另一部件在控制坐标中的移动; 其中测量坐标与控制坐标不同。
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公开(公告)号：US20170357165A1
公开(公告)日：2017-12-14
申请号：US15687938
申请日：2017-08-28
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf KEMPER , Henrikus Herman Marie COX , Sjored Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Franciscus Johannes Herman Maria TEUNISSEN , Jan-Gerard Cornelis VAN DER TOORN , Martinus Cornelis Maria VERHAGEN , Stefan Philip Christiaan BELFROID , Johannes Petrus Maria SMEULERS , Herman VOGEL
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号：US20160299440A1
公开(公告)日：2016-10-13
申请号：US15184770
申请日：2016-06-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Henrikus Herman Marie COX , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Joeri LOF , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Johannes Catharinus Hubertus MULKENS , Gerardus Petrus Matthijs VAN NUNEN , Klaus SIMON , Bernardus Antonius SLAGHEKKE , Alexander STRAAIJER , Jan-Gerard Cornelis VAN DER TOORN , Martijn HOUKES
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US20180046089A1
公开(公告)日：2018-02-15
申请号：US15790287
申请日：2017-10-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Henrikus Herman Marie COX , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Joeri LOF , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEDLEN , Johannes Catharinus Hubertus MULKENS , Gerardus Petrus Matthijs VAN NUNEN , Klaus SIMON , Bernardus Antonius SLAGHEKKE , Alexander STRAAIJER , Jan-Gerard Cornelis VAN DER TOORN , Martijn HOUKES
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US20170031250A1
公开(公告)日：2017-02-02
申请号：US15293009
申请日：2016-10-13
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf KEMPER , Henrikus Herman Marie COX , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Franciscus Johannes Herman Maria TEUNISSEN , Jan-Gerard Cornelis VAN DER TOORN , Martinus Cornelis Maria VERHAGEN , Stefan Philip Christiaan BELFROID , Johannes Petrus Maria SMEULERS , Herman VOGEL
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
Abstract translation: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号：US20160004172A1
公开(公告)日：2016-01-07
申请号：US14766112
申请日：2014-02-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Henrikus Herman Marie COX
IPC: G03F7/20
CPC classification number: G03F7/70633 , G03F7/70725 , G05B19/402
Abstract: A position control system includes a position measurement system including a first position measurement configuration arranged to determine a position of an object in a first operating area and a second position measurement configuration to determine a position of the object in a second operating area; and a control unit configured to control a position of the object, the control unit including a first and a second controller, the first and second controllers being arranged to convert an input signal representing a position of the object to a respectively first and second control signal, the control unit being arranged to determine a combined control signal for controlling the position of the object in an overlapping area of the first and second operating area, wherein the combined control signal is obtained by applying a continuous weight function to the first and second control signal.
Abstract translation: 位置控制系统包括位置测量系统，该位置测量系统包括布置成确定第一操作区域中的物体的位置的第一位置测量配置和用于确定所述物体在第二操作区域中的位置的第二位置测量配置; 以及控制单元，被配置为控制所述物体的位置，所述控制单元包括第一和第二控制器，所述第一和第二控制器被布置为将表示所述物体的位置的输入信号转换成分别的第一和第二控制信号 所述控制单元被配置为确定用于控制所述物体在所述第一和第二操作区域的重叠区域中的位置的组合控制信号，其中通过对所述第一和第二控制应用连续加权函数来获得所述组合控制信号， 信号。
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公开(公告)号：US20170045831A1
公开(公告)日：2017-02-16
申请号：US15333044
申请日：2016-10-24
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf KEMPER , Henrikus Herman Marie COX , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Martinus Hendrikus Antonius LEENDERS , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Joost Jeroen OTTENS , Franciscus Johannes Herman Maria TEUNISSEN , Jan-Gerard Cornelis VAN DER TOORN , Martinus Cornelis Maria VERHAGEN , Marco POLIZZI , Edwin Augustinus Matheus VAN GOMPEL , Johannes Petrus Maria SMEULERS , Stefan Philip Christiaan BELFROID , Herman VOGEL
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号：US20150323876A1
公开(公告)日：2015-11-12
申请号：US14806395
申请日：2015-07-22
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf KEMPER , Henrikus Herman Marie COX , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Martinus Hendrikus Antonius LEENDERS , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Joost Jeroen OTTENS , Franciscus Johannes Herman Maria TEUNISSEN , Jan-Gerard Cornelis VAN DER TOORN , Martinus Cornelis Maria VERHAGEN , Marco POLIZZI , Edwin Augustinus Matheus VAN GOMPEL , Johannes Petrus Maria SMEULERS , Stefan Philip Christiaan BELFROID , Herman VOGEL
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
