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公开(公告)号：US20210141311A1
公开(公告)日：2021-05-13
申请号：US17155951
申请日：2021-01-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Dzmitry LABETSKI , Christianus Wilhelmus Johannes BERENDSEN , Rui Miguel DUARTE RODRIGUES NUNES , Alexander Igorevich ERSHOV , Kornelis Frits FEENSTRA , Igor Vladimirovich FOMENKOV , Klaus Martin HUMMLER , Arun JOHNKADAKSHAM , Matthias KRAUSHAAR , Andrew David LAFORGE , Marc Guy LANGLOIS , Maksim LOGINOV , Yue MA , Seyedmohammad MOJAB , Kerim NADIR , Alexander SHATALOV , John Tom STEWART , Henricus Gerardus TEGENBOSCH , Chunguang XIA
Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
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公开(公告)号：US20240085796A1
公开(公告)日：2024-03-14
申请号：US18380439
申请日：2023-10-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Dzmitry LABETSKI , Christianus Wilhelmus Johannes BERENDSEN , Rui Miguel DUARTE RODRIGUES NUNES , Alexander Igorevich ERSHOV , Kornelis Frits FEENSTRA , Igor Vladimirovich FOMENKOV , Klaus Martin HUMMLER , Arun JOHNKADAKSHAM , Matthias KRAUSHAAR , Andrew David LAFORGE , Marc Guy LANGLOIS , Maksim LOGINOV , Yue MA , Seyedmohammad MOJAB , Kerim NADIR , Alexander SHATALOV , John Tom STEWART , Henricus Gerardus TEGENBOSCH , Chunguang XIA
CPC classification number: G03F7/70033 , G03F7/70916 , H05G2/003 , H05G2/008
Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
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公开(公告)号：US20200089124A1
公开(公告)日：2020-03-19
申请号：US16469689
申请日：2018-01-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Dzmitry LABETSKI , Christianus Wilhelmus Johanne BERENDSEN , Rui Miguel DUARTE RODRIGES NUNES , Alexander Igorevich ERSHOV , Kornelis Frits FEENSTRA , Igor Vladimirovich FOMENKOV , Klaus Martin HUMMLER , Arun JOHNKADAKSHAM , Matthias KRAUSHAAR , Andrew David LAFORGE , Marc Guy LANGLOIS , Maksim LOGINOV , Yue MA , Seyedmohammad MOJAB , Kerim NADIR , Alexander SHATALOV , John Tom STEWART (IV) , Henricus Gerardus TEGENBOSCH , Chunguang XIA
Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
