-
公开(公告)号：US20230251407A1
公开(公告)日：2023-08-10
申请号：US18003301
申请日：2021-06-17
Applicant: ASML Netherlands B.V.
Inventor： Derick Yun Chek Chong , Wouter Joep ENGELEN , Vyacheslav KACHKANOV , Vahid MOHAMMADI , Pieter Cristiaan DE GROOT
CPC classification number: G02B5/1866 , G02B5/1857 , G03F7/70158 , G03F7/706 , G03F7/7085 , G02B2207/107
Abstract: A transmissive diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises an absorbing layer. The diffraction grating is for use with radiation having a first wavelength (for example (EUV radiation). The absorbing layer is provided with a two-dimensional array of through-apertures. The absorbing layer is formed from a material which has a refractive index for the radiation having the first wavelength in the range 0.% to 1.04.
-
公开(公告)号：US20240385356A1
公开(公告)日：2024-11-21
申请号：US18559942
申请日：2022-04-28
Applicant: ASML NETHERLANDS B.V
Inventor： Derick Yun Chek CHONG , Pieter Cristiaan DE GROOT , Wouter Joep ENGELEN , Bogathi Vishnu, Vardhana REDDY
Abstract: Diffraction gratings for a phase-stepping measurement system for determining an aberration map for a projection system are disclosed. The gratings are two-dimensional diffraction gratings for use as wafer level gratings in an EUV lithographic apparatus. In particular, the diffraction gratings include a substrate provided with a two-dimensional array of circular through-apertures and are self-supporting. In some embodiments, a ratio of the radius of the circular apertures to the distance between the centers of adjacent apertures may be selected to minimize the gain and cross-talk errors of a wavefront reconstruction algorithm. For example, the ratio may be between 0.34 and 0.38. In some embodiments, the circular apertures are distributed such that a distance between the centers of adjacent apertures is non-uniform and varies across the diffraction grating. For example, a local pitch of the grating may vary randomly across the diffraction grating.
-
公开(公告)号：US20190324365A1
公开(公告)日：2019-10-24
申请号：US16502674
申请日：2019-07-03
Applicant: ASML Netherlands B.V.
Inventor： Pieter Cristiaan DE GROOT , Gerard Frans Jozef SCHASFOORT , Maksym Yuriiovych SLADKOV , Manfred Petrus Johannes M DIKKERS , Jozef Maria FINDERS , Pieter-Jan VAN ZWOL , Johannes Jacobus Matheus BASELMANS , Stefan Michael Bruno BAUMER , Laurentius Cornelius DE WINTER , Wouter Joep ENGELEN , Marcus Adrianus VAN DE KERKHOF , Robbert Jan VOOGD
Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
-
公开(公告)号：US20210349398A1
公开(公告)日：2021-11-11
申请号：US17282871
申请日：2019-09-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Vahid MOHAMMADI , Yassin CHOWDHURY , Pieter Cristiaan DE GROOT , Wouter Joep ENGELEN , Marcel Johannes Petrus Theodorus VAN DER HOORN
IPC: G03F7/20 , H01L31/02 , H01L31/0216 , H01L31/18
Abstract: A radiation filter for reducing transmission of an unwanted wavelength of radiation. The radiation filter includes zirconium and SiN3. The radiation filter may form part of a radiation sensor including a passivation layer arranged to receive radiation transmitted by the radiation filter, a photodiode arranged to receive radiation transmitted by the passivation layer, and circuit elements connected to the photodiode. The radiation sensor may perform optical measurements as part of an extreme ultraviolet lithographic apparatus or a lithographic tool.
-
公开(公告)号：US20190137861A1
公开(公告)日：2019-05-09
申请号：US16300370
申请日：2017-05-30
Applicant: ASML Netherlands B.V.
Inventor： Pieter Cristiaan DE GROOT , Gerard Frans Jozef SCHASFOORT , Maksym Yuriiovych SLADKOV , Manfred Petrus Johannes Maria DIKKERS , Jozef Maria FINDERS , Pieter-Jan VAN ZWOL , Johannes Jacobus Matheus BASELMANS , Stefan Michael Bruno BAUMER , Laurentius Cornelius DE WINTER , Wouter Joep ENGELEN , Marcus Adrianus VAN DE KERKHOF , Robbert Jan VOOGD
CPC classification number: G03F1/24 , G02B5/0278 , G02B5/0284 , G02B5/22 , G02B2005/1804 , G03F1/42 , G03F1/44 , G03F7/706 , G03F7/70683 , G03F9/7076
Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
