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公开(公告)号：US20220342199A1
公开(公告)日：2022-10-27
申请号：US17634023
申请日：2020-08-05
Applicant: ASML NETHERLANDS B.V. , IMEC v.z.w.
Inventor： Alexandre HALBACH , Nitesh PANDEY , Sebastianus Adrianus GOORDEN , Veronique ROCHUS , Luc Roger Simonne HASPESLAGH , Guilherme BRONDANI TORRI
Abstract: A micromirror array includes a substrate, a plurality of mirrors for reflecting incident radiation, and for each mirror of the plurality of mirrors, a respective post connecting the substrate to the respective mirror. The micromirror array further includes, for each mirror of the plurality of mirrors, one or more electrostatic actuators connected to the substrate for applying force to the respective post to displace the respective post relative to the substrate, thereby displacing the respective mirror. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.
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公开(公告)号：US20220283428A1
公开(公告)日：2022-09-08
申请号：US17635907
申请日：2020-08-05
Applicant: ASML Netherlands B.V. , IMEC v.z.w.
Inventor： Luc Roger Simonne HASPESLAGH , Veronique ROCHUS , Guilherme BRONODANI TORRI , Nitesh PANDEY , Sebastianus Adrianus GOORDEN
Abstract: A micromirror array comprises a substrate, a plurality of minors for reflecting incident light and, for each mirror (20) of the plurality of minors, at least one piezoelectric actuator (21) for displacing the minor, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars (24) connecting the minor to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.
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公开(公告)号：US20240184218A1
公开(公告)日：2024-06-06
申请号：US18441772
申请日：2024-02-14
Applicant: ASML Netherlands B.V.
Inventor： Nitesh PANDEY , Arie Jeffrey DEN BOEF , Duygu AKBULUT , Marinus Johannes Maria VAN DAM , Hans BUTLER , Hugo Augustinus Joseph CRAMER , Engelbertus Antonius Fransiscus VAN DER PASCH , Ferry ZIJP , Jeroen Arnoldus Leonardus Johannes RAAYMAKERS , Marinus Petrus REIJNDERS
IPC: G03F7/00 , G01N21/956
CPC classification number: G03F7/70625 , G01N21/956 , G03F7/7015 , G03F7/70633
Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.
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公开(公告)号：US20240004313A1
公开(公告)日：2024-01-04
申请号：US18039373
申请日：2021-11-16
Applicant: ASML Netherlands B.V.
IPC: G03F7/00 , G01B11/27 , G01N21/956 , G02B27/64
CPC classification number: G03F7/706851 , G03F7/70633 , G03F7/7065 , G01B11/272 , G01N21/956 , G02B27/646 , G01N2201/063
Abstract: Disclosed is an optical imaging system, and associated method, comprising a stage module configured to support an object such that an area of the object is illuminated by an illumination beam; an objective lens configured to collect at least one signal beam, the at least one signal beam originating from the illuminated area of the object; an image sensor configured to capture an image formed by the at least one signal beam collected by the objective lens; and a motion compensatory mechanism operable to compensate for relative motion of the stage module with respect to the objective lens during an image acquisition. The motion compensatory mechanism causes a compensatory motion of one or more of: said objective lens or at least one optical element thereof; said image sensor; and/or an optical element comprised within a detection branch and/or illumination branch of the optical imaging system.
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公开(公告)号：US20230044632A1
公开(公告)日：2023-02-09
申请号：US17787244
申请日：2020-10-21
Applicant: ASML Netherlands B.V.
Inventor： Willem Marie Julia Marcel COENE , Arie Jeffrey DEN BOEF , Vasco Tomas TENNER , Nitesh PANDEY , Christos MESSINIS , Johannes Fitzgerald DE BOER
Abstract: A dark field digital holographic microscope is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digital holographic microscope comprises an illumination device configured to provide at least: a first beam pair comprising a first illumination beam of radiation (1010) and a first reference beam of radiation (1030) and a second beam pair comprising a second illumination beam of radiation (1020) and a second reference beam of radiation (1040); and one or more optical elements (1070) operable to capture a first scattered radiation and to capture a second scattered radiation scattered by the structure resultant from the first and second illumination beams respectively. The beams of the first beam pair are mutually coherent and the beams of the second beam pair are mutually coherent. The illumination device is configured to impose incoherence (ADI) between the first beam pair and second beam pair.
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公开(公告)号：US20220299886A1
公开(公告)日：2022-09-22
申请号：US17638975
申请日：2020-07-31
Applicant: ASML Netherlands B.V.
Inventor： Nitesh PANDEY , Alexander Prasetya KONIJNENBERG
Abstract: Disclosed is a method of measuring a structure, and associated metrology device and computer program. The method comprises obtaining an amplitude profile of scattered radiation relating to a measurement of a first structure on a first substrate and obtaining a reference phase profile relating to a reference measurement of at least one reference structure on a reference substrate. The at least one reference structure is not the same structure as said first structure but is nominally identical in terms of at least a plurality of key parameters. The method further comprises determining a complex-valued field to describe the first structure from the amplitude profile and reference phase profile.
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公开(公告)号：US20200004165A1
公开(公告)日：2020-01-02
申请号：US16562869
申请日：2019-09-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Janneke RAVENSBERGEN , Duygu AKBULUT , Nitesh PANDEY , Jin LIAN
Abstract: A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.
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公开(公告)号：US20190294054A1
公开(公告)日：2019-09-26
申请号：US16441832
申请日：2019-06-14
Applicant: ASML Netherlands B.V.
Inventor： Nitesh PANDEY , Zili ZHOU
IPC: G03F7/20
Abstract: Methods of measuring a target formed by a lithographic process, a metrology apparatus and a polarizer assembly are disclosed. The polarizer assembly comprises a polarizing structure having a substantially planar form and configured to polarize radiation passing there through in a circular polarizing region. The circular polarizing region is configured to apply a first polarization to radiation passing through a first one of two pairs of diametrically opposite quadrants of the circular polarizing region and to apply a second polarization, orthogonal to the first polarization, to radiation passing through a second one of two pairs of diametrically opposite quadrants of the circular polarizing region.
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9.发明申请
公开(公告)号：US20190250094A1
公开(公告)日：2019-08-15
申请号：US16268564
申请日：2019-02-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Nitesh PANDEY , Zili ZHOU , Gerbrand VAN DER ZOUW , Arie Jeffrey DEN BOEF , Markus Gerardus Martinus Maria VAN KRAAIJ , Armand Eugene Albert KOOLEN , Hugo Augustinus Joseph CRAMER , Paul Christiaan HINNEN , Martinus Hubertus Maria VAN WEERT , Anagnostis TSIATMAS , Shu-jin WANG , Bastiaan Onne FAGGINGER AUER , Alok VERMA
CPC classification number: G01N21/21 , G01N21/8806 , G01N2021/8848 , G03F7/70191 , G03F7/70616 , G03F7/70625 , G03F7/70633
Abstract: An inspection apparatus, method, and system are described herein. An example inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, the illumination beam polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization. The inspection apparatus may be further configured to generate image data representing an image of each of the feature(s) based on the intensity data, and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.
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公开(公告)号：US20180292757A1
公开(公告)日：2018-10-11
申请号：US15941324
申请日：2018-03-30
Applicant: ASML Netherlands B.V.
Inventor： Alessandro POLO , Nitesh PANDEY , Armand Eugene Albert KOOLEN
IPC: G03F7/20 , G03F9/00 , G01N21/47 , G01N21/95 , G01N21/956
Abstract: A radiation receiving system for an inspection apparatus, used to perform measurements on target structures on lithographic substrates as part of a lithographic process, comprises a spectrometer with a number of inputs. The radiation receiving system comprises: a plurality of inputs, each input being arranged to provide radiation from a target structure; a first optical element operable to receive radiation from each of the plurality of inputs; a second optical element operable to receive radiation from the first optical element and to scatter the radiation; and a third optical element operable to direct the scattered radiation onto a detector. The second optical element may for example be a reflective diffraction grating that diffracts incoming radiation into an output radiation spectrum.
