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公开(公告)号：US20170082927A1
公开(公告)日：2017-03-23
申请号：US15126234
申请日：2015-03-03
发明人： Duan-Fu Stephen HSU , Jianjun JIA , Xiaofeng LIU , Youping ZHANG
IPC分类号： G03F7/20
CPC分类号： G03F7/7055 , G03F1/36 , G03F7/70125 , G03F7/70433 , G03F7/70441 , G03F7/705
摘要： A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied. The multi-variable cost function may be a function of one or more pattern shift errors. Reconfiguration of the characteristics may be under one or more constraints on the one or more pattern shift errors.
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公开(公告)号：US20180341186A1
公开(公告)日：2018-11-29
申请号：US16036732
申请日：2018-07-16
摘要： A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus having an illumination system and projection optics, the method including: obtaining an illumination source shape and a mask defocus value; optimizing a dose of the lithographic process; and optimizing the portion of the design layout for each of a plurality of slit positions of the illumination source.
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公开(公告)号：US20170038692A1
公开(公告)日：2017-02-09
申请号：US15303199
申请日：2015-02-13
IPC分类号： G03F7/20
CPC分类号： G03F7/70641 , G03F1/36 , G03F1/70 , G03F7/70125 , G03F7/70191 , G03F7/70433 , G03F7/70441 , G03F7/705 , G03F7/70558
摘要： A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus having an illumination system and projection optics, the method including: obtaining an illumination source shape and a mask defocus value; optimizing a dose of the lithographic process; and optimizing the portion of the design layout for each of a plurality of slit positions of the illumination source.
摘要翻译： 一种改进用于使用具有照明系统和投影光学器件的光刻投影装置将设计布局的一部分成像到基板上的光刻工艺的方法，所述方法包括：获得照明源形状和掩模散焦值; 优化光刻工艺的剂量; 以及优化所述照明源的多个狭缝位置中的每一个的所述设计布局的所述部分。
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公开(公告)号：US20170357911A1
公开(公告)日：2017-12-14
申请号：US15531321
申请日：2015-11-18
发明人： Xiaofeng LIU , Yen-Wen LU
CPC分类号： G06N20/00 , G03F1/36 , G03F7/70 , G03F7/70125 , G03F7/70441 , G03F7/705 , G06F17/5068 , G06F17/5081
摘要： A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: obtaining a target feature; generating a perturbed target feature from the target feature by applying a perturbation thereto; generating a set of training examples includes the perturbed target feature and an indication as whether the perturbed target feature is deemed the same as the target feature; training a learning model with the set of training examples; classifying features in the portion of the design layout into at least two classes: being deemed the same as the target feature, and being deemed different from the target feature.
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公开(公告)号：US20170139320A1
公开(公告)日：2017-05-18
申请号：US15318940
申请日：2016-12-14
发明人： Xiaofeng LIU
CPC分类号： G03F1/44 , G03F1/36 , G03F1/42 , G03F7/70125 , G03F7/70433 , G03F7/705 , G06F17/50 , G06F2217/12
摘要： Disclosed herein is a computer-implemented method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus and for transferring the imaged portion of the design layout to the substrate by an etching process, which includes the following steps: determining a value of at least one evaluation point of the lithographic process for each of a plurality of variations of the etching process; computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, wherein the multi-variable cost function is a function of deviation from the determined values of the at least one evaluation point; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a termination condition is satisfied. This method may reduce the need of repeated adjustment to the lithographic process when the etching process varies.
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公开(公告)号：US20150378262A1
公开(公告)日：2015-12-31
申请号：US14766703
申请日：2014-02-04
发明人： Xiaofeng LIU , Rafael C. HOWELL
IPC分类号： G03F7/20
CPC分类号： G03F7/2008 , G03F7/70116 , G03F7/70125 , G03F7/705 , G03F7/70508
摘要： A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: calculating a discrete pupil profile based on a desired pupil profile; selecting a discrete change to the discrete pupil profile; and applying the selected discrete change to the discrete pupil profile. The methods according to various embodiments disclosed herein may reduce the computational cost of discrete optimization from O(an) to O(n) wherein a is constant and n is the number of knobs that can generate discrete change in the pupil profile.
摘要翻译： 一种用于改进用于使用光刻投影装置将设计布局的一部分成像到基板上的光刻处理的方法，所述方法包括：基于所需的瞳孔轮廓来计算离散瞳孔轮廓; 选择离散瞳孔轮廓的离散变化; 以及将所选择的离散变化应用于离散光瞳轮廓。 根据本文公开的各种实施例的方法可以将离散优化的计算成本从O（a）减小到O（n），其中a是常数，n是可以在瞳孔轮廓中产生离散变化的旋钮的数量。
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公开(公告)号：US20190354023A1
公开(公告)日：2019-11-21
申请号：US16527098
申请日：2019-07-31
发明人： Xiaofeng LIU
摘要： A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: obtaining a first source of the lithographic apparatus; classifying the first source into a class among a plurality of possible classes, based on one or more numerical characteristics of the first source, using a machine learning model, by a computer; determining whether the class is among one or more predetermined classes; only when the class is among the one or more predetermined classes, adjusting one or more source design variables to obtain a second source.
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公开(公告)号：US20190155165A1
公开(公告)日：2019-05-23
申请号：US16257423
申请日：2019-01-25
发明人： Xiaofeng LIU , Rafael C. Howell
IPC分类号： G03F7/20
CPC分类号： G03F7/70125 , G03F7/2008 , G03F7/70116 , G03F7/705 , G03F7/70508
摘要： A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: calculating a discrete pupil profile based on a desired pupil profile; selecting a discrete change to the discrete pupil profile; and applying the selected discrete change to the discrete pupil profile. The methods according to various embodiments disclosed herein may reduce the computational cost of discrete optimization from O(an) to O(n) wherein a is constant and n is the number of knobs that can generate discrete change in the pupil profile.
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公开(公告)号：US20180314163A1
公开(公告)日：2018-11-01
申请号：US15528034
申请日：2015-11-18
发明人： Xiaofeng LIU
CPC分类号： G03F7/70125 , G03F7/70441 , G03F7/70491 , G06F17/50 , G06F17/5009 , G06N20/00
摘要： A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: obtaining a first source of the lithographic apparatus; classifying the first source into a class among a plurality of possible classes, based on one or more numerical characteristics of the first source, using a machine learning model, by a computer; determining whether the class is among one or more predetermined classes; only when the class is among the one or more predetermined classes, adjusting one or more source design variables to obtain a second source.
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