公开(公告)号：US07833351B2

公开(公告)日：2010-11-16

申请号：US11426563

申请日：2006-06-26

申请人： Aaron Webb ,  Adam Brailove ,  Joseph Yudovsky ,  Nir Merry ,  Andrew Constant ,  Efrain Quiles ,  Michael R. Rice ,  Gary J. Rosen ,  Vinay K. Shah

发明人： Aaron Webb ,  Adam Brailove ,  Joseph Yudovsky ,  Nir Merry ,  Andrew Constant ,  Efrain Quiles ,  Michael R. Rice ,  Gary J. Rosen ,  Vinay K. Shah

IPC分类号： C23F1/00 ,  H01L21/306

CPC分类号： C23C16/54 ,  C23C16/4583 ,  H01L21/67173 ,  H01L21/67742 ,  H01L21/67757 ,  H01L21/67769 ,  Y10S414/14

摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.

摘要翻译： 用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占地面积。 在一个实施例中，处理平台包括大气传送区域，具有缓冲室和分段平台的至少一个批处理室和设置在传送区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，该基板传送臂包括多个 基板处理刀片。 平台可以包括两个批处理室，其配置有设置在其间的服务通道，以提供对传送机器人和沉积站的必要的服务访问。 在另一个实施例中，处理平台包括至少一个批处理室，适于在FOUP和处理盒之间传送基板的基板传送机器人以及包含盒式处理机器人的盒传送区域。 盒式处理机器人可以是线性致动器或旋转台。

公开(公告)号：US20070295274A1

公开(公告)日：2007-12-27

申请号：US11426563

申请日：2006-06-26

申请人： Aaron Webb ,  Adam Brailove ,  Joseph Yudovsky ,  Nir Merry ,  Andrew Constant ,  Efrain Quiles ,  Michael R. Rice ,  Gary J. Rosen ,  Vinay K. Shah

发明人： Aaron Webb ,  Adam Brailove ,  Joseph Yudovsky ,  Nir Merry ,  Andrew Constant ,  Efrain Quiles ,  Michael R. Rice ,  Gary J. Rosen ,  Vinay K. Shah

IPC分类号： C23C16/00

CPC分类号： C23C16/54 ,  C23C16/4583 ,  H01L21/67173 ,  H01L21/67742 ,  H01L21/67757 ,  H01L21/67769 ,  Y10S414/14

摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.

摘要翻译： 用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占地面积。 在一个实施例中，处理平台包括大气传送区域，具有缓冲室和分段平台的至少一个批处理室和设置在传送区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，该基板传送臂包括多个 基板处理刀片。 平台可以包括两个批处理室，其配置有设置在其间的服务通道，以提供对传送机器人和沉积站的必要的服务访问。 在另一个实施例中，处理平台包括至少一个批处理室，适于在FOUP和处理盒之间传送基板的基板传送机器人以及包含盒式处理机器人的盒传送区域。 盒式处理机器人可以是线性致动器或旋转台。

公开(公告)号：US20110041764A1

公开(公告)日：2011-02-24

申请号：US12939002

申请日：2010-11-03

申请人： Aaron Webb ,  Adam Brailove ,  Joseph Yudovsky ,  Nir Merry ,  Andrew Constant ,  Efrain Quiles ,  Michael R. Rice ,  Gary J. Rosen ,  Vinay K. Shah

发明人： Aaron Webb ,  Adam Brailove ,  Joseph Yudovsky ,  Nir Merry ,  Andrew Constant ,  Efrain Quiles ,  Michael R. Rice ,  Gary J. Rosen ,  Vinay K. Shah

IPC分类号： H01L21/677 ,  C23C16/00

CPC分类号： C23C16/54 ,  C23C16/4583 ,  H01L21/67173 ,  H01L21/67742 ,  H01L21/67757 ,  H01L21/67769 ,  Y10S414/14

摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.

摘要翻译： 用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占地面积。 在一个实施例中，处理平台包括大气转移区域，至少一个具有缓冲室和分段平台的分批处理室，以及设置在传送区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，其包括多个 基板处理刀片。 平台可以包括两个批处理室，其配置有设置在其间的服务通道，以提供对传送机器人和沉积站的必要的服务访问。 在另一个实施例中，处理平台包括至少一个批处理室，适于在FOUP和处理盒之间传送基板的基板传送机器人以及包含盒式处理机器人的盒传送区域。 盒式处理机器人可以是线性致动器或旋转台。

公开(公告)号：US20100173495A1

公开(公告)日：2010-07-08

申请号：US12724935

申请日：2010-03-16

申请人： Randhir Thakur ,  Steve G. Ghanayem ,  Joseph Yudovsky ,  Aaron Webb ,  Adam Alexander Brailove ,  Nir Merry ,  Vinay K. Shah ,  Andreas G. Hegedus

发明人： Randhir Thakur ,  Steve G. Ghanayem ,  Joseph Yudovsky ,  Aaron Webb ,  Adam Alexander Brailove ,  Nir Merry ,  Vinay K. Shah ,  Andreas G. Hegedus

IPC分类号： H01L21/302 ,  H01L21/316 ,  H01L21/314 ,  C23C16/00

CPC分类号： H01L21/67109 ,  C23C16/4412 ,  C23C16/45546 ,  C23C16/45593 ,  C23C16/4584 ,  C23C16/481 ,  C23C16/54 ,  H01L21/67017 ,  H01L21/67115 ,  H01L21/67167 ,  H01L21/6719 ,  H01L21/67207 ,  H01L21/67745 ,  H01L21/67757 ,  H01L21/67781

摘要： Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system (e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput. In one embodiment, a system is configured to perform a substrate processing sequence that contains batch processing chambers only, or batch and single substrate processing chambers, to optimize throughput and minimize processing defects due to exposure to a contaminating environment. In one embodiment, a batch processing chamber is used to increase the system throughput by performing a process recipe step that is disproportionately long compared to other process recipe steps in the substrate processing sequence that are performed on the cluster tool. In another embodiment, two or more batch chambers are used to process multiple substrates using one or more of the disproportionately long processing steps in a processing sequence. Aspects of the invention also include an apparatus and method for delivering a precursor to a processing chamber so that a repeatable ALD or CVD deposition process can be performed.

摘要翻译： 本发明的方面包括使用适于在一个或多个批次和/或单个基板处理室中处理基板以增加系统吞吐量的多室处理系统（例如，集群工具）来处理基板的方法和装置。 在一个实施例中，系统被配置为执行仅包含批处理室的衬底处理序列，或批处理和单个衬底处理室，以优化生产量并且由于暴露于污染环境而最小化处理缺陷。 在一个实施例中，批处理室用于通过执行与在集群工具上执行的衬底处理序列中的其他工艺配方步骤相比不成比例地长的工艺配方步骤来增加系统吞吐量。 在另一个实施方案中，使用两个或更多个间隔室来处理多个基板，使用处理顺序中的一个或多个不成比例的长处理步骤。 本发明的方面还包括用于将前体输送到处理室的装置和方法，使得可以执行可重复的ALD或CVD沉积工艺。

公开(公告)号：US20060156979A1

公开(公告)日：2006-07-20

申请号：US11286063

申请日：2005-11-22

申请人： Randhir Thakur ,  Steve Ghanayem ,  Joseph Yudovsky ,  Aaron Webb ,  Adam Brailove ,  Nir Merry ,  Vinay Shah ,  Andreas Hegedus

发明人： Randhir Thakur ,  Steve Ghanayem ,  Joseph Yudovsky ,  Aaron Webb ,  Adam Brailove ,  Nir Merry ,  Vinay Shah ,  Andreas Hegedus

IPC分类号： H01L21/322 ,  C23C16/00

CPC分类号： H01L21/67109 ,  C23C16/4412 ,  C23C16/45546 ,  C23C16/45593 ,  C23C16/4584 ,  C23C16/481 ,  C23C16/54 ,  H01L21/67017 ,  H01L21/67115 ,  H01L21/67167 ,  H01L21/6719 ,  H01L21/67207 ,  H01L21/67745 ,  H01L21/67757 ,  H01L21/67781

摘要： Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system (e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput. In one embodiment, a system is configured to perform a substrate processing sequence that contains batch processing chambers only, or batch and single substrate processing chambers, to optimize throughput and minimize processing defects due to exposure to a contaminating environment. In one embodiment, a batch processing chamber is used to increase the system throughput by performing a process recipe step that is disproportionately long compared to other process recipe steps in the substrate processing sequence that are performed on the cluster tool. In another embodiment, two or more batch chambers are used to process multiple substrates using one or more of the disproportionately long processing steps in a processing sequence. Aspects of the invention also include an apparatus and method for delivering a precursor to a processing chamber so that a repeatable ALD or CVD deposition process can be performed.

摘要翻译： 本发明的方面包括使用适于在一个或多个批次和/或单个基板处理室中处理基板以增加系统吞吐量的多室处理系统（例如，集群工具）来处理基板的方法和装置。 在一个实施例中，系统被配置为执行仅包含批处理室的衬底处理序列，或批处理和单个衬底处理室，以优化生产量并且由于暴露于污染环境而最小化处理缺陷。 在一个实施例中，批处理室用于通过执行与在集群工具上执行的衬底处理序列中的其他工艺配方步骤相比不成比例地长的工艺配方步骤来增加系统吞吐量。 在另一个实施方案中，使用两个或更多个间隔室来处理多个基板，使用处理顺序中的一个或多个不成比例的长处理步骤。 本发明的方面还包括用于将前体输送到处理室的装置和方法，使得可以执行可重复的ALD或CVD沉积工艺。

公开(公告)号：US20070084408A1

公开(公告)日：2007-04-19

申请号：US11381966

申请日：2006-05-05

申请人： Joseph Yudovsky ,  Tai Ngo ,  Cesar Tejamo ,  Maitreyee Mahajani ,  Brendan McDougall ,  Yi-Chiau Huang ,  Robert Cook ,  Yeong Kim ,  Alexander Tam ,  Adam Brailove ,  Steve Ghanayem

发明人： Joseph Yudovsky ,  Tai Ngo ,  Cesar Tejamo ,  Maitreyee Mahajani ,  Brendan McDougall ,  Yi-Chiau Huang ,  Robert Cook ,  Yeong Kim ,  Alexander Tam ,  Adam Brailove ,  Steve Ghanayem

IPC分类号： C23C16/00

CPC分类号： C23C16/46 ,  C23C16/45578 ,  H01L21/67109

摘要： An apparatus for batch processing of a wafer is disclosed. In one embodiment the batch processing apparatus includes a bell jar furnace having a diffuser disposed between gas inlets and the substrate positioned within the furnace to direct flows within the chamber around the perimeter of the substrate.

摘要翻译： 公开了一种用于批处理晶片的设备。 在一个实施例中，批处理设备包括钟罩式炉，其具有设置在气体入口之间的扩散器和位于炉内的基板，以引导室内围绕衬底周边的流动。

公开(公告)号：US20070084406A1

公开(公告)日：2007-04-19

申请号：US11249555

申请日：2005-10-13

申请人： Joseph Yudovsky ,  Robert Cook ,  Yeong Kim ,  Alexander Tam ,  Maitreyee Mahajani ,  Adam Brailove ,  Steve Ghanayem

发明人： Joseph Yudovsky ,  Robert Cook ,  Yeong Kim ,  Alexander Tam ,  Maitreyee Mahajani ,  Adam Brailove ,  Steve Ghanayem

IPC分类号： C23F1/00 ,  C23C16/00

CPC分类号： C23C16/45578 ,  C23C16/46 ,  H01L21/67109

摘要： The present invention generally provides a batch processing chamber having a quartz chamber, at least one heater block, an inject assembly coupled to one side of the quartz chamber, and an exhaust assembly coupled to an opposite side of the quartz chamber. In one embodiment, the inject assembly is independently temperature controlled. In another embodiment, at least one temperature sensor is disposed outside the quartz chamber.

摘要翻译： 本发明通常提供了具有石英室，至少一个加热器块，耦合到石英腔的一侧的注射组件以及耦合到石英腔的相对侧的排气组件的批处理室。 在一个实施例中，注射组件是独立温度控制的。 在另一个实施例中，至少一个温度传感器设置在石英腔外部。

公开(公告)号：US20090004405A1

公开(公告)日：2009-01-01

申请号：US11771800

申请日：2007-06-29

申请人： Nir Merry ,  Joseph Yudovsky

发明人： Nir Merry ,  Joseph Yudovsky

IPC分类号： C23C16/455

CPC分类号： C23C16/4586 ,  C23C16/46 ,  H01L21/67306 ,  H01L21/67309 ,  Y10T428/13

摘要： An apparatus and method for uniform heating and gas flow in a batch processing chamber are provided. The apparatus includes a quartz chamber body, removable heater blocks which surround the quartz chamber body, an inject assembly coupled to one side of the quartz chamber body, and a substrate boat having removable susceptors. In one embodiment, the boat may be configured with a plurality of susceptors to control substrate heating during batch processing.

摘要翻译： 提供了一种用于在批处理室中均匀加热和气流的装置和方法。 该装置包括石英室主体，围绕石英室主体的可移除加热块，耦合到石英室主体的一侧的注入组件和具有可拆卸基座的基板舟。 在一个实施例中，船可以配置有多个基座，以在批处理期间控制基板加热。

公开(公告)号：US07748542B2

公开(公告)日：2010-07-06

申请号：US11216969

申请日：2005-08-31

申请人： Joseph Yudovsky ,  Robert C. Cook ,  Nir Merry

发明人： Joseph Yudovsky ,  Robert C. Cook ,  Nir Merry

IPC分类号： A47G19/08

CPC分类号： H01L21/67309 ,  H01L21/67757

摘要： Aspects of the invention include methods and apparatus for processing a batch of substrates. In one embodiment, a compressed substrate boat is configured to reduce pumping volume in a batch processing chamber. The compressed substrate boat comprises a stationary substrate boat and a movable substrate boat, each may be loaded/unloaded independently. The movable substrate boat and the stationary substrate boat may be interleaving with one another such that the distance between the substrates is reduced. In another embodiment, a substrate boat having removable substrate holder is configured to provide susceptors without dramatically increasing pumping volume. The removable substrate holder may be loaded/unloaded away from the substrate boat with susceptors. The removable substrate holder is engaged with the substrate boat such that substrates thereon are interleaving with the susceptors. Embodiments of the present invention reduces pumping volume and increases throughput, hence reduces cost of ownership during batch processing.

摘要翻译： 本发明的方面包括用于处理一批基底的方法和装置。 在一个实施例中，压缩衬底舟被配置成减少间歇处理室中的泵送体积。 压缩的基板舟皿包括固定的基板船和可移动的基板船，每个可以独立地加载/卸载。 可移动衬底舟皿和固定衬底舟皿可以彼此交错，使得衬底之间的距离减小。 在另一个实施例中，具有可移除衬底保持器的衬底舟皿构造成提供感受器而不会显着增加泵送容积。 可移除的基板保持器可以与基座一起装载/卸载离开基板舟皿。 可拆卸衬底保持器与衬底舟皿接合，使得其上的衬底与感受器交错。 本发明的实施例减少了泵送量并增加了生产量，因此在批量处理期间降低了所有权成本。

公开(公告)号：US20070059128A1

公开(公告)日：2007-03-15

申请号：US11216969

申请日：2005-08-31

申请人： Joseph Yudovsky ,  Robert Cook ,  Nir Merry

发明人： Joseph Yudovsky ,  Robert Cook ,  Nir Merry

IPC分类号： H01L21/677

CPC分类号： H01L21/67309 ,  H01L21/67757

摘要： Aspects of the invention include methods and apparatus for processing a batch of substrates. In one embodiment, a compressed substrate boat is configured to reduce pumping volume in a batch processing chamber. The compressed substrate boat comprises a stationary substrate boat and a movable substrate boat, each may be loaded/unloaded independently. The movable substrate boat and the stationary substrate boat may be interleaving with one another such that the distance between the substrates is reduced. In another embodiment, a substrate boat having removable substrate holder is configured to provide susceptors without dramatically increasing pumping volume. The removable substrate holder may be loaded/unloaded away from the substrate boat with susceptors. The removable substrate holder is engaged with the substrate boat such that substrates thereon are interleaving with the susceptors. Embodiments of the present invention reduces pumping volume and increases throughput, hence reduces cost of ownership during batch processing.

摘要翻译： 本发明的方面包括用于处理一批基底的方法和装置。 在一个实施例中，压缩衬底舟被配置成减少间歇处理室中的泵送体积。 压缩的基板舟皿包括固定的基板船和可移动的基板船，每个可以独立地加载/卸载。 可移动衬底舟皿和固定衬底舟皿可以彼此交错，使得衬底之间的距离减小。 在另一个实施例中，具有可移除衬底保持器的衬底舟皿构造成提供感受器而不会显着增加泵送容积。 可移除的基板保持器可以与基座一起装载/卸载离开基板舟皿。 可拆卸衬底保持器与衬底舟皿接合，使得其上的衬底与感受器交错。 本发明的实施例减少了泵送量并增加了生产量，因此在批量处理期间降低了所有权成本。