公开(公告)号：US20070259511A1

公开(公告)日：2007-11-08

申请号：US11417028

申请日：2006-05-04

申请人： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

发明人： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC分类号： H01L21/26

CPC分类号： H01J37/3171 ,  H01J37/304 ,  H01J2237/20228 ,  H01J2237/30488 ,  H01J2237/30494 ,  H01J2237/31703

摘要： An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

摘要翻译： 注入器提供相对于注入束的衬底的二维扫描，使得光束在衬底上绘制扫描线的光栅。 在离开衬底的周转点处测量束电流，并且使用电流值来控制随后的快速扫描速度，以补偿束电流中任何变化对慢扫描方向上的剂量均匀性的影响。 扫描可以产生不相交的均匀间隔的平行扫描线的光栅，并且选择线之间的间隔以确保适当的剂量均匀性。

公开(公告)号：US20060197016A1

公开(公告)日：2006-09-07

申请号：US11417027

申请日：2006-05-04

申请人： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

发明人： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC分类号： H01J49/00

CPC分类号： H01J37/3171 ,  H01J37/3023 ,  H01J49/30 ,  H01J2237/20228 ,  H01J2237/20285 ,  H01J2237/24507 ,  H01J2237/2487 ,  H01J2237/30488 ,  H01J2237/31703 ,  H01J2237/31708 ,  H01L21/67005 ,  H01L21/68714 ,  H01L21/68764

摘要： An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

公开(公告)号：US20070105355A1

公开(公告)日：2007-05-10

申请号：US11527594

申请日：2006-09-27

申请人： Adrian Murrell ,  Peter Banks ,  Matthew Dobson ,  Peter Kindersley ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

发明人： Adrian Murrell ,  Peter Banks ,  Matthew Dobson ,  Peter Kindersley ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC分类号： H01L21/26

CPC分类号： H01J37/3171 ,  H01J37/3023 ,  H01J49/30 ,  H01J2237/20228 ,  H01J2237/20285 ,  H01J2237/2487 ,  H01J2237/30488 ,  H01J2237/31703 ,  H01J2237/31708 ,  H01L21/265 ,  H01L21/67005 ,  H01L21/68714 ,  H01L21/68764 ,  Y10S438/961

摘要： An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

公开(公告)号：US20050211923A1

公开(公告)日：2005-09-29

申请号：US10857449

申请日：2004-06-01

申请人： Peter Banks

发明人： Peter Banks

IPC分类号： H01J27/08 ,  H01J37/08 ,  H01J37/32

CPC分类号： H01J27/08 ,  H01J37/08 ,  H01J2237/31701

摘要： The invention relates to methods of controlling the effect of ions of an ionisable source gas that can react with interior surfaces of an arc chamber, by introducing ions of a displacement gas into the arc chamber, where the displacement gas ions are more chemically reactive with the material of the interior surfaces than the ions of the source gas. The source gas ions may typically be oxygen ions and the displacement gas ions are then typically fluorine ions where the interior surfaces comprise tungsten. The fluorine ions may, by way of example, be sourced from fluorine, silicon tetrafluoride or nitrogen trifluoride.

摘要翻译： 本发明涉及通过将置换气体的离子引入电弧室来控制可与电弧室的内表面反应的可离子化源气体的离子的影响的方法，其中置换气体离子与 内表面的材料比源气体的离子。 源气体离子通常可以是氧离子，而置换气体离子通常是氟离子，其中内表面包括钨。 例如，氟离子可以来自氟，四氟化硅或三氟化氮。