PROBE FOR ELECTRICAL INSPECTION, METHOD FOR FABRICATING THE SAME, AND METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE
    8.
    发明申请
    PROBE FOR ELECTRICAL INSPECTION, METHOD FOR FABRICATING THE SAME, AND METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE 审中-公开
    电气检查用探针,其制造方法以及制造半导体器件的方法

    公开(公告)号:US20100244869A1

    公开(公告)日:2010-09-30

    申请号:US12731609

    申请日:2010-03-25

    IPC分类号: G01R31/02

    CPC分类号: G01R1/06722 G01R1/06761

    摘要: An aspect of the present disclosure, there is provided An electrical inspection probe, including, a leading end portion of the electrical inspection probe, the leading end portion contacting with a solder bump located outward the electrical inspection probe, a base material configured at the leading end portion, the base material being constituted with a conductive material, a gold layer on a surface of the base material at least in the leading end portion, a rhodium layer on a surface of the gold layer at least in the leading end portion, and a ruthenium layer on a surface of the rhodium layer at least in the leading end portion.

    摘要翻译: 本发明的一个方面,提供了一种电气检查探针,其包括电检查探针的前端部,前端部与位于电检查探针外侧的焊料凸块接触,基体材料配置在前导部 所述基材由导电材料构成,至少在所述前端部的所述基材的表面上的金层,在所述金层的至少前端部的表面上的铑层,以及 铑层的至少在前端部的铑层。