摘要:
Provided are: a glass substrate for p-Si TFT flat panel displays that is composed of a glass having high characteristic temperatures in the low-temperature viscosity range, typified by the strain point and glass transition point, having a small heat shrinkage rate, and being capable of avoiding the occurrence of the problem regarding the erosion/wear of a melting tank at the time of melting through direct electrical heating; and a method for manufacturing same. The present glass substrate is composed of a glass comprising 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-25 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-1 mass % of Fe2O3, and 0-0.3 mass % of Sb2O3, and substantially not comprising As2O3, the glass having a mass ratio (SiO2+Al2O3)/B2O3 in a range of 7-30 and a mass ratio (SiO2+Al2O3)/RO equal to or greater than 6. The present method for manufacturing a glass substrate involves: a melting step of obtaining a molten glass by melting, by employing at least direct electrical heating, glass raw materials blended so as to provide the aforementioned glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.
摘要翻译:本发明提供:一种用于p-Si TFT平板显示器的玻璃基板,其由在低温粘度范围内具有高特征温度的玻璃构成,以应变点和玻璃化转变点为代表,具有小的热收缩率,以及 能够避免在通过直接电加热熔化时熔融槽的侵蚀/磨损的问题的发生; 及其制造方法。 本发明的玻璃基板由SiO 2为52〜78质量%,Al 2 O 3为3〜25质量%,B 2为3〜15质量%,RO为3〜25质量%的玻璃构成,其中,RO为MgO的总量, CaO,SrO,BaO,0.01〜1质量%的Fe 2 O 3和0〜0.3质量%的Sb 2 O 3,实质上不含有As 2 O 3,玻璃的质量比(SiO 2 + Al 2 O 3)/ B 2 O 3的范围为7〜30 以及等于或大于6的质量比(SiO 2 + Al 2 O 3)/ RO。本发明的玻璃基板的制造方法包括:通过使用至少直接电加热获得熔融玻璃的熔融步骤,玻璃原料 混合以提供上述玻璃组合物; 将熔融玻璃形成平板玻璃的成形工序; 以及退火平板玻璃的退火步骤。
摘要:
Provided are: a glass substrate for p-Si TFT flat panel displays that is composed of a glass having high characteristic temperatures in the low-temperature viscosity range, typified by the strain point and glass transition point, having a small heat shrinkage rate, and being capable of avoiding the occurrence of the problem regarding the erosion/wear of a melting tank at the time of melting through direct electrical heating; and a method for manufacturing same. The present glass substrate is composed of a glass comprising 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-25 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-1 mass % of Fe2O3, and 0-0.3 mass % of Sb2O3, and substantially not comprising As2O3, the glass having a mass ratio (SiO2+Al2O3)/B2O3 in a range of 7-30 and a mass ratio (SiO2+Al2O3)/RO equal to or greater than 6. The present method for manufacturing a glass substrate involves: a melting step of obtaining a molten glass by melting, by employing at least direct electrical heating, glass raw materials blended so as to provide the aforementioned glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.
摘要:
A substrate for p-Si TFT flat panel displays made of a glass having a high low-temperature-viscosity characteristic temperature and manufactured while avoiding erosion/wear of a melting tank during melting through direct electrical heating. The glass substrate comprises 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-20 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-0.8 mass % of R2O, wherein R2O is total amount of Li2O, Na2O, and K2O, and 0-0.3 mass % of Sb2O3, and substantially does not comprise As2O3, wherein the mass ratio CaO/RO is equal to or greater than 0.65, the mass ratio (SiO2+Al2O3)/B2O3 is in a range of 7-30, and the mass ratio (SiO2+Al2O3)/RO is equal to or greater than 5. A related method involves melting glass raw materials blended to provide the glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.
摘要翻译:一种用于由具有高低温粘度特性温度的玻璃制成的p-Si TFT平板显示器的基板,并且在通过直接电加热熔化期间避免熔化槽的侵蚀/磨损而制造。 所述玻璃基板包含52-78质量%的SiO 2,3-25质量%的Al 2 O 3,3-15质量%的B 2 O 3,3-20质量%的RO,其中RO是MgO,CaO,SrO和BaO的总量 ,0.01-0.8质量%的R 2 O,其中,R 2 O为Li 2 O,Na 2 O,K 2 O的总量,Sb 2 O 3为0〜0.3质量%,基本上不包含As 2 O 3,CaO / (SiO2 + Al2O3)/ B2O3的质量比(SiO 2 + Al 2 O 3)/ B 2 O 3在7〜30的范围内,质量比(SiO 2 + Al 2 O 3)/ RO等于或大于5.相关方法包括将玻璃原料混合 提供玻璃组成; 将熔融玻璃形成平板玻璃的成形工序; 以及退火平板玻璃的退火步骤。
摘要:
A flat panel display glass substrate includes a glass comprising, in mol %, 55-80% SiO2, 3-20% Al2O3, 3-15% B2O3, and 3-25% RO (the total amount of MgO, CaO, SrO, and BaO). The contents in mol % of SiO2, Al2O3, and B2O3 satisfy a relationship (SiO2+Al2O3)/(B2O3)=7.5-17. The strain point of the glass is 665° C. or more. The devitrification temperature of the glass is 1250° C. or less. The substrate has a heat shrinkage rate of 75 ppm or less. The rate of heat shrinkage is calculated from the amount of shrinkage of the substrate measured after a heat treatment which is performed at a rising and falling temperature rate of 10° C./min and at 550° C. for 2 hours by the rate of heat shrinkage (ppm)={the amount of shrinkage of the substrate after the heat treatment/the length of the substrate before the heat treatment}×106.
摘要翻译:平板显示器玻璃基板包括以摩尔%计含有55-80%SiO 2,3-20%Al 2 O 3,3-15%B 2 O 3和3-25%RO(MgO,CaO,SrO, 和BaO)。 SiO 2,Al 2 O 3和B 2 O的摩尔%含量满足关系式(SiO2 + Al2O3)/(B2O3)= 7.5-17。 玻璃的应变点为665℃以上。 玻璃的失透温度为1250℃以下。 基板的热收缩率为75ppm以下。 热收缩率由热处理后测定的基板的收缩量算出,该热处理以10℃/分钟和550℃的上升和下降温度进行2小时,以 热收缩率(ppm)= {热处理后的基板的收缩量/热处理前的基板的长度}×106。
摘要:
A flat panel display glass substrate according to the present invention includes a glass comprising, as expressed in mol %, 55-80% SiO2, 3-20% Al2O3, 3-15% B2O3, 3-25% RO (the total amount of MgO, CaO, SrO, and BaO), and substantially no As2O3 and Sb2O3. The devitrification temperature of the glass is 1250° C. or less. The glass substrate has a heat shrinkage rate of 75 ppm or less. The heat shrinkage rate is calculated from the amount of shrinkage of the glass substrate measured after a heat treatment which is performed at a temperature rising and falling rate of 10° C./min and at 550° C. for 2 hours by the heat shrinkage rate (ppm)={the amount of shrinkage of the glass substrate after the heat treatment/the length of the glass substrate before the heat treatment}×106.
摘要翻译:根据本发明的平板显示器玻璃基板包括玻璃,其以摩尔%表示,为55-80%SiO 2,3-20%Al 2 O 3,3-15%B 2 O 3,3-25%RO(总量 MgO,CaO,SrO和BaO),并且基本上不含As2O3和Sb2O3。 玻璃的失透温度为1250℃以下。 玻璃基板的热收缩率为75ppm以下。 热收缩率由热处理后测定的玻璃基板的收缩量,以10℃/分钟和550℃的升温和降温率通过热收缩率进行2小时计算 速率(ppm)= {热处理后的玻璃基板的收缩量/热处理前的玻璃基板的长度}×106。
摘要:
The disclosed cover glass is produced by etching a glass substrate that has been formed by a down-drawing process, and chemically strengthening the glass substrate to provide the glass substrate with a compressive-stress layer on the principal surfaces thereof. The glass substrate contains, as components thereof, 50% to 70% by mass of SiO2, 5% to 20% by mass of Al2O3, 6% to 30% by mass of Na2O, and 0% to less than 8% by mass of Li2O. The glass substrate may also contain 0% to 2.6% by mass of CaO, if necessary. The glass substrate has an etching characteristic in which the etching rate is at least 3.7 μm/minute in an etching environment having a temperature of 22° C. and containing hydrogen fluoride with a concentration of 10% by mass.
摘要:
A cover glass having a compressive-stress layer on the principal surfaces thereof, and having a glass composition containing 50% to 70% by mole of SiO2, 3% to 20% by mole of Al2O3, 5% to 25% by mole of Na2O, more than 0% by mole and less than or equal to 2.5% by mole of Li2O, 0% to 5.5% by mole of K2O, and 0% to less than 3% by mole of B2O3. Also disclosed is a method for producing a cover glass which includes: (i) preparing molten glass by melting a glass raw material; (ii) forming the prepared molten glass into a plate-like shape by a down-draw process and thereby obtaining a glass substrate; and (iii) forming a compressive-stress layer on the surface of the glass substrate.
摘要翻译:一种在其主表面上具有压应力层的玻璃玻璃,并且具有含有50〜70摩尔%的SiO 2,3〜20摩尔%的Al 2 O 3,5〜25摩尔%的Na 2 O的玻璃组合物 ,大于等于0摩尔%且小于或等于2.5摩尔%的Li 2 O,0〜5.5摩尔%的K 2 O和0〜3摩尔%以下的B 2 O 3。 还公开了一种盖玻璃的制造方法,其包括:(i)通过熔化玻璃原料来制备熔融玻璃; (ii)通过下拉法将所制备的熔融玻璃形成为板状,从而获得玻璃基板; 和(iii)在玻璃基板的表面上形成压应力层。
摘要:
Provided is a glass composition suitable for a glass substrate for a flat panel display such as a liquid crystal display. This glass composition has high thermal stability, and is substantially free of BaO but has a low devitrification temperature. It is suitable for the production of a glass substrate by a downdraw process. This glass composition contains, in terms of mass %; 54 to 62% of SiO2; 4 to 11% of B2O3; 15 to 20% of Al2O3; 2 to 5% of MgO; 0 to 7% of CaO; 0 to 13.5% of SrO; 0 to 1% of K2O; 0 to 1% of SnO2; and 0 to 0.2% of Fe2O3, and is substantially free of BaO. In this glass composition, the total content of alkaline earth metal oxides (MgO+CaO+SrO) is 10 to 18.5 mass %. The devitrification temperature of the glass composition is 1200° C. or lower.
摘要:
The present invention provides a glass article using a glass composition including a base glass composition and colorants. The base glass composition includes, expressed in mass %: 65 to 80% of SiO2; 0 to 5% of Al2O3; 0 to 10% of MgO; 0 to 15% of CaO; 5 to 15% of MgO+CaO; 10 to 18% of Na2O; 0 to 5% of K2O; 10 to 20% of Na2O+K2O; and 0 to 5% of B2O3, and the colorants consist essentially of, expressed in mass %: 0.6% to 1.0% of T-Fe2O3; 0.026 to 0.8% of TiO2; 0 to 2.0% of CeO2; 0.01 to 0.03% of CoO; 0 to 0.0008% of Se; and 0.06 to 0.20% of NiO. The glass article has a grayish color tone, and has a visible light transmittance in a range of 15% to 40%, which is measured with the illuminant A at a thickness of 3.1 mm.