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公开(公告)号：US06800419B2
公开(公告)日：2004-10-05
申请号：US10369674
申请日：2003-02-21
IPC分类号： G03F7039
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A radiation-sensitive resin composition comprising: (A) an alkali insoluble or scarcely alkali-soluble resin having an acid-dissociable protecting group of the following formula [I], wherein R1 groups are monovalent alicyclic hydrocarbon groups or alkyl groups, provided that at least one of the R1 groups is the monovalent alicyclic hydrocarbon group, or any two of the R1 groups and the carbon atom form a divalent alicyclic hydrocarbon group, (B) a photoacid generator, and (C) propylene glycol monomethyl ether acetate, &ggr;-butyrolactone, and cyclohexanone as solvents. The resin composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays and exhibits excellent film thickness uniformity and storage stability.
摘要翻译： 一种辐射敏感性树脂组合物，其包含：（A）具有下式[I]的酸解离保护基的碱不溶性或几乎不溶的碱溶性树脂，其中R 1为一价脂环族烃基或烷基， 条件是R 1基团中的至少一个为一价脂环族烃基，或者R 1基团和碳原子中的任何两个形成二价脂环族烃基，（B）光致酸发生剂和（C ）丙二醇单甲醚乙酸酯，γ-丁内酯和环己酮作为溶剂。 树脂组合物可用作用于使用深紫外线的微细加工的化学增幅抗蚀剂，并且显示出优异的膜厚均匀性和储存稳定性。
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公开(公告)号：US07144675B2
公开(公告)日：2006-12-05
申请号：US10648243
申请日：2003-08-27
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , Y10S430/122
摘要： A radiation-sensitive resin composition comprising (A) a resin comprising at least two recurring units of the formulas (1)–(6) in the total amount of 5–70 mol %, but each in the amount of 1–49 mol %, the resin being insoluble or scarcely soluble in alkali, but becoming easily soluble in alkali by the action of an acid, and (B) a photoacid generator. wherein R1 is a hydrogen or methyl and R2 is a substituted or unsubstituted alkyl group having 1–4 carbon atoms. The resin composition is useful as a chemically amplified resist having high transmittance of radiation, sensitivity, resolution, dry etching resistance, and pattern profile.
摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）包含至少两种式（1） - （6）的重复单元的树脂，其总量为5-70mol％，但各自为1-49mol％ ，树脂不溶或几乎不溶于碱，但通过酸的作用容易溶于碱，和（B）光酸产生剂。 其中R 1是氢或甲基，R 2是取代或未取代的具有1-4个碳原子的烷基。 树脂组合物可用作具有高透射率，灵敏度，分辨率，耐干蚀刻性和图案轮廓的化学放大抗蚀剂。
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公开(公告)号：US07078148B2
公开(公告)日：2006-07-18
申请号：US10446824
申请日：2003-05-29
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/12 , Y10S430/122 , Y10S430/123 , Y10S430/126
摘要： A radiation-sensitive resin composition comprising: (A) a resin comprising a hydroxyl group or carboxyl group, of which the hydrogen atom has been replaced by an acid-dissociable group possessing an alkali dissolution controlling capability, the resin increasing the solubility in an alkaline aqueous solution when the acid-dissociable group dissociates, and a photoacid generator comprising (B-1) a sulfonium salt represented by 1-(3,5-dimethyl-4-hydroxyphenyl)tetrahydrothiophenium perfluoro-n-octanesulfonate and 1-(4-n-butoxy-1-naphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate and (B-2) a sulfonium salt represented by triphenylsulfonium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition useful as a novel chemically amplified resist exhibiting excellent sensitivity and resolution to deep ultraviolet rays typified by an ArF excimer laser, superior pattern shape-forming capability, and the like.
摘要翻译： 一种辐射敏感性树脂组合物，其包含：（A）包含羟基或羧基的树脂，其中氢原子被具有碱溶解控制能力的酸解离基取代，所述树脂在碱中增加溶解度 （B-1）由1-（4-甲基-4-羟基苯基）四氢噻吩代替的锍盐和1-（4-甲基-4-羟基苯基）四氢噻吩， 正丁氧基-1-萘基）四氢噻吩和九溴代正丁磺酸三苯基锍代表的（B-2）锍盐。 用作新型化学放大抗蚀剂的辐射敏感性树脂组合物，其表现出以ArF准分子激光为代表的深紫外线的极好的灵敏度和分辨率，优异的图案形成能力等。
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公开(公告)号：US20070254247A1
公开(公告)日：2007-11-01
申请号：US11269761
申请日：2005-11-09
IPC分类号： G03C1/043
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising (A) a resin which comprises at least one recurring unit (I-1), (I-2), or (I-3), and a recurring unit (II), and is insoluble or scarcely soluble in alkali, but becomes alkali soluble by action of an acid, (B) a photoacid generator, and (C) a polycyclic compound. The resin composition is used as a chemically-amplified resist for microfabrication utilizing deep UV rays.
摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）包含至少一个重复单元（I-1），（I-2）或（I-3）和重复单元（II）的树脂， 几乎不溶于碱，但通过酸的作用变得碱溶，（B）光酸产生剂，和（C）多环化合物。 该树脂组合物用作利用深紫外线的微细加工的化学增幅抗蚀剂。
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公开(公告)号：US07005230B2
公开(公告)日：2006-02-28
申请号：US10345157
申请日：2003-01-16
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising (A) a resin which comprises at least one recurring unit (I-1), (I-2), or (I-3), and a recurring unit (II), and is insoluble or scarcely soluble in alkali, but becomes alkali soluble by action of an acid, (B) a photoacid generator, and (C) a polycyclic compound. The resin composition is used as a chemically-amplified resist for microfabrication utilizing deep UV rays
摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）包含至少一个重复单元（I-1），（I-2）或（I-3）和重复单元（II）的树脂， 几乎不溶于碱，但通过酸的作用变得碱溶，（B）光酸产生剂，和（C）多环化合物。 树脂组合物用作利用深紫外线的微细加工的化学增幅抗蚀剂<化学id =“CHEM-US-00001”num =“000
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公开(公告)号：US07638261B2
公开(公告)日：2009-12-29
申请号：US12348171
申请日：2009-01-02
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/114
摘要： A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown by the following formula (I-1) and (B) a radiation-sensitive acid generator such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition may further comprise (C) an acid diffusion controller such as phenylbenzimidazole.
摘要翻译： 适用于利用KrF准分子激光器或ArF准分子激光器表示的各种类型的辐射如深紫外线的用于微细加工的化学放大型抗蚀剂的辐射敏感性树脂组合物。 本发明的辐射敏感性树脂组合物包含：（A）包含下式（I-1）所示的重复单元（1-1）和（B）的辐照敏感性酸产生剂的树脂， （4-正丁氧基萘基）四氢噻吩六氟正丁磺酸盐。 辐射敏感性树脂组合物还可以包含（C）酸扩散控制剂如苯基苯并咪唑。
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公开(公告)号：US20090148790A1
公开(公告)日：2009-06-11
申请号：US12348171
申请日：2009-01-02
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/114
摘要： A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown by the following formula (I-1) and (B) a radiation-sensitive acid generator such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition may further comprise (C) an acid diffusion controller such as phenylbenzimidazole.
摘要翻译： 适用于利用KrF准分子激光器或ArF准分子激光器表示的各种类型的辐射如深紫外线的用于微细加工的化学放大型抗蚀剂的辐射敏感性树脂组合物。 本发明的辐射敏感性树脂组合物包含：（A）包含下式（I-1）所示的重复单元（1-1）和（B）的辐照敏感性酸产生剂的树脂， （4-正丁氧基萘基）四氢噻吩六氟正丁磺酸盐。 辐射敏感性树脂组合物还可以包含（C）酸扩散控制剂如苯基苯并咪唑。
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公开(公告)号：US07521169B2
公开(公告)日：2009-04-21
申请号：US10533223
申请日：2003-10-23
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/114
摘要： A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown by the following formula (I-1) and (B) a radiation-sensitive acid generator such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition may further comprise (C) an acid diffusion controller such as phenylbenzimidazole
摘要翻译： 适用于利用KrF准分子激光器或ArF准分子激光器表示的各种类型的辐射如深紫外线的用于微细加工的化学放大型抗蚀剂的辐射敏感性树脂组合物。 本发明的辐射敏感性树脂组合物包含：（A）包含下式（I-1）所示的重复单元（1-1）和（B）的辐照敏感性酸产生剂的树脂， （4-正丁氧基萘基）四氢噻吩六氟正丁磺酸盐。 辐射敏感性树脂组合物还可以包含（C）酸扩散控制剂如苯基苯并咪唑
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公开(公告)号：US07452655B2
公开(公告)日：2008-11-18
申请号：US10533254
申请日：2003-11-04
CPC分类号： C08F220/26 , G03F7/0397
摘要： An acrylic copolymer having a specific structure and a radiation-sensitive resin composition comprising the acrylic copolymer having high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, dry etching resistance, and pattern shape, and, in particular, excelling in forming contact holes and lines-and-spaces.
摘要翻译： 具有特定结构的丙烯酸共聚物和辐射敏感性树脂组合物，其包含对辐射具有高透明度的丙烯酸共聚物，作为抗敏剂，例如灵敏度，分辨率，耐干蚀刻性和图案形状的基本性能优异， 优秀的形成接触孔和线和空格。
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公开(公告)号：US20060074139A1
公开(公告)日：2006-04-06
申请号：US10533254
申请日：2003-11-04
IPC分类号： C08J3/28
CPC分类号： C08F220/26 , G03F7/0397
摘要： An acrylic copolymer having a specific structure and a radiation-sensitive resin composition comprising the acrylic copolymer having high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, dry etching resistance, and pattern shape, and, in particular, excelling in forming contact holes and lines-and-spaces.
摘要翻译： 具有特定结构的丙烯酸共聚物和辐射敏感性树脂组合物，其包含对辐射具有高透明度的丙烯酸共聚物，作为抗敏剂，例如灵敏度，分辨率，耐干蚀刻性和图案形状的基本性能优异， 优秀的形成接触孔和线和空格。
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