摘要:
Mechanically activated objects or devices for use in treating degenerative retinal diseases are provided. Such devices apply mechanical forces to tissues of an eye to effectuate treatment and are configured for chronic implantation (thereby applying chronic stimulation/irritation) in or on the eye. The devices may be configured for contact with a retina of the eye, preferably positioned in a subretinal space. Various embodiments comprise a moving member configured for chronic contact with at least a portion of the eye, which moving member is activated by an actuator. In some embodiments, the actuator may be distally located relative to the moving member. Alternatively, the moving member may be supported by a body member that, optionally, also supports the actuator.
摘要:
Mechanically activated objects or devices for use in treating degenerative retinal diseases are provided. Such devices apply mechanical forces to tissues of an eye to effectuate treatment and are configured for chronic implantation (thereby applying chronic stimulation/irritation) in or on the eye. The devices may be configured for contact with a retina of the eye, preferably positioned in a subretinal space. Various embodiments comprise a moving member configured for chronic contact with at least a portion of the eye, which moving member is activated by an actuator. In some embodiments, the actuator may be distally located relative to the moving member. Alternatively, the moving member may be supported by a body member that, optionally, also supports the actuator.
摘要:
Mechanically activated objects or devices for use in treating degenerative retinal diseases are provided. Such devices apply mechanical forces to tissues of an eye to effectuate treatment and are configured for chronic implantation (thereby applying chronic stimulation/irritation) in or on the eye. The devices may be configured for contact with a retina of the eye, preferably positioned in a subretinal space. Various embodiments comprise a moving member configured for chronic contact with at least a portion of the eye, which moving member is activated by an actuator. In some embodiments, the actuator may be distally located relative to the moving member. Alternatively, the moving member may be supported by a body member that, optionally, also supports the actuator.
摘要:
A method for fabricating thin-film multilayer interconnect signal planes for connecting semiconductor integrated circuits is described. In this method, a first pattern of thin-film metallic interconnect lines is formed on a surface of a substrate. Then a first dielectric layer is formed over the entire surface of the substrate covering the pattern of thin-film metallic interconnect lines. A portion of the dielectric layer is then removed to expose the thin-film metallic interconnect lines so that a series of trenches is formed above each interconnect line. The interconnect lines are then electroplated to form a series of thicker metal interconnect lines such that the thicker metal interconnect lines and the dielectric layer form a substantially planer surface. This process can then be repeated in its entirely to form a plurality of interconnect signal planes. In the preferred embodiment, metallic vias are provided between each layer of metallic interconnect lines for electrical connection purposes.
摘要:
A directed energy source is applied to a portion of a material, creating at least one altered region and leaving at least one unaltered region. The material is exposed to an etchant which removes the at least one altered region leaving substantially all of the unaltered region.
摘要:
A method for fabricating thin-film multilayer interconnect signal planes for connecting semiconductor integrated circuits (chips) is described. In this method, a first pattern of thin-film metallic interconnect lines is formed on a surface of a substrate. Then a first dielectric layer is formed over the entire surface of the substrate covering the pattern of thin-film metallic interconnect lines. A portion of the dielectric layer is then removed to expose the thin-film metallic interconnect lines so that a series of trenches is formed above each interconnect line. The interconnect lines are then electroplated to form a series of thicker metal interconnect lines such that the thicker metal interconnect lines and the dielectric layer form a substantially planar surface. This process can then be repeated in its entirely to form a plurality of interconnect signal planes. In the preferred embodiment, metallic vias are provided between each layer of metallic interconnect lines for electrical connection purposes.