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公开(公告)号：US07239370B2
公开(公告)日：2007-07-03
申请号：US10738992
申请日：2003-12-19
申请人： Albert Johannes Maria Jansen , Marcel Koenraad Marie Baggen , Johannes Christiaan Maria Jasper , Raymond Laurentius Johannes Schrijver , Richard Joseph Bruls , Johannes Jacobus Matheus Baselmans , Willem Richard Pongers , Tammo Uitterdijk
发明人： Albert Johannes Maria Jansen , Marcel Koenraad Marie Baggen , Johannes Christiaan Maria Jasper , Raymond Laurentius Johannes Schrijver , Richard Joseph Bruls , Johannes Jacobus Matheus Baselmans , Willem Richard Pongers , Tammo Uitterdijk
CPC分类号： G03F7/70308 , G03F7/70716 , G03F7/70983
摘要： In a projection system a pattern plane on a reticle is illuminated to have a projection image focussed on an image plane. The presence of a pellicle in the optical path causes a virtual shift of the position of the pattern plane on the reticle. Depending on the presence or absence of the pellicle the image plane of the projection image needs to be adapted for proper focussing. A compensator counteracts the virtual shift of pattern plane due to the pellicle, by shifting the position of the pattern plane.
摘要翻译： 在投影系统中，将光罩上的图案平面照亮以将投影图像聚焦在图像平面上。 光路中的防护薄膜组件的存在导致图案平面在掩模版上的位置的虚拟移位。 根据防护薄膜的存在或不存在，投影图像的图像平面需要适应适当的聚焦。 补偿器通过移动图形平面的位置来抵消由于防护薄膜组成的图案平面的虚拟移位。
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2.发明申请公开(公告)号：US20080137049A1
公开(公告)日：2008-06-12
申请号：US12068287
申请日：2008-02-05
申请人： Johannes Christiaan Maria Jasper , Marcel Koenraad Marie Baggen , Richard Joseph Bruls , Orlando Serapio Cicilia , Hendrikus Alphonsus Ludovicus Van Dijck , Gerardus Carolus Johannus Hofmans , Albert Johannes Maria Jansen , Carlo Cornelis Maria Luijten , Willem Richard Pongers , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Herman Boom , Marcel Johannes Louis Marie Demarteau
发明人： Johannes Christiaan Maria Jasper , Marcel Koenraad Marie Baggen , Richard Joseph Bruls , Orlando Serapio Cicilia , Hendrikus Alphonsus Ludovicus Van Dijck , Gerardus Carolus Johannus Hofmans , Albert Johannes Maria Jansen , Carlo Cornelis Maria Luijten , Willem Richard Pongers , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Herman Boom , Marcel Johannes Louis Marie Demarteau
CPC分类号： G03F7/70258 , G03F1/62 , G03F1/64 , G03F1/82 , G03F7/70308 , G03F7/70983
摘要： A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.
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公开(公告)号：US20140071420A1
公开(公告)日：2014-03-13
申请号：US13903885
申请日：2013-05-28
申请人： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
发明人： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/7015 , G03F7/70341 , Y10S430/162
摘要： A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
摘要翻译： 公开了一种与位于投影系统和基板之间的浸没液体一起使用的光刻投影装置。 公开了几种方法和机构来保护投影系统，衬底台和液体限制系统的组件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF2的双组分最终光学元件。
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公开(公告)号：US08681309B2
公开(公告)日：2014-03-25
申请号：US12639321
申请日：2009-12-16
CPC分类号： G03F7/705 , G03F7/70591 , G03F7/706 , G03F7/70891
摘要： In a lithographic method, a characteristic of a projection system is measured before and after periods of heating (exposures) and cooling to provide data to calibrate a model of lens heating. The model has a part modeling the effect of cooling and a part modeling the effect of heating on the characteristic.
摘要翻译： 在光刻方法中，在加热（曝光）和冷却之前和之后测量投影系统的特性，以提供用于校准透镜加热模型的数据。 该模型具有对冷却效果进行建模的部分，以及对加热对特性影响的部分建模。
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公开(公告)号：US20120257182A1
公开(公告)日：2012-10-11
申请号：US13438526
申请日：2012-04-03
IPC分类号： G03B27/68
CPC分类号： G03F7/706 , G03F7/70616 , G03F7/70625
摘要： A lithographic method of determining a sensitivity of a property of a pattern feature to change in optical aberrations of a lithographic apparatus used to provide that pattern feature. The method includes controlling a configuration of the lithographic apparatus to establish a first aberration state, forming a first image of the pattern feature with that lithographic apparatus when the lithographic apparatus is in that first aberration state, measuring a property of the image, controlling a configuration of the lithographic apparatus to establish a second, different, aberration state, forming an image of the same pattern feature with that lithographic apparatus when the lithographic apparatus is in that second aberration state, measuring a same property of the image, and using the measurements to determine the sensitivity of the property of the pattern feature to changes in the aberration state.
摘要翻译： 确定图案特征的属性的灵敏度以改变用于提供该图案特征的光刻设备的光学像差的光刻方法。 该方法包括控制光刻设备的配置以建立第一像差状态，当光刻设备处于第一像差状态时，利用该光刻设备形成图案特征的第一图像，测量图像的属性，控制配置 的光刻设备，以建立第二，不同的像差状态，当光刻设备处于第二像差状态时，与该光刻设备形成相同图案特征的图像，测量图像的相同特性，并使用测量值 确定图案特征的属性对像差状态变化的敏感度。
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公开(公告)号：US20100171939A1
公开(公告)日：2010-07-08
申请号：US12639321
申请日：2009-12-16
CPC分类号： G03F7/705 , G03F7/70591 , G03F7/706 , G03F7/70891
摘要： In a lithographic method, a characteristic of a projection system is measured before and after periods of heating (exposures) and cooling to provide data to calibrate a model of lens heating. The model has a part modeling the effect of cooling and a part modeling the effect of heating on the characteristic.
摘要翻译： 在光刻方法中，在加热（曝光）和冷却之前和之后测量投影系统的特性，以提供用于校准透镜加热模型的数据。 该模型具有对冷却效果进行建模的部分，以及对加热对特性影响的部分建模。
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公开(公告)号：US09423701B2
公开(公告)日：2016-08-23
申请号：US13438526
申请日：2012-04-03
CPC分类号： G03F7/706 , G03F7/70616 , G03F7/70625
摘要： A lithographic method of determining a sensitivity of a property of a pattern feature to change in optical aberrations of a lithographic apparatus used to provide that pattern feature. The method includes controlling a configuration of the lithographic apparatus to establish a first aberration state, forming a first image of the pattern feature with that lithographic apparatus when the lithographic apparatus is in that first aberration state, measuring a property of the image, controlling a configuration of the lithographic apparatus to establish a second, different, aberration state, forming an image of the same pattern feature with that lithographic apparatus when the lithographic apparatus is in that second aberration state, measuring a same property of the image, and using the measurements to determine the sensitivity of the property of the pattern feature to changes in the aberration state.
摘要翻译： 确定图案特征的属性的灵敏度以改变用于提供该图案特征的光刻设备的光学像差的光刻方法。 该方法包括控制光刻设备的配置以建立第一像差状态，当光刻设备处于第一像差状态时，利用该光刻设备形成图案特征的第一图像，测量图像的属性，控制配置 的光刻设备，以建立第二，不同的像差状态，当光刻设备处于第二像差状态时，与该光刻设备形成相同图案特征的图像，测量图像的相同特性，并使用测量值 确定图案特征的属性对像差状态变化的敏感度。
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公开(公告)号：US08208123B2
公开(公告)日：2012-06-26
申请号：US10927531
申请日：2004-08-27
申请人： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Matthew Lipson , Tammo Utterdijk
发明人： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Matthew Lipson , Tammo Utterdijk
IPC分类号： G03B27/54
CPC分类号： G03F7/70966 , G03F7/70341 , G03F7/70958 , G03F7/70983 , Y10S430/162
摘要： A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
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9.发明授权Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method 有权气体歧管，光刻设备模块，光刻设备和器件制造方法公开(公告)号：US08675169B2
公开(公告)日：2014-03-18
申请号：US13273817
申请日：2011-10-14
申请人： Frank Johannes Jacobus Van Boxtel , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
发明人： Frank Johannes Jacobus Van Boxtel , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
CPC分类号： G03F7/70891 , G03F7/70091 , G03F7/70991
摘要： A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.
摘要翻译： 气体歧管，用于将气流引导到光刻设备的光学部件的两个板之间，气体歧管具有入口，入口下游的扩散器，入口下游的流动矫正器，流动矫直机下游的承重器， 和承包商下游的出口。
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公开(公告)号：US07206058B2
公开(公告)日：2007-04-17
申请号：US11324754
申请日：2006-01-04
CPC分类号： G03F9/7026 , G03F9/70 , G03F9/7034 , G03F9/7049 , G03F9/7096
摘要： In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.
摘要翻译： 在离轴调平程序中，在测量站产生衬底的高度图。 高度图参考衬底台的物理参考表面。 物理参考表面可以是其中插入透射图像传感器的表面。 在曝光站，测量物理基准表面的高度并与投影透镜的焦平面相关。 然后可以使用高度图来确定衬底台的最佳高度和/或倾斜，以在曝光期间以最佳聚焦将曝光区域定位在衬底上。 相同的原理可以应用于（反射）掩模。
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