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    Liquid crystal structure with improved black state, and projector using same
    3.
    发明授权
    Liquid crystal structure with improved black state, and projector using same 失效
    具有改善黑色状态的液晶结构，投影机使用相同

    公开(公告)号：US07057686B2

    公开(公告)日：2006-06-06

    申请号：US10897456

    申请日：2004-07-23

    申请人： Kenneth C. Ho ,  Minhua Lu ,  Alan E. Rosenbluth ,  Kei-Hsiung Yang

    发明人： Kenneth C. Ho ,  Minhua Lu ,  Alan E. Rosenbluth ,  Kei-Hsiung Yang

    IPC分类号： G02F1/1335

    CPC分类号： H04N9/3105 ,  G02B27/283 ,  G02F1/134336 ,  G02F1/1396

    摘要： A liquid crystal (LC) lightvalve comprising a twisted nematic LC layer whose molecules are aligned with pixel edges at the mirror backplane, thereby providing improved contrast and efficiency, and reduced visibility of post spacers in black state. The present invention is directed to an LC structure wherein the backplane is rubbed in a direction rectilinear with pixel edges. The LC layer is given the same twist rotation and birefringence as in the conventional TN lightvalve. Polarization control is maintained by illuminating the lightvalve with light whose polarization is rotated by the twist angle relative to the x,y, pixel axes, and by collecting the orthogonally polarized component of the reflected light. The lightvalve top glass is thus rubbed in a direction which is rotated by the twist angle from the horizontal or vertical direction at which the backplane is rubbed.

    摘要翻译： 一种液晶（LC）光阀，其包括扭曲向列LC层，其分子与镜面背板上的像素边缘对准，从而提供改善的对比度和效率，并降低后隔片在黑色状态下的可视性。 本发明涉及一种LC结构，其中背板沿着具有像素边缘的直线方向摩擦。 给出LC层与常规TN光阀相同的扭转旋转和双折射。 通过用偏振相对于x，y，像素轴旋转扭转角的光并通过收集反射光的正交偏振分量来照射光阀来维持极化控制。 因此，光阀顶玻璃沿着背板被摩擦的水平或垂直方向旋转扭转角的方向摩擦。

    Reflective light valve
    4.
    发明授权
    Reflective light valve 有权
    反光灯

    公开(公告)号：US06798475B2

    公开(公告)日：2004-09-28

    申请号：US09260869

    申请日：1999-03-02

    申请人： Kenneth C. Ho ,  Minhua Lu ,  Alan E. Rosenbluth ,  Kei-Hsiung Yang

    发明人： Kenneth C. Ho ,  Minhua Lu ,  Alan E. Rosenbluth ,  Kei-Hsiung Yang

    IPC分类号： G02F11335

    CPC分类号： H04N9/3105 ,  G02B27/283 ,  G02F1/134336 ,  G02F1/1396

    摘要： A liquid crystal (LC) lightvalve comprising a twisted nematic LC layer whose molecules are aligned with pixel edges at the mirror backplane, thereby providing improved contrast and efficiency, and reduced visibility of post spacers in black state. The present invention is directed to an LC structure wherein the backplane is rubbed in a direction rectilinear with pixel edges. The LC layer is given the same twist rotation and birefringence as in the conventional TN lightvalve. Polarization control is maintained by illuminating the lightvalve with light whose polarization is rotated by the twist angle relative to the x,y, pixel axes, and by collecting the orthogonally polarized component of the reflected light. The lightvalve top glass is thus rubbed in a direction which is rotated by the twist angle from the horizontal or vertical direction at which the backplane is rubbed.

    摘要翻译： 一种液晶（LC）光阀，其包括扭曲向列LC层，其分子与镜面背板上的像素边缘对准，从而提供改善的对比度和效率，并降低后隔片在黑色状态下的可视性。 本发明涉及一种LC结构，其中背板沿着具有像素边缘的直线方向摩擦。 给出LC层与常规TN光阀相同的扭转旋转和双折射。 通过用偏振相对于x，y，像素轴旋转扭转角的光并通过收集反射光的正交偏振分量来照射光阀来维持极化控制。 因此，光阀顶玻璃沿着背板被摩擦的水平或垂直方向旋转扭转角的方向摩擦。

    High performance projection display with two light valves
    5.
    发明授权
    High performance projection display with two light valves 失效
    高性能投影显示带两个光阀

    公开(公告)号：US5517340A

    公开(公告)日：1996-05-14

    申请号：US380877

    申请日：1995-01-30

    申请人： Fuad E. Doany ,  Donis G. Flagello ,  Alan E. Rosenbluth

    发明人： Fuad E. Doany ,  Donis G. Flagello ,  Alan E. Rosenbluth

    IPC分类号： G02F1/13 ,  G02B27/28 ,  G02F1/1335 ,  G02F1/13357 ,  G03B21/00 ,  H04N9/31 ,  G02F1/133 ,  H04N9/12

    CPC分类号： H04N9/3114 ,  G02B27/283 ,  G02F2001/133622

    摘要： A simplified two-light valve configuration for high performance projection displays which eliminates much complexity and the costs associated with three-light valve projection displays, such as a crossed dichroic beam splitter cube, a long retrofocus projections lens, and the additional cost and complexity of a third light valve. Two reflective liquid crystal light valves are positioned and aligned relative to each other on two adjacent surfaces of a polarizing beam splitter cube. Illumination is introduced through a third face of the cube, and a projection lens images the two light valves through a fourth surface of the polarizing beam splitter cube. Color-sequential and alternating polarization states are provided by a color filter wheel or cage containing individual facets of dichroic or color glass filters, such that as the wheel or cage rotates, the filters change and produce sequential red, green and blue outputs. In addition, the polarization of adjacent colors is alternated by adding a polarizing film onto each color filter.

    摘要翻译： 用于高性能投影显示器的简化双光阀配置，其消除了与三光阀投影显示器相关的大量复杂性和成本，例如交叉二向色分束器立方体，长反射聚焦投影透镜以及额外的成本和复杂性 第三个光阀。 两个反射型液晶光阀在偏振分束器立方体的两个相邻表面上相对于彼此定位和对准。 通过立方体的第三面引入照明，并且投影透镜通过偏振分束器立方体的第四表面成像两个光阀。 彩色顺序和交替的偏振状态由包含二向色或彩色玻璃滤光片的各个面的滤色器轮或保持架提供，使得当轮或笼旋转时，滤光器改变并产生连续的红色，绿色和蓝色输出。 此外，通过在每个滤色器上添加​​偏振膜来交替相邻颜色的偏振。

    Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic process
    6.
    发明授权
    Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic process 失效
    用于产生用于多次曝光光刻工艺的多个优化波前的方法

    公开(公告)号：US08495528B2

    公开(公告)日：2013-07-23

    申请号：US12890854

    申请日：2010-09-27

    申请人： Saeed Bagheri ,  Kafai Lai ,  David O. Melville ,  Alan E. Rosenbluth ,  Kehan Tian ,  Jaione Tirapu Azpiroz

    发明人： Saeed Bagheri ,  Kafai Lai ,  David O. Melville ,  Alan E. Rosenbluth ,  Kehan Tian ,  Jaione Tirapu Azpiroz

    IPC分类号： G06F17/50

    CPC分类号： G03F7/70466 ,  G03F1/70

    摘要： A simplified version of a multiexpose mask optimization problem is solved in order to find a compressed space in which to search for the solution to the full problem formulation. The simplification is to reduce the full problem to an unconstrained formulation. The full problem of minimizing dark region intensity while maintaining intensity above threshold at each bright point can be converted to the unconstrained problem of minimizing average dark region intensity per unit of average intensity in the bright regions. The extrema solutions to the simplified problem can be obtained for each source. This set of extrema solutions is then assessed to determine which features are predominantly printed by which source. A minimal set of extrema solutions serves as a space of reduced dimensionality within which to maximize the primary objective under constraints. The space typically has reduced dimensionality through selection of highest quality extrema solutions.

    摘要翻译： 解决了一个简化版本的多功能面罩优化问题，以便找到一个压缩空间，在该空间中搜索解决问题的全部问题。 简化是将完整的问题减少到无约束的公式。 将每个亮点处的强度保持在阈值以上的暗区强度最小化的问题可以转化为明亮区域每单位平均强度平均暗区强度最小化的无约束问题。 可以为每个源获得简化问题的极值解。 然后评估这组极值解决方案，以确定哪些特征主要由哪个来源打印。 最小的一组极值解决方案作为减小维数的空间，在这个空间内可以在约束条件下最大化主要目标。 该空间通常通过选择最高质量的极值解决方案降低维度。

    Optimizing lithographic mask for manufacturability in efficient manner
    7.
    发明申请
    Optimizing lithographic mask for manufacturability in efficient manner 失效
    以有效的方式优化光刻面具的可制造性

    公开(公告)号：US20130019211A1

    公开(公告)日：2013-01-17

    申请号：US13183070

    申请日：2011-07-14

    申请人： Masaharu Sakamoto ,  Alan E. Rosenbluth ,  Marc Alan Szeto-Millstone ,  Tadanobu Inoue ,  Kehan Tian ,  Andreas Waechter ,  Jonathan Lee ,  David Osmond Melville

    发明人： Masaharu Sakamoto ,  Alan E. Rosenbluth ,  Marc Alan Szeto-Millstone ,  Tadanobu Inoue ,  Kehan Tian ,  Andreas Waechter ,  Jonathan Lee ,  David Osmond Melville

    IPC分类号： G06F17/50

    CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

    摘要： Mask layout data of a lithographic mask includes polygons that each include horizontal and vertical edges. Each of a number of target edge pairs is defined by two edges of one or more of the polygons. A search box having a boundary coincident with a given edge of the edges of the polygons is specified. Whether the search box includes at least one edge of the edges of the polygons in addition to the given edge is determined. Where the search box includes at least one edge, at least one of the target edge pairs is specified as including the given edge and one of the at least one edge. For each target edge pair that has been specified, a manufacturability penalty value is determined. A dynamic manufacturability constraint table and a non-zero multiplier table are maintained.

    摘要翻译： 光刻掩模的掩模布局数据包括各自包括水平和垂直边缘的多边形。 多个目标边对中的每一个由一个或多个多边形的两个边界定义。 指定具有与多边形的边缘的给定边缘重合的边界的搜索框。 确定搜索框是否包括除了给定边缘之外的多边形的边缘的至少一个边缘。 在搜索框包括至少一个边缘的情况下，目标边缘对中的至少一个被指定为包括给定边缘和至少一个边缘中的一个边缘。 对于已经指定的每个目标边对，确定可制造性惩罚值。 维持动态可制造性约束表和非零乘数表。

    Method to match exposure tools using a programmable illuminator
    8.
    发明授权
    Method to match exposure tools using a programmable illuminator 失效
    使用可编程照明器匹配曝光工具的方法

    公开(公告)号：US08351037B2

    公开(公告)日：2013-01-08

    申请号：US12834379

    申请日：2010-07-12

    申请人： Jaione Tirapu Azpiroz ,  Saeed Bagheri ,  Kafai Lai ,  David O. Melville ,  Alan E. Rosenbluth ,  Kehan Tian

    发明人： Jaione Tirapu Azpiroz ,  Saeed Bagheri ,  Kafai Lai ,  David O. Melville ,  Alan E. Rosenbluth ,  Kehan Tian

    IPC分类号： G01B11/00

    CPC分类号： G03F1/36 ,  G03F7/70116 ,  G03F7/70125 ,  G03F7/70525

    摘要： Programmable illuminators in exposure tools are employed to increase the degree of freedom in tool matching. A tool matching methodology is provided that utilizes the fine adjustment of the individual source pixel intensity based on a linear programming (LP) problem subjected to user-specific constraints to minimize the difference of the lithographic wafer data between two tools. The lithographic data can be critical dimension differences from multiple targets and multiple process conditions. This LP problem can be modified to include a binary variable for matching sources using multi-scan exposure. The method can be applied to scenarios that the reference tool is a physical tool or a virtual ideal tool. In addition, this method can match different lithography systems, each including a tool and a mask.

    摘要翻译： 使用曝光工具中的可编程照明器来增加刀具匹配的自由度。 提供了一种工具匹配方法，其利用基于用户特定约束的线性规划（LP）问题对各个源像素强度的精细调整，以最小化两种工具之间的平版印刷晶片数据的差异。 光刻数据可以是来自多个目标和多个工艺条件的关键尺寸差异。 该LP问题可以修改为包括使用多次扫描曝光来匹配源的二进制变量。 该方法可以应用于参考工具是物理工具或虚拟理想工具的场景。 此外，该方法可以匹配不同的光刻系统，每个包括工具和掩模。

    Reflective film interface to restore transverse magnetic wave contrast in lithographic processing
    9.
    发明授权
    Reflective film interface to restore transverse magnetic wave contrast in lithographic processing 有权
    反光膜界面，以恢复光刻处理中的横向磁波对比度

    公开(公告)号：US08125618B2

    公开(公告)日：2012-02-28

    申请号：US12208358

    申请日：2008-09-11

    申请人： Kafai Lai ,  Dirk Pfeiffer ,  Alan E. Rosenbluth

    发明人： Kafai Lai ,  Dirk Pfeiffer ,  Alan E. Rosenbluth

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70216

    摘要： A system for exposing a resist layer to an image that includes a layer reflective to imaging tool radiation and a resist layer having a region of photosensitivity over the reflective layer. An imaging tool projects radiation containing an aerial image onto the resist layer, with a portion of the radiation containing the aerial image passing through the resist and reflecting back to the resist to form an interference pattern of the projected aerial image through the resist layer thickness. The thickness and location of the resist layer region of photosensitivity are selected to include from within the interference pattern higher contrast portions of the interference pattern in the direction of the resist thickness, and to exclude lower contrast portions of the interference pattern in the resist thickness direction from said resist layer region of photosensitivity, to improve contrast of the aerial image in said resist layer region of photosensitivity.

    摘要翻译： 一种用于将抗蚀剂层暴露于包括反射成像工具辐射的层的图像和在反射层上具有光敏区域的抗蚀剂层的系统。 成像工具将包含空间图像的辐射投射到抗蚀剂层上，其中包含空间图像的辐射的一部分穿过抗蚀剂并反射回抗蚀剂，以形成通过抗蚀剂层厚度的投影空间图像的干涉图案。 光敏层的抗蚀剂层区域的厚度和位置被选择为在干涉图形之中包括在抗蚀剂厚度方向上的干涉图案的较高对比度部分，并且排除抗蚀剂厚度方向上的干涉图案的较低对比度部分 从所述抗蚀剂层区域的光敏性，改善所述抗蚀剂层区域中的空间像的光敏性的对比度。

    Efficient isotropic modeling approach to incorporate electromagnetic effects into lithographic process simulations
    10.
    发明授权
    Efficient isotropic modeling approach to incorporate electromagnetic effects into lithographic process simulations 有权
    高效的各向同性建模方法将电磁效应纳入光刻过程模拟

    公开(公告)号：US08078995B2

    公开(公告)日：2011-12-13

    申请号：US12349104

    申请日：2009-01-06

    申请人： Jaione Tirapu Azpiroz ,  Alan E. Rosenbluth ,  Ioana Graur

    发明人： Jaione Tirapu Azpiroz ,  Alan E. Rosenbluth ,  Ioana Graur

    IPC分类号： G06F17/50

    CPC分类号： G03F7/70441 ,  G03F1/36 ,  G03F7/705

    摘要： Modeling of lithographic processes for use in the design of photomasks for the manufacture of semiconductor integrated circuits, and particularly to the modeling of the complex effects due to interaction of the illuminating light with the mask topography, is provided. An isofield perturbation to a thin mask representation of the mask is provided by determining, for the components of the illumination, differences between the electric field on a feature edge having finite thickness and on the corresponding feature edge of a thin mask representation. An isofield perturbation is obtained from a weighted coherent combination of the differences for each illumination polarization. The electric field of a mask having topographic edges is represented by combining a thin mask representation with the isofield perturbation applied to each edge of the mask.

    摘要翻译： 提供了用于制造半导体集成电路的光掩模设计中使用的光刻工艺的建模，特别是对由于照明光与掩模形貌的相互作用而引起的复杂影响的建模。 通过对于照明的组件，确定具有有限厚度的特征边缘上的电场与薄掩模表示的相应特征边缘之间的差异来提供对掩模的薄掩模表示的异场扰动。 从每个照明偏振的差的加权相干组合获得异场扰动。 通过将薄掩模表示与应用于掩模的每个边缘的异场扰动组合来表示具有形貌边缘的掩模的电场。