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    Catadioptric projection objective
    1.
    发明授权
    Catadioptric projection objective 有权
    反射折射投影物镜

    公开(公告)号：US08446665B2

    公开(公告)日：2013-05-21

    申请号：US12562693

    申请日：2009-09-18

    申请人： Alexander Epple ,  Vladimir Kamenov ,  Toralf Gruner ,  Thomas Schicketanz

    发明人： Alexander Epple ,  Vladimir Kamenov ,  Toralf Gruner ,  Thomas Schicketanz

    IPC分类号： G02B5/08

    CPC分类号： G02B17/0892 ,  G02B1/11 ,  G02B17/08 ,  G02B17/0896 ,  G03F7/70 ,  G03F7/70225 ,  G03F7/70275

    摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.2% for an operating wavelength of between 150 nm and 250 nm and for an angle-of-incidence range of between 0° and 30°. As an alternative or in addition, all the surfaces of the lenses of the second partial objective are configured such that the deviation from the marginal ray concentricity is greater than or equal to 20°.

    摘要翻译： 用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7）上。 该目的包括将对象场成像到第一实际中间图像（13）上的第一部分目标（11），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15） 物镜（19）将第二中间图像成像到图像场上。 第二部分目标是具有恰好一个凹面镜并具有至少一个透镜（L21，L22）的反射折射物镜。 第一折叠镜（23）将来自物体平面的辐射偏转到凹面镜，并且第二折叠镜（25）将来自凹面镜的辐射偏转到图像平面。 第二部分物镜的透镜的至少一个表面（L21，L22）具有对于150nm至250nm的工作波长具有小于0.2％的反射率的抗反射涂层，并且对于 介于0°和30°之间。 作为替代或另外，第二部分物镜的透镜的所有表面被配置为使得与边缘射线同心度的偏差大于或等于20°。

    CATADIOPTRIC PROJECTION OBJECTIVE
    4.
    发明申请
    CATADIOPTRIC PROJECTION OBJECTIVE 有权
    目标投影目标

    公开(公告)号：US20110075121A1

    公开(公告)日：2011-03-31

    申请号：US12748862

    申请日：2010-03-29

    申请人： Alexander Epple ,  Toralf Gruner ,  Ralf Mueller

    发明人： Alexander Epple ,  Toralf Gruner ,  Ralf Mueller

    IPC分类号： G03B27/72 ,  G02B17/06

    CPC分类号： G02B13/143 ,  G02B17/0892 ,  G03F7/70225

    摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9), including a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17) and a third partial objective (19) imaging the second intermediate image onto the image field (7). The second partial objective (15) has exactly one concave mirror (21) and at least one lens (23). The minimum distance between an optically utilized region of the concave mirror (21) and an optically utilized region of a surface (25)—facing the concave mirror—of a lens (23) adjacent to the concave mirror is greater than 10 mm.

    摘要翻译： 用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7），包括对物场进行成像的第一部分物镜（11） 到第一实际中间图像（13），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15）和将第二中间图像成像到图像场（7）上的第三部分目标（19） ）。 第二部分物镜（15）具有正好一个凹面镜（21）和至少一个透镜（23）。 凹面镜（21）的光学利用区域与与凹面镜相邻的透镜（23）的凹面镜的表面（25）的光学利用区域之间的最小距离大于10mm。

    METHOD OF MANUFACTURING A PROJECTION OBJECTIVE AND PROJECTION OBJECTIVE
    8.
    发明申请
    METHOD OF MANUFACTURING A PROJECTION OBJECTIVE AND PROJECTION OBJECTIVE 有权
    制作投影目标和投影目标的方法

    公开(公告)号：US20120134016A1

    公开(公告)日：2012-05-31

    申请号：US13364565

    申请日：2012-02-02

    申请人： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

    发明人： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

    IPC分类号： G02B17/08

    CPC分类号： G03F7/70891 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/705 ,  G03F7/70983

    摘要： The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.

    摘要翻译： 本公开涉及一种制造投影物镜的方法，以及投影物镜，例如被配置为在微光刻工艺中使用的投影物镜。 该方法可以包括定义投影物镜的初始设计，并使用优值函数优化设计。 该方法可用于制造可用于制造小型化装置的微光刻工艺中的投影物镜。

    Projection exposure system
    9.
    发明授权
    Projection exposure system 有权
    投影曝光系统

    公开(公告)号：US06806942B2

    公开(公告)日：2004-10-19

    申请号：US10434952

    申请日：2003-05-08

    申请人： Karl-Heinz Schuster ,  Wilhelm Ulrich ,  Toralf Gruner ,  Daniel Kraehmer ,  Wolfgang Singer ,  Alexander Epple ,  Helmut Beierl ,  Reiner Garreis

    发明人： Karl-Heinz Schuster ,  Wilhelm Ulrich ,  Toralf Gruner ,  Daniel Kraehmer ,  Wolfgang Singer ,  Alexander Epple ,  Helmut Beierl ,  Reiner Garreis

    IPC分类号： G03B2754

    CPC分类号： G03F7/70241 ,  G02B13/143 ,  G02B13/24

    摘要： A projection exposure system is proposed which is positionable between a first object and a second object for imaging the first object in a region of the second object with light of a wavelength band having a width &dgr;&lgr; about a central working wavelength &lgr;, wherein a relative width &dgr;&lgr;/&lgr; of the wavelength band is larger than 0.002, in particular, larger than 0.005, for example, of the Hg-I-line. The projection exposure system is a so-called three-bulge system comprising three bulges having, as a whole, a positive refractive power and two waists having, as a whole, a negative refractive power. By applying suitable measures, in particular, by suitably selecting the material for the lenses forming the projection exposure system, the long-term stability of the system is increased.

    摘要翻译： 提出了一种投影曝光系统，其可定位在第一物体和第二物体之间，用于在具有围绕中心工作波长λ的宽度偏差的波长带的光的第二物体的区域内成像第一物体，其中相对宽度 波长带的偏差λ/λ大于0.002，特别是大于0.005，例如Hg-I线。 投影曝光系统是所谓的三凸起系统，其包括总体上具有正屈光力的三个凸起，以及整体上具有负屈光力的两个凸起。 通过适当的措施，特别是通过适当选择形成投影曝光系统的透镜的材料，可以提高系统的长期稳定性。

    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    10.
    发明申请
    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    微波投影曝光装置

    公开(公告)号：US20110109893A1

    公开(公告)日：2011-05-12

    申请号：US13007039

    申请日：2011-01-14

    申请人： Toralf Gruner ,  Alexander Epple ,  Markus Degünther

    发明人： Toralf Gruner ,  Alexander Epple ,  Markus Degünther

    IPC分类号： G03F7/20 ,  G03B27/54 ,  G03B27/72

    CPC分类号： G03F7/70108 ,  G03F7/70141 ,  G03F7/70191

    摘要： A projection exposure apparatus has a projection lens with an object plane, an image plane, an optical axis and a non-telecentric entrance pupil. The apparatus further comprises an illumination system having an intermediate field plane and a field stop. The field stop is positioned in or in close proximity to the intermediate field plane and defines an illuminated field in the object plane that does not contain the optical axis of the projection lens. The illumination system is configured such that, in the object plane, a mean of the angles formed between all principal rays emanating from the intermediate field plane on the one hand and the optical axis of the projection lens on the other hand differs from 0°.

    摘要翻译： 投影曝光装置具有物镜面，像面，光轴和非远心入射光瞳的投影透镜。 该装置还包括具有中间场平面和场停止的照明系统。 场停止件位于中间场平面中或紧邻中间场平面，并且在物平面中限定不包含投影透镜的光轴的照明场。 照明系统被配置为使得在物平面中，从一方面从中间场平面发射的所有主光线与另一方面的投影透镜的光轴之间形成的角度的平均值不同于0°。