SIMULTANEOUS PROCESSING OF MULTIPLE PHOTONIC DEVICE LAYERS
    3.
    发明申请
    SIMULTANEOUS PROCESSING OF MULTIPLE PHOTONIC DEVICE LAYERS 有权
    多个光子器件层的同时处理

    公开(公告)号:US20140254978A1

    公开(公告)日:2014-09-11

    申请号:US13789440

    申请日:2013-03-07

    IPC分类号: H01L21/822 G02B6/13

    摘要: Embodiments of the invention describe photonic integrated circuits (PICs) formed using simultaneous fabrication operations performed on photonic device layers. Each device of a PIC may be made from different optimized materials by growing the materials separately, cutting pieces of the different materials and bonding these pieces to a shared wafer. Embodiments of the invention bond photonic device layers so that shared (i.e., common) processing operations may be utilized to make more than one device simultaneously. Embodiments of the invention allow for simpler, more cost effective fabrication of PICs and improve photonic device performance and reliability.

    摘要翻译: 本发明的实施例描述了使用在光子器件层上执行的同时制造操作形成的光子集成电路(PIC)。 PIC的每个装置可以通过分别生长材料而不同的优化材料制成,切割不同材料的片并将这些片粘合到共享的晶片上。 本发明的实施例将光子器件层结合起来,使得可以利用共享的(即共同的)处理操作来同时制造多个器件。 本发明的实施例允许PIC的更简单,更经济有效的制造并且提高光子器件的性能和可靠性。

    Etch-selective bonding layer for hybrid photonic devices
    4.
    发明授权
    Etch-selective bonding layer for hybrid photonic devices 有权
    用于混合光子器件的蚀刻选择性结合层

    公开(公告)号:US08774582B1

    公开(公告)日:2014-07-08

    申请号:US13461634

    申请日:2012-05-01

    摘要: “Hybrid photonic devices” describe devices wherein the optical portion—i.e., the optical mode, comprises both the silicon and III-V semiconductor regions, and thus the refractive index of the semiconductor materials and the refractive index of the bonding layer region directly effects the optical function of the device. Prior art devices utilize an optically compliant layer that is the same material as the III-V substrate; however, during the final sub-process of the bonding process, the substrates must be removed by acids. These acids can etch into the bonding layer, causing imperfections to propagate at the interface of the bonded material, adversely affecting the optical mode shape and propagation loss of the device.Embodiments of the invention utilize a semiconductor etch-selective bonding layer that is not affected by the final stages of the bonding process (e.g., substrate removal), and thus protects the bonding interface layer from being affected.

    摘要翻译: “混合光子器件”描述了其中光学部分即光学模式包括硅和III-V半导体区域的器件,因此半导体材料的折射率和结合层区域的折射率直接影响 光学功能的设备。 现有技术的装置利用与III-V衬底相同材料的光学柔顺层; 然而,在接合过程的最后一个子过程中,基底必须被酸去除。 这些酸可以蚀刻到结合层中,导致缺陷在接合材料的界面处传播,不利地影响器件的光学模式形状和传播损耗。 本发明的实施例利用不受接合工艺的最后阶段(例如,衬底移除)的影响的半导体蚀刻选择性接合层,并且因此保护接合界面层免受影响。

    ACID BLOCK FOR HYBRID SILICON DEVICE PROCESSING COMPATIBLE WITH LOW-LOSS WAVEGUIDES
    8.
    发明申请
    ACID BLOCK FOR HYBRID SILICON DEVICE PROCESSING COMPATIBLE WITH LOW-LOSS WAVEGUIDES 有权
    混合硅装置处理与低损耗波形相容的块

    公开(公告)号:US20100166360A1

    公开(公告)日:2010-07-01

    申请号:US12346779

    申请日:2008-12-30

    IPC分类号: G02B6/12 G02B6/10

    CPC分类号: G02B6/122 G02B6/136

    摘要: An acid-stop structure for a rib waveguide comprises a fin structure formed between the sidewalls in each rib channel of the rib waveguide, thereby preventing acids and other etchants from flowing down the rib channel and under a die that has been bonded to a wafer.

    摘要翻译: 用于肋波导的止酸结构包括形成在肋波导管的每个肋通道中的侧壁之间的翅片结构,从而防止酸和其它蚀刻剂沿着肋通道向下流动并且已经结合到晶片的模具下方。

    Hybrid ridge waveguide
    9.
    发明授权
    Hybrid ridge waveguide 有权
    混合脊波导

    公开(公告)号:US08380033B1

    公开(公告)日:2013-02-19

    申请号:US13450328

    申请日:2012-04-18

    IPC分类号: G02B6/10

    摘要: Embodiments of the invention relate to an electro-optic device comprising a first region of silicon semiconductor material and a second region of III-V semiconductor material. A waveguide of the optical device is formed in part by a ridge in the second region. An optical mode of the waveguide is laterally confined by the ridge of the second region and vertically confined by a vertical boundary included in the first region. The ridge structure further serves as a current confinement structure over the active region of the electro-optic device, eliminating the need for implantation or other structures that are known to present reliability problems during manufacturing. The lack of “voids” and implants in electro-optic devices according to embodiments of the invention leads to better device reliability, process repeatability and improved mechanical strength.

    摘要翻译: 本发明的实施例涉及包括硅半导体材料的第一区域和III-V半导体材料的第二区域的电光器件。 光学器件的波导部分地由第二区域中的脊形成。 波导的光学模式由第二区域的脊横向限制,并且由包括在第一区域中的垂直边界垂直限制。 脊结构还用作电光器件的有源区域上的电流限制结构,消除了在制造期间已知可能出现可靠性问题的植入或其他结构的需要。 在根据本发明的实施例的电光装置中缺少空隙和植入物导致更好的装置可靠性,工艺重复性和改进的机械强度。

    Acid block for hybrid silicon device processing compatible with low-loss waveguides
    10.
    发明授权
    Acid block for hybrid silicon device processing compatible with low-loss waveguides 有权
    用于与低损耗波导兼容的混合硅器件处理的酸性块

    公开(公告)号:US08150228B2

    公开(公告)日:2012-04-03

    申请号:US12346779

    申请日:2008-12-30

    IPC分类号: G02B6/10 G02B6/00

    CPC分类号: G02B6/122 G02B6/136

    摘要: An acid-stop structure for a rib waveguide comprises a fin structure formed between the sidewalls in each rib channel of the rib waveguide, thereby preventing acids and other etchants from flowing down the rib channel and under a die that has been bonded to a wafer.

    摘要翻译: 用于肋波导的止酸结构包括形成在肋波导管的每个肋通道中的侧壁之间的翅片结构,从而防止酸和其它蚀刻剂沿着肋通道向下流动并且已经结合到晶片的模具下方。