利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

68 条记录 (耗时 0.029 秒)

    Heat-sensitive coating compositions based on resorcinyl triazine derivatives
    1.
    发明授权
    Heat-sensitive coating compositions based on resorcinyl triazine derivatives 有权
    基于间苯二酚三嗪衍生物的热敏涂料组合物

    公开(公告)号：US08865620B2

    公开(公告)日：2014-10-21

    申请号：US12529718

    申请日：2008-03-05

    申请人： Allan Francis Cunningham ,  Thomas Ehlis ,  Jean-Luc Birbaum ,  Pascal Hayoz ,  Kamalesh Pai Fondekar

    发明人： Allan Francis Cunningham ,  Thomas Ehlis ,  Jean-Luc Birbaum ,  Pascal Hayoz ,  Kamalesh Pai Fondekar

    IPC分类号： B41M5/333 ,  C09D5/26 ,  C08K5/3492 ,  C09D7/00

    CPC分类号： B41M5/3335 ,  B41M5/3336 ,  C08K5/3492 ,  C09D5/26 ,  C09D7/41 ,  Y10T428/24802

    摘要： The present invention provides heat-sensitive coating compositions, which comprise a color developer of formula (1) or mixtures thereof wherein R1 can be hydrogen, C1-20-alkyl, C3-8-cycloalkyl, C2-10-alkenyl, aryl or SO3H, and R2 and R3 can be the same or different and can be hydrogen, halogen, C1-20-alkyl, C3-8-cyclo-alkyl, C2-10-alkenyl, aryl, OR6, NR7R8, SR9, SO3H or COOR10 and R4 and R5 can be the same or different, and can be hydrogen, halogen, C1-20-alkyl, C3-8-cyclo-alkyl, C2-10-alkenyl, aryl, OR6, NR7R8 or SR9, R6, R7, R8, R9 and R10 can be the same or different and can be hydrogen, C1-30-alkyl, C3-8-cycloalkyl, C2-10-alkenyl or aryl, wherein C1-20-alkyl can be unsubstituted or substituted with one or more C3-8-cycloalkyl, C2-10-alkenyl, phenyl, halogen, OR11, NR12R13, SR14, SO3H or COOR15, and aryl can be unsubstituted or substituted with one or more halogen, C1-10-alkyl, halogenated C1-10-alkyl, C3-8-cycloalkyl C2-10-alkenyl, phenyl, OR11, NR12R13, SR14, SO3H or COOR15, wherein R11, R12, R13, R14 and R15 can be the same or different and can be hydrogen, C1-10-alkyl, C3-8-cycloalkyl or C2-10-alkenyl, a process for the preparation of these compositions, a process of coating substrates with these compositions, substrates coated with these compositions, a process for preparing marked substrates using these compositions, marked substrates obtainable by the latter process, and certain color developers.

    摘要翻译： 本发明提供热敏涂料组合物，其包含式（1）的显色剂或其混合物，其中R 1可以是氢，C 1-20烷基，C 3-8 - 环烷基，C 2-10 - 烯基，芳基或SO 3 H ，R2和R3可以相同或不同，可以是氢，卤素，C 1-20烷基，C 3-8 - 环烷基，C 2-10 - 烯基，芳基，OR 6，NR 7 R 8，SR 9，SO 3 H或COOR 10和 R4和R5可以相同或不同，可以是氢，卤素，C 1-20烷基，C 3-8 - 环烷基，C 2-10 - 烯基，芳基，OR 6，NR 7 R 8或SR 9，R 6，R 7，R 8 ，R 9和R 10可以相同或不同，并且可以是氢，C 1-30 - 烷基，C 3-8 - 环烷基，C 2-10 - 烯基或芳基，其中C 1-20 - 烷基可以是未取代的或被一个或多个 C 3-8 - 环烷基，C 2-10 - 烯基，苯基，卤素，OR 11，NR 12 R 13，SR 14，SO 3 H或COOR 15，芳基可以是未被取代的或被一个或多个卤素取代，C 1-10烷基，卤代C 1-10 - 烷基，C 3-8 - 环烷基C2-10 - 烯基，苯基，OR11，NR12R13，SR14，SO3H或COOR15，其中 在R 11，R 12，R 13，R 14和R 15可以相同或不同，可以是氢，C 1-10 - 烷基，C 3-8 - 环烷基或C 2-10 - 烯基，一种制备这些组合物的方法， 涂覆这些组合物的基材，用这些组合物涂布的基材，使用这些组合物制备标记的基材的方法，通过后一方法获得的标记的底物和某些显色剂。

    HEAT-SENSITIVE COATING COMPOSITIONS BASED ON RESORCINYL TRIAZINE DERIVATIVES
    2.
    发明申请
    HEAT-SENSITIVE COATING COMPOSITIONS BASED ON RESORCINYL TRIAZINE DERIVATIVES 有权
    基于间苯二酚衍生物的热敏涂料组合物

    公开(公告)号：US20110311786A1

    公开(公告)日：2011-12-22

    申请号：US12529718

    申请日：2008-03-05

    申请人： Allan Francis Cunningham ,  Thomas Ehlis ,  Jean-Luc Birbaum ,  Pascal Hayoz ,  Kamalesh Pai Fondekar

    发明人： Allan Francis Cunningham ,  Thomas Ehlis ,  Jean-Luc Birbaum ,  Pascal Hayoz ,  Kamalesh Pai Fondekar

    IPC分类号： B41M5/28 ,  C08K5/3492 ,  B05D3/06 ,  C09D129/04 ,  C09D109/08 ,  B05D3/02 ,  C07D251/24 ,  C09D133/08

    CPC分类号： B41M5/3335 ,  B41M5/3336 ,  C08K5/3492 ,  C09D5/26 ,  C09D7/41 ,  Y10T428/24802

    摘要： The present invention provides heat-sensitive coating compositions, which comprise a colour developer of formula (1) or mixtures thereof wherein R can be hydrogen, C1-20-alkyl, C3-8-cycloalkyl, C2-10-alkenyl, aryl or SO3H, and R2 and R3 can be the same or different and can be hydrogen, halogen, C1-20-alkyl, C3-8-cyclo-alkyl, C2-10-alkenyl, aryl, OR6, NR7R8, SR9, SO3H or COOR10 and R4 and R5 can be the same or different, and can be hydrogen, halogen, C1-20-alkyl, C3-8-cyclo-alkyl, C2-10-alkenyl, aryl, OR6, NR7R8 or SR9, R6, R7, R8, R9 and R10 can be the same or different and can be hydrogen, C1-30-alkyl, C3-8-cycloalkyl, C2-10-alkenyl or aryl, wherein C1-20-alkyl can be unsubstituted or substituted with one or more C3-8-cycloalkyl, C2-10-alkenyl, phenyl, halogen, OR11, NR12R13, SR14, SO3H or COOR15, and aryl can be unsubstituted or substituted with one or more halogen, C1-10-alkyl, halogenated C1-10-alkyl, C3-8-cycloalkyl C2-10-alkenyl, phenyl, OR11, NR12R13, SR14, SO3H or COOR15, wherein R11, R12, R13, R14 and R15 can be the same or different and can be hydrogen, C1-10-alkyl, C3-8-cycloalkyl or C2-10-alkenyl, a process for the preparation of these compositions, a process of coating substrates with these compositions, substrates coated with these compositions, a process for preparing marked substrates using these compositions, marked substrates obtainable by the latter process, and certain colour developers.

    摘要翻译： 本发明提供热敏涂料组合物，其包含式（1）的显色剂或其混合物，其中R可以是氢，C 1-20烷基，C 3-8 - 环烷基，C 2-10 - 烯基，芳基或SO 3 H ，R2和R3可以相同或不同，可以是氢，卤素，C 1-20烷基，C 3-8 - 环烷基，C 2-10 - 烯基，芳基，OR 6，NR 7 R 8，SR 9，SO 3 H或COOR 10和 R4和R5可以相同或不同，可以是氢，卤素，C 1-20烷基，C 3-8 - 环烷基，C 2-10 - 烯基，芳基，OR 6，NR 7 R 8或SR 9，R 6，R 7，R 8 ，R 9和R 10可以相同或不同，并且可以是氢，C 1-30 - 烷基，C 3-8 - 环烷基，C 2-10 - 烯基或芳基，其中C 1-20 - 烷基可以是未取代的或被一个或多个 C 3-8 - 环烷基，C 2-10 - 烯基，苯基，卤素，OR 11，NR 12 R 13，SR 14，SO 3 H或COOR 15，芳基可以是未被取代的或被一个或多个卤素取代，C 1-10烷基，卤代C 1-10 - 烷基，C 3-8 - 环烷基C2-10 - 烯基，苯基，OR11，NR12R13，SR14，SO3H或COOR15，其中 在R 11，R 12，R 13，R 14和R 15可以相同或不同，可以是氢，C 1-10 - 烷基，C 3-8 - 环烷基或C 2-10 - 烯基，一种制备这些组合物的方法， 涂覆这些组合物的基材，用这些组合物涂布的基材，使用这些组合物制备标记的基材的方法，通过后一方法获得的标记的底物和某些显色剂。

    Sulphonium Salt Initiators
    3.
    发明申请
    Sulphonium Salt Initiators 有权
    锍盐引发剂

    公开(公告)号：US20090208872A1

    公开(公告)日：2009-08-20

    申请号：US11922444

    申请日：2006-06-21

    申请人： Jean-Pierre Wolf ,  Attila Latika ,  Jean-Luc Birbaum ,  Stephan Ilg ,  Pascal Hayoz

    发明人： Jean-Pierre Wolf ,  Attila Latika ,  Jean-Luc Birbaum ,  Stephan Ilg ,  Pascal Hayoz

    IPC分类号： G03F7/20 ,  G03F7/004 ,  C07D209/88 ,  C07C321/30

    CPC分类号： C07D209/88 ,  B33Y70/00 ,  C07C309/06 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/038 ,  Y10S430/122

    摘要： Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent acid generators.

    摘要翻译： 式（I），（II），（III），（IV）的化合物，其中R是氢，C 1 -C 20烷基; 被一个或多个O中断的C 2 -C 20烷基; 是-L-X-R2或-L-R2; R1具有例如R给出的含义之一; R2是单价敏化剂或光引发剂部分; Ar 1和Ar 2例如彼此独立地是被C 1 -C 20烷基，卤素或OR 3取代的苯基; 或未取代的萘基，蒽基，菲基或联苯基; 或被C 1 -C 20烷基，OH或OR 3取代的萘基，蒽基，菲基或联苯基; 或为-Ar4-A-Ar3; Ar 3是未取代的苯基萘基，蒽基，菲基或联苯基; 或由C 1 -C 20烷基，OR 3或苯甲酰基取代的苯基，萘基，蒽基，菲基或联苯基; Ar4是亚苯基，亚萘基，亚蒽基或菲基; A是直接键合，S，O或C1-C20亚烷基; X是CO，C（O）O，OC（O），O，S或NR 3; L是被一个或多个O中断的C1-C20亚烷基或C2-C20亚烷基; R3是C1-C20烷基或C1-C20羟烷基; 并且Y是阴离子，适合作为光潜酸产生剂。

    Sulphonium salt initiators
    5.
    发明授权
    Sulphonium salt initiators 有权
    锍盐引发剂

    公开(公告)号：US07901867B2

    公开(公告)日：2011-03-08

    申请号：US11922444

    申请日：2006-06-21

    申请人： Jean-Pierre Wolf ,  Attila Latika ,  Jean-Luc Birbaum ,  Stephan Ilg ,  Pascal Hayoz

    发明人： Jean-Pierre Wolf ,  Attila Latika ,  Jean-Luc Birbaum ,  Stephan Ilg ,  Pascal Hayoz

    IPC分类号： G03F7/004 ,  G03F7/30 ,  C07C381/12

    CPC分类号： C07D209/88 ,  B33Y70/00 ,  C07C309/06 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/038 ,  Y10S430/122

    摘要： Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent acid generators.

    摘要翻译： 式（I），（II），（III），（IV）的化合物，其中R是氢，C 1 -C 20烷基; 被一个或多个O中断的C 2 -C 20烷基; 是-L-X-R2或-L-R2; R1具有例如R给出的含义之一; R2是单价敏化剂或光引发剂部分; Ar 1和Ar 2例如彼此独立地是被C 1 -C 20烷基，卤素或OR 3取代的苯基; 或未取代的萘基，蒽基，菲基或联苯基; 或被C 1 -C 20烷基，OH或OR 3取代的萘基，蒽基，菲基或联苯基; 或为-Ar4-A-Ar3; Ar 3是未取代的苯基萘基，蒽基，菲基或联苯基; 或由C 1 -C 20烷基，OR 3或苯甲酰基取代的苯基，萘基，蒽基，菲基或联苯基; Ar4是亚苯基，亚萘基，亚蒽基或菲基; A是直接键合，S，O或C1-C20亚烷基; X是CO，C（O）O，OC（O），O，S或NR 3; L是被一个或多个O中断的C 1 -C 20亚烷基或C 2 -C 20亚烷基; R3是C1-C20烷基或C1-C20羟烷基; 并且Y是阴离子，适合作为光潜酸产生剂。

    Symmetrical triazine derivatives
    8.
    发明授权
    Symmetrical triazine derivatives 有权
    对称三嗪衍生物

    公开(公告)号：US07311897B2

    公开(公告)日：2007-12-25

    申请号：US10804676

    申请日：2004-03-19

    申请人： Thomas Ehlis ,  Stefan Müller ,  Pascal Hayoz

    发明人： Thomas Ehlis ,  Stefan Müller ,  Pascal Hayoz

    IPC分类号： A61Q17/04 ,  A61Q19/00 ,  A61K8/00

    CPC分类号： C07D251/24 ,  A61K8/4966 ,  A61Q17/04

    摘要： Disclosed is the use of the compounds of formula wherein A is a radical of formula R1 and R5 independently from each other are hydrogen; C1-C18alkyl; or C6-C12aryl; R2, R3 and R4 independently from each other are hydrogen; or a radical of formula wherein, in formula (1a), at least one of the radicals R2, R3 and R4 are a radical of formula (1c); R6, R7, R8, R9 and R10 independently from each other are hydrogen; hydroxy; halogen; C1-C18alkyl; C1-C18alkoxy; C6-C12aryl; biphenylyl; C6-C12aryloxy; C1-C18alkylthio; carboxy; —COOM; C1-C18-alkylcarboxyl; aminocarbonyl; or mono- or di-C1-C18alkylamino; C1-C10acylamino; —COOH; M is an alkali metal ion; x is 1 or 2; and y is a number from 2 to 10; for the protection of human and animal hair and skin against the damaging effect of UV radiation. The compounds of formula (1) are high effective UV absorbers for cosmetic formulations aund can be—depending on their physical properties be used in micronized or soluble form.

    摘要翻译： 公开了下式化合物的用途，其中A是式R 1和R 5的基团彼此独立地是氢; C 1 -C 18烷基; 或C 6 -C 12 - 芳基; R 2，R 3和R 4彼此独立地是氢; 或式（1a）的基团，其中在式（1a）中，基团R 2，R 3和R 4中的至少一个为 式（1c）的基团; R 6，R 7，R 8，R 9和R 10独立地是 彼此是氢; 羟基; 卤素; C 1 -C 18烷基; C 1 -C 18烷氧基; C 6 -C 12芳基; 联苯基 C 6 -C 12芳氧基; C 1 -C 18烷硫基; 羧基; -COOM; C 1 -C 18 - 烷基羧基; 氨基羰基; 或单或二-C 1 -C 18烷基氨基; C 1 -C 10酰基氨基; -COOH; M是碱金属离子; x为1或2; y为2〜10的数; 用于保护人体和动物毛发和皮肤免受紫外线辐射的破坏作用。 式（1）的化合物是用于化妆品制剂的高效UV吸收剂，可以取决于它们以微粉化或可溶形式使用的物理性质。