Spinous process implants and methods of using the same
    1.
    发明申请
    Spinous process implants and methods of using the same 审中-公开
    旋转式植入物及其使用方法

    公开(公告)号:US20080294199A1

    公开(公告)日:2008-11-27

    申请号:US11802932

    申请日:2007-05-25

    摘要: Devices and methods for performing a procedure within a spine are disclosed herein. In one embodiment, a method includes coupling a first C-shaped implant to a first spinous process. A second C-shaped implant is coupled to an adjacent second spinous process of the spinal column. At least a portion of an outer surface of the first implant is configured to contact at least a portion of an outer surface of the second implant when the spinal column is in extension. The outer surface of the first implant and the outer surface of the second implant being at a spaced distance from each other when the spinal column is in flexion.

    摘要翻译: 本文公开了用于在脊柱内执行程序的装置和方法。 在一个实施例中,一种方法包括将第一C形植入物联接到第一棘突。 第二个C形植入物联接到脊柱的相邻的第二棘突。 当脊柱延伸时,第一植入物的外表面的至少一部分构造成接触第二植入物的外表面的至少一部分。 当脊柱弯曲时,第一植入物的外表面和第二植入物的外表面彼此间隔开。

    Spinous process implants and methods of using the same
    2.
    发明申请
    Spinous process implants and methods of using the same 审中-公开
    旋转式植入物及其使用方法

    公开(公告)号:US20080294200A1

    公开(公告)日:2008-11-27

    申请号:US11802931

    申请日:2007-05-25

    IPC分类号: A61B17/70 A61B17/58 A61F2/44

    摘要: Devices and methods for performing a procedure within a spine are disclosed herein. In one embodiment, a method includes disposing an implant adjacent a side of a spinous process. A first portion of the implant is placed over a top side of the spinous process in a lateral direction. A second portion of the implant is placed under a bottom side of the spinous process in a lateral direction such that at least a portion of the spinous process is disposed within an interior region defined by the implant. In another embodiment, an apparatus includes an implant configured to be coupled to a spinous process. The implant has an outer surface configured to contact at least one of a second implant or an interspinous-process spacer. A closure member is coupled to the implant and has an open configuration and a closed configuration to secure the implant to the spinous process.

    摘要翻译: 本文公开了用于在脊柱内执行程序的装置和方法。 在一个实施例中,一种方法包括将植入件邻近棘突的一侧布置。 植入物的第一部分沿横向放置在棘突的顶侧上。 植入物的第二部分沿横向方向放置在棘突的底部下方,使得棘突的至少一部分设置在由植入物限定的内部区域内。 在另一个实施例中,一种装置包括配置成与棘突连接的植入物。 植入物具有被配置为接触第二植入物或椎间间突间隔物中的至少一个的外表面。 闭合构件联接到植入物并且具有打开构造和闭合构造以将植入物固定到棘突。