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    Multi-zone resistive heater
    1.
    发明申请
    Multi-zone resistive heater 审中-公开
    多区电阻加热器

    公开(公告)号：US20070125762A1

    公开(公告)日：2007-06-07

    申请号：US11293626

    申请日：2005-12-01

    申请人： Anqing Cui ,  Binh Tran ,  Alexander Tam ,  Jacob Smith ,  R. Iyer ,  Joseph Yudovsky ,  Sean Seutter

    发明人： Anqing Cui ,  Binh Tran ,  Alexander Tam ,  Jacob Smith ,  R. Iyer ,  Joseph Yudovsky ,  Sean Seutter

    IPC分类号： H05B3/68

    CPC分类号： H01L21/67103

    摘要： Apparatus, reactors, and methods for heating substrates are disclosed. The apparatus comprises a stage comprising a body and a surface having an area to support a substrate, a shaft coupled to the stage, a first heating element disposed within a central region of the body of the stage, and at least second and third heating elements disposed within the body of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other.

    摘要翻译： 公开了用于加热基底的装置，反应器和方法。 该装置包括一个舞台，包括主体和具有支撑衬底的区域的表面，耦合到舞台的轴，设置在舞台的身体的中心区域内的第一加热元件，以及至少第二和第三加热元件 设置在所述台体内，所述至少第二和第三加热元件各自部分地围绕所述第一加热元件，并且其中所述至少第二和第三加热元件彼此周向相邻。

    Multi-Zone Resistive Heater
    2.
    发明申请
    Multi-Zone Resistive Heater 有权
    多区电阻加热器

    公开(公告)号：US20090314762A1

    公开(公告)日：2009-12-24

    申请号：US12485160

    申请日：2009-06-16

    申请人： Anqing Cui ,  Binh Tran ,  Alexander Tam ,  Jacob W. Smith ,  R. Suryanarayanan Iyer ,  Joseph Yudovsky ,  Sean M. Seutter

    发明人： Anqing Cui ,  Binh Tran ,  Alexander Tam ,  Jacob W. Smith ,  R. Suryanarayanan Iyer ,  Joseph Yudovsky ,  Sean M. Seutter

    IPC分类号： H05B3/68

    CPC分类号： H01L21/67103 ,  H01L21/67248 ,  H05B3/68

    摘要： Apparatus, reactors, and methods for heating substrates are disclosed. The apparatus comprises a stage comprising a body and a surface having an area to support a substrate, a shaft coupled to the stage, a first heating element disposed within a central region of the body of the stage, and at least second and third heating elements disposed within the body of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other.

    摘要翻译： 公开了用于加热基底的装置，反应器和方法。 该装置包括一个舞台，包括主体和具有支撑衬底的区域的表面，耦合到舞台的轴，设置在舞台的身体的中心区域内的第一加热元件，以及至少第二和第三加热元件 设置在所述台体内，所述至少第二和第三加热元件各自部分地围绕所述第一加热元件，并且其中所述至少第二和第三加热元件彼此周向相邻。

    Substrate support with substrate heater and symmetric RF return
    5.
    发明授权
    Substrate support with substrate heater and symmetric RF return 有权
    衬底支撑与衬底加热器和对称RF返回

    公开(公告)号：US08618446B2

    公开(公告)日：2013-12-31

    申请号：US13173471

    申请日：2011-06-30

    申请人： Yu Chang ,  Gwo-Chuan Tzu ,  Anqing Cui ,  William W. Kuang ,  Olkan Cuvalci

    发明人： Yu Chang ,  Gwo-Chuan Tzu ,  Anqing Cui ,  William W. Kuang ,  Olkan Cuvalci

    IPC分类号： A21B1/00 ,  C23C16/00

    CPC分类号： F27B17/0025 ,  H01J37/32091 ,  H01J37/32715 ,  H01L21/67103 ,  H01L21/67248

    摘要： Apparatus for processing a substrate are provided herein. In some embodiments, a substrate support includes a substrate support surface and a shaft; an RF electrode disposed in the substrate support proximate the substrate support surface to receive RF current from an RF source; a heater disposed proximate the substrate support surface to provide heat to a substrate when disposed on the substrate support surface, the heater having one or more conductive lines to provide power to the heater; a thermocouple to measure the temperature of a substrate when disposed on the substrate support surface; and a conductive element having an interior volume with the one or more conductive lines and the thermocouple disposed through the interior volume, the conductive element coupled to the RF electrode and having an electric field of about zero in the interior volume when RF current is flowed through the conductive element.

    摘要翻译： 本文提供了用于处理基板的装置。 在一些实施例中，衬底支撑件包括衬底支撑表面和轴; 设置在所述衬底支撑件中的RF电极，靠近所述衬底支撑表面以从RF源接收RF电流; 设置在所述基板支撑表面附近的加热器，以在设置在所述基板支撑表面上时向所述基板提供热量，所述加热器具有一个或多个导线以向所述加热器提供电力; 当设置在基板支撑表面上时测量基板的温度的热电偶; 以及具有内部体积的导电元件，所述一个或多个导电线和所述热电偶设置穿过所述内部体积，所述导电元件耦合到所述RF电极，并且当RF电流流过所述内部体积时具有约零的电场 导电元件。

    PLASMA REACTOR WITH A CEILING ELECTRODE SUPPLY CONDUIT HAVING A SUCCESSION OF VOLTAGE DROP ELEMENTS
    6.
    发明申请
    PLASMA REACTOR WITH A CEILING ELECTRODE SUPPLY CONDUIT HAVING A SUCCESSION OF VOLTAGE DROP ELEMENTS 有权
    具有带电压下降元件继电器的天花板电极管的等离子体反应器

    公开(公告)号：US20100096085A1

    公开(公告)日：2010-04-22

    申请号：US12255492

    申请日：2008-10-21

    申请人： OLKAN CUVALCI ,  Yu Chang ,  William Kuang ,  Anqing Cui ,  Seshadri Ganguli

    发明人： OLKAN CUVALCI ,  Yu Chang ,  William Kuang ,  Anqing Cui ,  Seshadri Ganguli

    IPC分类号： C23F1/08 ,  C23C16/44

    CPC分类号： H01J37/3244 ,  C23C16/455 ,  H01J37/32091 ,  H01J37/32541

    摘要： A bridge assembly includes an electrically insulating hollow tube or bridge having a pair of ends, the bridge being supported at one of the ends over the cylindrical side wall and being supported at the other of the ends over the electrode. The bridge assembly further includes a set of conductive rings surrounding the hollow tube and spaced from one another along the length of the bridge, and plural electrically resistive elements. Each of the resistive elements has a pair of flexible connectors, respective ones the resistive elements connected at their flexible connectors between respective pairs of the rings to form a series resistor assembly.

    摘要翻译： 桥组件包括具有一对端部的电绝缘中空管或桥，所述桥被支撑在所述圆柱形侧壁上的一端，并且在所述电极的另一端支撑。 桥接组件还包括围绕中空管并且沿着桥的长度彼此间隔开的一组导电环，以及多个电阻元件。 每个电阻元件具有一对柔性连接器，相应的电阻元件在相应的成对环之间的柔性连接器处连接以形成串联电阻器组件。

    Multi-zone resistive heater
    7.
    发明授权
    Multi-zone resistive heater 失效

    公开(公告)号：US06617553B2

    公开(公告)日：2003-09-09

    申请号：US10246865

    申请日：2002-09-19

    申请人： Henry Ho ,  Anqing Cui ,  Xiaoxiong Yuan

    发明人： Henry Ho ,  Anqing Cui ,  Xiaoxiong Yuan

    IPC分类号： H05B368

    CPC分类号： H01L21/67248 ,  H01L21/67103 ,  H01L21/67109

    摘要： A heating apparatus including a stage comprising a surface having an area to support a wafer and a body, a shaft coupled to the stage, and a first and a second heating element. The first heating element is disposed within a first plane of the body of the stage. The second heating element is disposed within a second plane of the body of the stage at a greater distance from the surface of the stage than the first heating element, and the second heating element is offset from the first heating element in a plane substantially parallel to at least one of the first plane and the second plane.

    Plasma reactor with a ceiling electrode supply conduit having a succession of voltage drop elements
    8.
    发明授权
    Plasma reactor with a ceiling electrode supply conduit having a succession of voltage drop elements 有权
    具有天花板电极供应导管的等离子体反应器具有一系列电压降元件

    公开(公告)号：US09202674B2

    公开(公告)日：2015-12-01

    申请号：US12255492

    申请日：2008-10-21

    申请人： Olkan Cuvalci ,  Yu Chang ,  William Kuang ,  Anqing Cui ,  Seshadri Ganguli

    发明人： Olkan Cuvalci ,  Yu Chang ,  William Kuang ,  Anqing Cui ,  Seshadri Ganguli

    IPC分类号： H01J37/32 ,  C23C16/455

    CPC分类号： H01J37/3244 ,  C23C16/455 ,  H01J37/32091 ,  H01J37/32541

    摘要： A bridge assembly includes an electrically insulating hollow tube or bridge having a pair of ends, the bridge being supported at one of the ends over the cylindrical side wall and being supported at the other of the ends over the electrode. The bridge assembly further includes a set of conductive rings surrounding the hollow tube and spaced from one another along the length of the bridge, and plural electrically resistive elements. Each of the resistive elements has a pair of flexible connectors, respective ones the resistive elements connected at their flexible connectors between respective pairs of the rings to form a series resistor assembly.

    摘要翻译： 桥组件包括具有一对端部的电绝缘中空管或桥，所述桥被支撑在所述圆柱形侧壁上的一端，并且在所述电极的另一端支撑。 桥接组件还包括围绕中空管并且沿着桥的长度彼此间隔开的一组导电环，以及多个电阻元件。 每个电阻元件具有一对柔性连接器，相应的电阻元件在相应的成对环之间的柔性连接器处连接以形成串联电阻器组件。