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公开(公告)号：US5993289A
公开(公告)日：1999-11-30
申请号：US35319
申请日：1998-03-05
IPC分类号： B24B37/04 , B24B49/04 , B24B49/12 , G05B19/401 , G05B19/402
CPC分类号： B24B37/0053 , B24B37/04 , B24B49/04 , B24B49/12 , G05B19/401 , G05B19/402 , G05B2219/23231 , G05B2219/36372 , G05B2219/37002 , G05B2219/37117 , G05B2219/37125 , G05B2219/37266 , G05B2219/37283 , G05B2219/37286 , G05B2219/37573 , G05B2219/45232
摘要： A method for detecting the presence of a workpiece on a polishing pad of a chemical mechanical polishing (CMP) machine applies an optical interrogation signal to a workpiece during the CMP process. An optical probe assembly produces a light signal that communicates with the polishing pad; portions of the light signal reflect from the polishing pad in a scattered manner. A light receptor receives reflected light associated with the interrogation signal, and the characteristics of the received light are analyzed and processed by a suitable processor. By analyzing the scattered light signals, the method distinguishes the reflective characteristics of the polishing pad from the reflective characteristics of the workpiece. Thus, the method may be used to detect a lost or broken workpiece in a fast and effective manner.
摘要翻译： 用于检测在化学机械抛光（CMP）机器的抛光垫上的工件的存在的方法在CMP工艺期间向工件应用光学询问信号。 光学探头组件产生与抛光垫连通的光信号; 光信号的一部分以分散的方式从抛光垫反射。 光接收器接收与询问信号相关联的反射光，并且接收的光的特性由合适的处理器分析和处理。 通过分析散射光信号，该方法将抛光垫的反射特性与工件的反射特性区分开。 因此，该方法可以用于以快速有效的方式检测损失或破碎的工件。
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2.发明授权Apparatus for the in-process detection of workpieces with a monochromatic light source 失效用于使用单色光源在工件中检测工件的装置
公开(公告)号：US5823853A
公开(公告)日：1998-10-20
申请号：US781132
申请日：1997-01-09
IPC分类号： B24B37/04 , B24B49/04 , B24B49/12 , G05B19/401 , G05B19/402 , H01L21/304 , H01L21/66 , B24B49/00
CPC分类号： B24B37/0053 , B24B37/04 , B24B49/04 , B24B49/12 , G05B19/401 , G05B19/402 , G05B2219/23231 , G05B2219/36372 , G05B2219/37002 , G05B2219/37117 , G05B2219/37125 , G05B2219/37266 , G05B2219/37283 , G05B2219/37286 , G05B2219/37573 , G05B2219/45232
摘要： An apparatus for use with a chemical mechanical planarization (CMP) system includes an infrared LED emitter that generates an interrogation signal and directs the interrogation signal toward a polishing pad configured to process a workpiece during the CMP procedure. A reflected signal produced in response to the interrogation signal is received by a detector, and the reflected signal is processed by a converter to produce a control signal having an analog voltage. The control signal is processed and an output is produced indicative of the presence of extraneous material proximate an area of the polishing pad when the analog voltage is measured within a predetermined range. The predetermined voltage range is established such that a variety of polishing pads having different physical characteristics may be employed without altering the position of the emitter or the operating parameters of the apparatus.
摘要翻译： 用于化学机械平面化（CMP）系统的装置包括红外LED发射器，其产生询问信号并将询问信号引导到抛光垫，所述抛光垫被配置为在CMP过程期间处理工件。 响应于询问信号产生的反射信号由检测器接收，并且反射信号由转换器处理以产生具有模拟电压的控制信号。 处理控制信号，并且当在预定范围内测量模拟电压时，产生指示在抛光垫的区域附近存在外来材料的输出。 建立预定电压范围，使得可以采用具有不同物理特性的各种抛光垫，而不改变发射器的位置或装置的操作参数。
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3.发明授权
公开(公告)号：US5961369A
公开(公告)日：1999-10-05
申请号：US90666
申请日：1998-06-04
IPC分类号： B24B37/04 , B24B49/04 , B24B49/12 , G05B19/401 , G05B19/402 , H01L21/304 , H01L21/66 , B24B49/00
CPC分类号： B24B37/0053 , B24B37/04 , B24B49/04 , B24B49/12 , G05B19/401 , G05B19/402 , G05B2219/23231 , G05B2219/36372 , G05B2219/37002 , G05B2219/37117 , G05B2219/37125 , G05B2219/37266 , G05B2219/37283 , G05B2219/37286 , G05B2219/37573 , G05B2219/45232
摘要： A method for use with a chemical mechanical planarization (CMP) system includes an infrared LED emitter that generates an interrogation signal and directs the interrogation signal toward a polishing pad configured to process a workpiece during the CMP procedure. A reflected signal produced in response to the interrogation signal is received by a detector, and the reflected signal is processed by a converter to produce a control signal having an analog voltage. The control signal is processed and an output is produced indicative of the presence of extraneous material proximate an area of the polishing pad when the analog voltage is measured within a predetermined range. The predetermined voltage range is established such that a variety of polishing pads having different physical characteristics may be employed without altering the position of the emitter or the operating parameters of the apparatus.
摘要翻译： 与化学机械平面化（CMP）系统一起使用的方法包括产生询问信号的红外LED发射器，并将询问信号引导到抛光垫，所述抛光垫被配置为在CMP过程期间处理工件。 响应于询问信号产生的反射信号由检测器接收，并且反射信号由转换器处理以产生具有模拟电压的控制信号。 处理控制信号，并且当在预定范围内测量模拟电压时，产生指示在抛光垫的区域附近存在外来材料的输出。 建立预定电压范围，使得可以采用具有不同物理特性的各种抛光垫，而不改变发射器的位置或装置的操作参数。
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4.发明授权
公开(公告)号：US5733171A
公开(公告)日：1998-03-31
申请号：US683150
申请日：1996-07-18
IPC分类号： B24B37/04 , B24B49/04 , B24B49/12 , G05B19/401 , G05B19/402
CPC分类号： B24B37/0053 , B24B37/04 , B24B49/04 , B24B49/12 , G05B19/401 , G05B19/402 , G05B2219/23231 , G05B2219/36372 , G05B2219/37002 , G05B2219/37117 , G05B2219/37125 , G05B2219/37266 , G05B2219/37283 , G05B2219/37286 , G05B2219/37573 , G05B2219/45232
摘要： An apparatus for detecting the presence of a workpiece on a polishing pad of a chemical mechanical polishing (CMP) machine employs an optical interrogation signal that is applied during the CMP process. An optical probe assembly produces a light signal that communicates with the polishing pad; portions of the light signal reflect from the polishing pad in a scattered manner. A light receptor receives reflected light associated with the interrogation signal, and the characteristics of the received light are analyzed and processed by a processor used by the apparatus. By analyzing the scattered light signals, the apparatus distinguishes the reflective characteristics of the polishing pad from the reflective characteristics of the workpiece. Thus, the apparatus is capable of detecting a lost or broken workpiece in a fast and effective manner.
摘要翻译： 用于在化学机械抛光（CMP）机器的抛光垫上检测工件的存在的装置采用在CMP工艺期间施加的光学询问信号。 光学探头组件产生与抛光垫连通的光信号; 光信号的一部分以分散的方式从抛光垫反射。 光接收器接收与询问信号相关联的反射光，并且接收的光的特性由设备使用的处理器分析和处理。 通过分析散射光信号，该装置将抛光垫的反射特性与工件的反射特性区分开。 因此，该装置能够以快速有效的方式检测损失或破碎的工件。
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公开(公告)号：US4101325A
公开(公告)日：1978-07-18
申请号：US677633
申请日：1976-04-16
申请人： Robert F. Allen
发明人： Robert F. Allen
CPC分类号： G03D5/003 , G03D15/022 , G03D3/135
摘要： An enclosed conduit such as a tube, and a method for processing webs with a liquid solution, wherein the web is positioned helically around the periphery of the tube. The tube has openings, such as being porous, at least in the helical path of the web. A liquid solution cushion or bearing is formed between the web and periphery of the tube in at least the helical path of the web by continuously directing the liquid solution outwardly through the openings. In one embodiment, the web is transported by drive rollers or belts against which the web is forced, and edge deflected between the convolutions of a helical rail or band wrapped around the periphery of the tube. In another embodiment, the tube is provided with axially spaced, radially extending protuberances on its periphery for edge deflecting the web along a helical path.
摘要翻译： 诸如管的封闭导管和用液体溶液处理幅材的方法，其中所述纤维网围绕所述管的周边螺旋地定位。 管至少在纤维网的螺旋路径中具有诸如多孔的开口。 通过将液体溶液向外延伸通过开口，至少在纤维网的螺旋路径中，在幅材和管周边之间形成液体溶液垫或轴承。 在一个实施例中，腹板通过驱动辊或带被传送，所述腹板被迫使与所述腹板一起被卷绕，并且边缘在缠绕在所述管的周边的螺旋形轨道或带的旋转之间偏转。 在另一个实施例中，管在其周边上设置有轴向间隔开的径向延伸突起，用于沿着螺旋路径偏转腹板。
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公开(公告)号：US06611755B1
公开(公告)日：2003-08-26
申请号：US09466169
申请日：1999-12-19
申请人： John R. Coffee , Richard W. Rudow , Robert F. Allen , Mark Billings , David A. Dye , Mark L. Kirchner , Robert W. Lewis , Kevin M. Marvin , Robert D. Sleeper , William A. Tekniepe
发明人： John R. Coffee , Richard W. Rudow , Robert F. Allen , Mark Billings , David A. Dye , Mark L. Kirchner , Robert W. Lewis , Kevin M. Marvin , Robert D. Sleeper , William A. Tekniepe
IPC分类号： H04B726
CPC分类号： B60P3/03 , B28C5/422 , B28C7/02 , B28C7/028 , B28C9/00 , G01M17/00 , G07C5/008 , G08G1/20 , H04W8/245 , H04W16/14 , H04W28/22 , H04W56/0085 , H04W64/00 , H04W72/10 , H04W74/04 , H04W84/00
摘要： A vehicle fleet management information system identifies location and direction of movement of each vehicle in a fleet in real-time, and automatically reports such information, as well as status of predetermined events in which the vehicle is engaged, directly to the fleet manager. Each fleet vehicle has an assigned time slot to transmit its reporting information over a communications network without interfering with transmissions from other vehicles in their own respective time slots. A timing control phase lock loop (PLL) provides precise time synchronization for timing corrections from a global positioning system (GPS) based time reference. A dual band full-duplex interface of the network has TDMA on one-half and broadcast on the other half. Microprocessor time processing units in components of the network perform precise clock synchronization. Space diversity performed on received vehicle transmitted messages avoids data corruption. Different vehicles have different periodic transmission intervals, by dynamically allocating the slots for various update rates. Auxiliary reporting slots enable prompt reporting of important data by the respective vehicle transmitters independent of the slower periodic transmission intervals.
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公开(公告)号：US06292708B1
公开(公告)日：2001-09-18
申请号：US09096066
申请日：1998-06-11
申请人： Robert F. Allen , Ricardo T. Jordan
发明人： Robert F. Allen , Ricardo T. Jordan
IPC分类号： G06F1900
CPC分类号： G05B19/41865 , G05B19/414 , Y02P90/18 , Y02P90/20
摘要： A distributed control system for a semiconductor wafer processing machine includes a master control module and a plurality of application control modules. Each of the application control modules and the master control module are capable of autonomous, independent operation. The master control module regulates the operation of the application control modules, and the application control modules govern a number of sub-procedures carried out by the wafer processing machine. The sub-procedures may be governed by respective processing recipes that are downloaded from the master control module to the application control modules via a network link architecture.
摘要翻译： 一种用于半导体晶片处理机的分布式控制系统包括主控制模块和多个应用控制模块。 每个应用控制模块和主控模块都能够进行自主独立的操作。 主控模块调节应用控制模块的操作，应用控制模块控制由晶片处理机执行的多个子程序。 子程序可以由通过网络链路架构从主控制模块下载到应用控制模块的相应处理配方来管理。
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公开(公告)号：US3968510A
公开(公告)日：1976-07-06
申请号：US490155
申请日：1974-07-19
申请人： Robert F. Allen
发明人： Robert F. Allen
CPC分类号： G03D15/022 , G03D3/135 , G03D5/003
摘要： An enclosed conduit such as a tube, and a method for processing webs with a liquid solution, wherein the web is positioned helically around the periphery of the tube. The tube has openings, such as being porous, at least in the helical path of the web. A liquid solution cushion or bearing is formed between the web and periphery of the tube in at least the helical path of the web by continuously directing the liquid solution outwardly through the openings. In one embodiment, the web is transported by drive rollers or belts against which the web is forced, and edge deflected between the convolutions of a helical rail or band wrapped around the periphery of the tube. In another embodiment, the tube is provided with axially spaced, radially extending protuberances on its periphery for edge deflecting the web along a helical path.
摘要翻译： 诸如管的封闭导管和用液体溶液处理幅材的方法，其中所述纤维网围绕所述管的周边螺旋地定位。 管至少在纤维网的螺旋路径中具有诸如多孔的开口。 通过将液体溶液向外延伸通过开口，至少在纤维网的螺旋路径中，在幅材和管周边之间形成液体溶液垫或轴承。 在一个实施例中，腹板通过驱动辊或带被传送，所述腹板被迫使与所述腹板一起被卷绕，并且边缘在缠绕在所述管的周边的螺旋形轨道或带的旋转之间偏转。 在另一个实施例中，管在其周边上设置有轴向间隔开的径向延伸突起，用于沿着螺旋路径偏转腹板。
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公开(公告)号：US06892131B2
公开(公告)日：2005-05-10
申请号：US10646715
申请日：2003-08-25
申请人： John R. Coffee , Richard W. Rudow , Robert F. Allen , Mark Billings , David A. Dye , Mark L. Kirchner , Robert W. Lewis , Kevin M. Marvin , Robert D. Sleeper , William A. Tekniepe
发明人： John R. Coffee , Richard W. Rudow , Robert F. Allen , Mark Billings , David A. Dye , Mark L. Kirchner , Robert W. Lewis , Kevin M. Marvin , Robert D. Sleeper , William A. Tekniepe
IPC分类号： B60P3/03 , G07C5/00 , G08G1/123 , H04L12/28 , H04L12/56 , H04W8/24 , H04W16/14 , H04W28/22 , H04W56/00 , H04W64/00 , H04W72/04 , H04W74/04 , H04W84/00 , G06F17/00
CPC分类号： B60P3/03 , B28C5/422 , B28C7/02 , B28C7/028 , B28C9/00 , G01M17/00 , G07C5/008 , G08G1/20 , H04W8/245 , H04W16/14 , H04W28/22 , H04W56/0085 , H04W64/00 , H04W72/10 , H04W74/04 , H04W84/00
摘要： A vehicle fleet management information system for identification of location and direction of movement of each vehicle in the fleet in real-time and automatic communication directly with management offices to report its location and heading, and status of predetermined events in which the vehicle may be engaged. One example is a cement delivery truck which monitors location, speed and status information such as start pour, pouring, end pour, wash and leave job, and automatically transmits this information with a management office without requiring affirmative action by the vehicle operator.
摘要翻译： 一个车队管理信息系统，用于识别车辆中每辆车辆的位置和行驶方向，直接与管理机构进行实时和自动通信，以报告其位置和航向，以及车辆可能参与的预定事件的状态 。 一个例子是监测位置，速度和状态信息（如开始倾倒，倾倒，结束倾倒，洗涤和离开作业）的水泥输送车，并且自动地将其传送到管理室，而不需要车辆操作者的肯定行动。
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10.发明授权Index table and drive mechanism for a chemical mechanical planarization machine 有权化学机械平面化机械的索引表和驱动机构公开(公告)号：US06296546B1
公开(公告)日：2001-10-02
申请号：US09356787
申请日：1999-07-20
申请人： Robert F. Allen , Ricardo T. Jordan
发明人： Robert F. Allen , Ricardo T. Jordan
IPC分类号： B24B722
CPC分类号： B24B37/345 , B23Q16/025 , B24B41/02 , B24B51/00 , Y10T74/14
摘要： A machine for polishing semiconductor wafers including a rotatable index table and a drive mechanism for the index table. The index table temporarily accommodates wafers between processing steps. The drive mechanism includes a continuously circulating grooved timing belt that engages gear teeth formed on an outside diameter portion of the index table to effect rotation of the index table. The index table includes a large diameter central opening for accommodating passage of other system components.
摘要翻译： 一种用于抛光半导体晶圆的机器，包括一个可旋转分度台和一个用于分度台的驱动机构。 索引表在处理步骤之间临时容纳晶片。 驱动机构包括连续循环的带槽的正时皮带，其接合形成在分度台的外径部分上的齿轮，以实现分度台的旋转。 分度表包括用于容纳其它系统部件的通道的大直径中心开口。
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