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    MULTI-TONE SCHEME FOR MASKLESS LITHOGRAPHY
    1.
    发明申请
    MULTI-TONE SCHEME FOR MASKLESS LITHOGRAPHY 有权

    公开(公告)号：US20220326616A1

    公开(公告)日：2022-10-13

    申请号：US17639240

    申请日：2020-08-19

    申请人： Applied Materials, Inc.

    发明人： Christopher Dennis BENCHER ,  Thomas L. LAIDIG ,  Joseph R. JOHNSON

    IPC分类号： G03F7/20

    摘要： Examples described herein provide a system, a software application, and a method of a lithography process to write multiple tones in a single pass. A system includes a stage and a lithography system. The lithography system includes image projection systems, a controller, and memory. The controller is coupled to the memory, which stores instruction code. Execution of the instruction code by the controller causes the controller to control the stage and the image projection systems to iteratively expose a photoresist supported by the stage and to move the stage relative to the image projection systems a step distance between sequential pairs of the exposures. Each exposure includes using write beam(s) projected from the image projection systems. Each exposure is at a respective one of different dosage amounts. An accumulation of the different dosage amounts is a full tone dosage amount for the photoresist.

    SPATIAL LIGHT MODULATOR WITH VARIABLE INTENSITY DIODES
    2.
    发明申请
    SPATIAL LIGHT MODULATOR WITH VARIABLE INTENSITY DIODES 审中-公开

    公开(公告)号：US20190294051A1

    公开(公告)日：2019-09-26

    申请号：US15933147

    申请日：2018-03-22

    申请人： Applied Materials, Inc.

    发明人： Joseph R. JOHNSON ,  Christopher Dennis BENCHER

    IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L27/12 ,  G03F7/00

    摘要： Embodiments of the present disclosure generally relate to an image projection system. The image projection system includes an active matrix solid state emitter (SSE) device. The active matrix solid state emitter includes a substrate, a silicon layer, and a emitter substrate. The silicon layer is deposited over the substrate having a plurality of transistors formed therein. The emitter substrate is positioned between the silicon layer and the substrate. The emitter substrate comprises a plurality of emitter arrays. Each emitter array defines a pixel, wherein one pixel comprises one or more transistors from the plurality of transistors. Each transistor is configured to receive a variable amount of current.

    METHOD TO REDUCE LINE WAVINESS
    4.
    发明申请
    METHOD TO REDUCE LINE WAVINESS 有权

    公开(公告)号：US20170293232A1

    公开(公告)日：2017-10-12

    申请号：US15188193

    申请日：2016-06-21

    申请人： Applied Materials, Inc.

    发明人： Joseph R. JOHNSON ,  Christopher Dennis BENCHER ,  Thomas L. LAIDIG

    IPC分类号： G03F7/20

    CPC分类号： G03F1/38 ,  G03F1/70 ,  G03F7/70291 ,  G03F7/70433 ,  G03F7/70508

    摘要： Embodiments disclosed herein relate to an exposure pattern alteration software application which manipulates exposure polygons having lines with angles substantially close to angles of symmetry of a hex close pack arrangement, which suffer from long jogs. Long jogs present themselves as high edge placement error regions. As such, the exposure pattern alteration software application provides for line wave reduction by serrating polygon edges at affected angles to reduce edge placement errors during maskless lithography patterning in a manufacturing process.

    PROJECTION SYSTEM AND METHODS
    7.
    发明申请
    PROJECTION SYSTEM AND METHODS 有权

    公开(公告)号：US20220174246A1

    公开(公告)日：2022-06-02

    申请号：US17109581

    申请日：2020-12-02

    申请人： Applied Materials, Inc.

    发明人： Christopher Dennis BENCHER ,  David MARKLE

    IPC分类号： H04N9/31

    摘要： Examples described herein provide a projection system, and a software application and a method related thereto. A system includes a pixelated light source and an optical relay. The pixelated light source includes an array of spatial light modulator pixels. Each spatial light modulator pixel being individually controllable to selectively project a beam of light. The optical relay includes an optically reflective surface and an actuator coupled to the optically reflective surface. The actuator is configured to move the optically reflective surface. The pixelated light source and the optical relay are configured such that one or more beams projected from the pixelated light source are reflected off of the optically reflective surface and form an image of the optical relay in a focal plane. Movement of the optically reflective surface causes the respective beams to be at varying locations in the focal plane.

    QUARTER WAVE LIGHT SPLITTING
    9.
    发明申请
    QUARTER WAVE LIGHT SPLITTING 审中-公开

    公开(公告)号：US20190339622A1

    公开(公告)日：2019-11-07

    申请号：US16509675

    申请日：2019-07-12

    申请人： Applied Materials, Inc.

    发明人： Christopher Dennis BENCHER ,  Joseph R. JOHNSON ,  David MARKLE ,  Mehdi VAEZ-IRAVANI

    IPC分类号： G03F7/20 ,  G02B27/28

    摘要： Embodiments of the present disclosure provide methods for producing images on substrates. The method includes providing a p-polarization beam to a first mirror cube having a first digital micromirror device (DMD), providing an s-polarization beam to a second mirror cube having a second DMD, and reflecting the p-polarization beam off the first DMD and reflecting the s-polarization beam off the second DMD such that the p-polarization beam and the s-polarization beam are reflected towards a light altering device configured to produce a plurality of superimposed images on the substrate.