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公开(公告)号：US20210285892A1
公开(公告)日：2021-09-16
申请号：US17200112
申请日：2021-03-12
Applicant: Applied Materials, Inc.
Inventor： Govinda RAJ , Vilen K. NESTOROV
Abstract: Examples disclosed herein relate to a method and apparatus for inspecting lamp dimensions. The method includes determining an actual measurement of a lamp. The lamp is configured to heat a substrate in a substrate processing apparatus. A window is generated, the window having a width and a height. The window is based upon a target measurement of the lamp. The method further includes generating a deviation based upon a difference between an image of the actual measurement and the window. The deviation is compared to a first threshold. The lamp is rejected if the deviation is outside the first threshold.
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公开(公告)号：US20210028075A1
公开(公告)日：2021-01-28
申请号：US16938510
申请日：2020-07-24
Applicant: Applied Materials, Inc.
Inventor： Zuoming ZHU , Shu-Kwan LAU , Ala MORADIAN , Enle CHOO , Flora Fong-Song CHANG , Vilen K. NESTOROV , Zhiyuan YE , Bindusagar MARATH SANKARATHODI , Maxim D. SHAPOSHNIKOV , Surendra Singh SRIVASTAVA , Zhepeng CONG , Patricia M. LIU , Errol C. SANCHEZ , Jenny C. LIN , Schubert S. CHU , Balakrishnam R. JAMPANA
Abstract: A method for processing a substrate within a processing chamber comprises receiving a first radiation signal corresponding to a film on a target element disposed within the processing chamber, analyzing the first radiation signal, and controlling the processing of the substrate based on the analyzed first radiation signal. The processing chamber includes a substrate support configured to support the substrate within a processing volume and a controller coupled to a first sensing device configured to receive the first radiation signal.
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公开(公告)号：US20230017852A1
公开(公告)日：2023-01-19
申请号：US17947819
申请日：2022-09-19
Applicant: Applied Materials, Inc.
Inventor： Vilen K. NESTOROV
Abstract: Examples disclosed herein relate to a to a pitch gradient in a lamp filament, and a method of making. In one implementation, a lamp has a bulb filled with a gas. A filament is disposed within the bulb. The filament has a plurality of coils that include a first coil having a first point. The plurality of coils includes a second coil having a second point, and a third coil having a third point. The pitch gradient is defined by a first pitch between the second point and the first point, and a second pitch between the third point and the second point. The second pitch is greater than the first pitch. The second point is 360 degrees away from the first point. The third point is 360 degrees from the second point. A terminal coil is electrically coupled to at least the first coil, the second coil, and the third coil.
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公开(公告)号：US20220155148A1
公开(公告)日：2022-05-19
申请号：US17609335
申请日：2020-06-29
Applicant: Applied Materials, Inc.
Inventor： Zuoming ZHU , Shu-Kwan LAU , Enle CHOO , Ala MORADIAN , Flora Fong-Song CHANG , Maxim D. SHAPOSHNIKOV , Bindusagar MARATH SANKARATHODI , Zhepeng CONG , Zhiyuan YE , Vilen K. NESTOROV , Surendra Singh SRIVASTAVA , Saurabh CHOPRA , Patricia M. LIU , Errol Antonio C. SANCHEZ , Jenny C. LIN , Schubert S. CHU
Abstract: An apparatus for controlling temperature profile of a substrate within an epitaxial chamber includes a bottom center pyrometer and a bottom outer pyrometer to respectively measure temperatures at a center location and an outer location of a first surface of a susceptor of an epitaxy chamber, a top center pyrometer and a top outer pyrometer to respectively measure temperatures at a center location and an outer location of a substrate disposed on a second surface of the susceptor opposite the first surface, a first controller to receive signals, from the bottom center pyrometer and the bottom outer pyrometer, and output a feedback signal to a first heating lamp module that heats the first surface based on the measured temperatures of the first surface, and a second controller to receive signals, from the top center pyrometer, the top outer pyrometer, the bottom center pyrometer, and the bottom outer pyrometer, and output a feedback signal to a second heating lamp module that heats the substrate based on the measured temperatures of a substrate and the measured temperatures of the first surface.
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公开(公告)号：US20240162011A1
公开(公告)日：2024-05-16
申请号：US17987679
申请日：2022-11-15
Applicant: Applied Materials, Inc.
Inventor： Eric Kihara SHONO , Vladimir NAGORNY , Rene GEORGE , Vilen K. NESTOROV , Martin John RIPLEY , Christopher S. OLSEN
IPC: H01J37/32
CPC classification number: H01J37/32357 , H01J37/32339 , H01J37/3244
Abstract: Embodiments of the present disclosure relate to methods and apparatuses of processing a substrate. The apparatus includes a process chamber, the process chamber including a chamber body, a substrate support, and a remote plasma source. The substrate support is configured to support a substrate within the processing region. The remote plasma source is coupled to the chamber body through a connector. The remote plasma source includes a body, an inlet, an inductive coil, and one or more UV sources. The body has a first end, a second end, and a tube spanning between the first end and the second end. The inlet is coupled to a gas source configured to introduce one or more gases into the body through the first end of the body. The inductive coil loops around the tube. The one or more UV sources are coupled to the first end of the body.
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公开(公告)号：US20220301904A1
公开(公告)日：2022-09-22
申请号：US17582912
申请日：2022-01-24
Applicant: Applied Materials, Inc.
Inventor： Ji-Dih HU , Chaitanya Anjaneyalu PRASAD , Dongming IU , Samuel C. HOWELLS , Vilen K. NESTOROV
IPC: H01L21/67 , H05B47/105
Abstract: Methods, systems, and apparatus provide for optically monitoring individual lamps of substrate processing chambers. In one aspect, the individual lamps are monitored to determine if one or more lamps are in need of replacement. A method includes using one or more camera coupled to a borescope to capture a plurality of images of one or more lamps in a substrate processing chamber. The plurality of images is analyzed to identify a change of mean light pixel intensity in an image reference region associated with each lamp. The method includes generating an alert based on the detection of the mean light pixel intensity change.
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公开(公告)号：US20230017365A1
公开(公告)日：2023-01-19
申请号：US17947791
申请日：2022-09-19
Applicant: Applied Materials, Inc.
Inventor： Govinda RAJ , Vilen K. NESTOROV
Abstract: Examples disclosed herein relate to a method and apparatus for inspecting lamp dimensions. The method includes determining an actual measurement of a lamp. The lamp is configured to heat a substrate in a substrate processing apparatus. A window is generated, the window having a width and a height. The window is based upon a target measurement of the lamp. The method further includes generating a deviation based upon a difference between an image of the actual measurement and the window. The deviation is compared to a first threshold. The lamp is rejected if the deviation is outside the first threshold.
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公开(公告)号：US20210272822A1
公开(公告)日：2021-09-02
申请号：US17104342
申请日：2020-11-25
Applicant: Applied Materials, Inc.
Inventor： Vilen K. NESTOROV , Kaushik RAO , Govinda RAJ
Abstract: Examples disclosed herein relate to a lamp configured to provide heat for a processing chamber. The lamp includes a housing filled with a gas. A filament is disposed within the housing. The filament has an upper diameter, a lower diameter, and a length. A pair of electrodes is electrically coupled to the filament. A pair of pins is electrically coupled to the pair of electrodes. The pair of pins is configured to transfer energy to the filament. A ratio between either the upper diameter or the lower diameter to the length is about 0.3. The upper diameter is not equal to the lower diameter.
