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公开(公告)号：US5908732A
公开(公告)日：1999-06-01
申请号：US717644
申请日：1996-09-23
CPC分类号： G03F7/26 , G03F7/039 , G03F7/322 , Y10S430/143 , Y10S430/167 , Y10S430/168
摘要： Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam copolymers of 2-hydroxyalkyl methacrylate and/or 2-hydroxyalkyl acrylate with alkylmethacrylate and/or alkylacrylate, and then developing the polymer in a developer.
摘要翻译： 通过将甲基丙烯酸2-羟基烷基酯和/或丙烯酸2-羟烷基酯与甲基丙烯酸烷基酯和/或丙烯酸烷基酯成像曝光于光化光，X-射线或电子束共聚物，然后在显影剂中显影该聚合物，从而产生正光刻图案。
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公开(公告)号：US5770345A
公开(公告)日：1998-06-23
申请号：US680668
申请日：1996-07-16
CPC分类号： G03F7/091 , G03F7/0045 , Y10S430/106 , Y10S430/108 , Y10S430/115 , Y10S430/116 , Y10S430/12 , Y10S430/121 , Y10S430/123 , Y10S430/124 , Y10S430/125
摘要： The sensitivity of a photoresist to actinic light is improved by the addition of certain dyes. The photoresist includes a polymer matrix, a photosensitive acid generator and at least one compound selected from the group consisting of dyes containing at least one heterosulphur atom such as 2,2.sup.1,5.sup.1,2"-terthiophene and its derivatives; thianthrene and its derivatives, and 4,6-diphenylthieno(3,4-d)-1,3-dioxol-2-one-5,5-dioxide; phenylsulfone and its derivatives; and 4,5-diphenyl-1,3-dioxol-2-one; 3,4-bis(acetoxymethyl)furan; chelidonic acid and its derivatives; and 5,7,12,14-pentacenetetrone. Resist images on a substrate are formed from the compositions.
摘要翻译： 通过添加某些染料可以改善光致抗蚀剂对光化光的敏感性。 光致抗蚀剂包括聚合物基质，光敏酸产生剂和至少一种选自包含至少一个杂硫原子的染料的化合物，例如2,21,51,2“ - 三噻吩及其衍生物; 噻吩及其衍生物和4,6-二苯基噻吩并（3,4-d）-1,3-二氧杂环戊烯-2-酮-5,5-二氧化物; 苯砜及其衍生物; 和4,5-二苯基-1,3-二氧杂环戊烯-2-酮; 3,4-二（乙酰氧基甲基）呋喃; 螯合酸及其衍生物; 和5,7,12,14-五硝基四酮。 由组合物形成基底上的抗蚀剂图像。
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公开(公告)号：US5753412A
公开(公告)日：1998-05-19
申请号：US659675
申请日：1996-06-05
CPC分类号： G03F7/091 , G03F7/0045 , Y10S430/106 , Y10S430/108 , Y10S430/115 , Y10S430/116 , Y10S430/12 , Y10S430/121 , Y10S430/123 , Y10S430/124 , Y10S430/125
摘要： The sensitivity of a photoresist to actinic light is improved by the addition of certain dyes. The photoresist includes a polymer matrix, a photosensitive acid generator and at least one compound selected from the group consisting of dyes containing at least one heterosulphur atom such as 2,2.sup.1,5.sup.1,2"-terthiophene and its derivatives; thianthrene and its derivatives, and 4,6-diphenylthieno(3,4-d)-1,3-dioxol-2-one-5,5-dioxide; phenylsulfone and its derivatives; and 4,5-diphenyl-l,3-dioxol-2-one; 3,4-bis(acetoxymethyl)furan; chelidonic acid and its derivatives; and 5,7,12,14-pentacenetetrone. Resist images on a substrate are formed from the compositions.
摘要翻译： 通过添加某些染料可以改善光致抗蚀剂对光化光的敏感性。 光致抗蚀剂包括聚合物基质，光敏酸产生剂和至少一种选自包含至少一个杂硫原子的染料的化合物，例如2,21,51,2“ - 三噻吩及其衍生物; 噻吩及其衍生物和4,6-二苯基噻吩并（3,4-d）-1,3-二氧杂环戊烯-2-酮-5,5-二氧化物; 苯砜及其衍生物; 和4,5-二苯基-1,3-二氧杂环戊烯-2-酮; 3,4-二（乙酰氧基甲基）呋喃; 螯合酸及其衍生物; 和5,7,12,14-五硝基四酮。 抗蚀剂基材上的图像由组合物形成。
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4.发明授权公开(公告)号：US07168224B2
公开(公告)日：2007-01-30
申请号：US10295595
申请日：2002-11-15
申请人： Marie Angelopoulos , Wu-Song Huang , Ranee Wai-Ling Kwong , David Robert Medeiros , Wayne Martin Moreau , Karen Elizabeth Petrillo , Herman Russell Wendt , Christopher Karl Magg
发明人： Marie Angelopoulos , Wu-Song Huang , Ranee Wai-Ling Kwong , David Robert Medeiros , Wayne Martin Moreau , Karen Elizabeth Petrillo , Herman Russell Wendt , Christopher Karl Magg
IPC分类号： B65B29/00
CPC分类号： G03F7/0012
摘要： The present invention includes a packaged coated workpiece. The packaged coated workpiece has: (1) a workpiece coated with a resist film sensitive to optical radiation, particulates or chemical contaminants; (2) an inner barrier sealed to enclose the coated workpiece and optionally a first getter agent, to produce a sealed first enclosure; and (3) an outer barrier sealed to enclose the sealed first enclosure and optionally a second getter agent, provided that the packaged coated workpiece has at least one getter agent, to produce a packaged coated workpiece suitable for storage for a period of at least one week without substantial loss of sensitivity, resolution or performance. The present invention also includes a process for preparing a packaged coated workpiece and a method of increasing the storage time of a coated workpiece to at least one week without substantial loss of sensitivity, resolution or performance.
摘要翻译： 本发明包括一个包装的涂层工件。 包装的涂层工件具有：（1）涂覆有对光辐射，微粒或化学污染物敏感的抗蚀剂膜的工件; （2）密封以封闭涂覆的工件和任选地第一吸气剂的内部阻隔件，以产生密封的第一外壳; 和（3）密封以封闭密封的第一外壳和任选的第二吸气剂的外屏障，只要所包封的涂覆的工件具有至少一个吸气剂，以产生适合于存储至少一个时间段的包装的涂覆的工件 周没有明显的灵敏度，分辨率或性能的损失。 本发明还包括用于制备包装的涂层工件的方法以及将涂覆的工件的存储时间增加至少一周而不会显着降低灵敏度，分辨率或性能的方法。
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公开(公告)号：US07807335B2
公开(公告)日：2010-10-05
申请号：US11144857
申请日：2005-06-03
申请人： Daniel A. Corliss , Dario Gil , Dario Leonardo Goldfarb , Steven John Holmes , David Vaclav Horak , Kurt Rudolf Kimmel , Karen Elizabeth Petrillo , Dmitriy Shneyder
发明人： Daniel A. Corliss , Dario Gil , Dario Leonardo Goldfarb , Steven John Holmes , David Vaclav Horak , Kurt Rudolf Kimmel , Karen Elizabeth Petrillo , Dmitriy Shneyder
IPC分类号： G03F7/26
CPC分类号： G03F7/2041 , G03F7/11 , Y10S430/162
摘要： A method of forming an image in a photoresist layer. The method includes, providing a substrate; forming the photoresist layer over the substrate; forming a contamination gettering topcoat layer over the photoresist layer, the contamination gettering topcoat layer including one or more polymers and one or more cation complexing agents; exposing the photoresist layer to actinic radiation through a photomask having opaque and clear regions, the opaque regions blocking the actinic radiation and the clear regions being transparent to the actinic radiation, the actinic radiation changing the chemical composition of regions of the photoresist layer exposed to the radiation forming exposed and unexposed regions in the photoresist layer; and removing either the exposed regions of the photoresist layer or the unexposed regions of the photoresist layer. The contamination gettering topcoat layer includes one or more polymers, one or more cation complexing agents and a casting solvent.
摘要翻译： 在光致抗蚀剂层中形成图像的方法。 该方法包括提供基板; 在衬底上形成光致抗蚀剂层; 在光致抗蚀剂层上形成污染吸气顶涂层，吸收顶涂层的污染物包括一种或多种聚合物和一种或多种阳离子络合剂; 将光致抗蚀剂层暴露于通过具有不透明和透明区域的光掩模的光化辐射，不透明区域阻挡光化辐射，透明区域对于光化辐射是透明的，光化辐射改变曝光于光致抗蚀剂层的光致抗蚀剂层的区域的化学组成 在光致抗蚀剂层中形成曝光和未曝光区域的辐射; 以及去除光致抗蚀剂层的曝光区域或光致抗蚀剂层的未曝光区域。 污染吸附顶涂层包括一种或多种聚合物，一种或多种阳离子络合剂和流延溶剂。
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6.发明授权Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer 失效超薄聚合物光酸发生剂层和通过使用所述层制造器件和掩模中的至少一个的方法公开(公告)号：US07638266B2
公开(公告)日：2009-12-29
申请号：US10916755
申请日：2004-08-12
申请人： Marie Angelopoulos , Gregory Breyta , Wu-Song Huang , Robert Neal Lang , Wenjie Li , David R. Medeiros , Wayne Martin Moreau , Karen Elizabeth Petrillo
发明人： Marie Angelopoulos , Gregory Breyta , Wu-Song Huang , Robert Neal Lang , Wenjie Li , David R. Medeiros , Wayne Martin Moreau , Karen Elizabeth Petrillo
IPC分类号： G03F1/00
CPC分类号： C08F220/14 , C08F220/38 , G03F7/0045 , G03F7/095
摘要： A barrier layer for fabricating at least one of a device and a mask includes a polymeric photoacid generator formed between a substrate and a resist layer. The barrier layer may be used, for example, in forming a resist image, and forming a patterned material feature on a substrate.
摘要翻译： 用于制造器件和掩模中的至少一个的阻挡层包括形成在衬底和抗蚀剂层之间的聚合物光酸发生器。 阻挡层可以用于例如形成抗蚀剂图像，并且在衬底上形成图案化材料特征。
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7.发明授权公开(公告)号：US06543617B2
公开(公告)日：2003-04-08
申请号：US09802471
申请日：2001-03-09
申请人： Marie Angelopoulos , Wu-Song Huang , Ranee Wai-Ling Kwong , David Robert Medeiros , Wayne Martin Moreau , Karen Elizabeth Petrillo , Herman Russell Wendt , Christopher Karl Magg
发明人： Marie Angelopoulos , Wu-Song Huang , Ranee Wai-Ling Kwong , David Robert Medeiros , Wayne Martin Moreau , Karen Elizabeth Petrillo , Herman Russell Wendt , Christopher Karl Magg
IPC分类号： B65D8500
CPC分类号： G03F7/0012
摘要： The present invention includes a packaged coated workpiece. The packaged coated workpiece has: (1) a workpiece coated with a resist film sensitive to optical radiation, particulates or chemical contaminants; (2) an inner barrier sealed to enclose the coated workpiece and optionally a first getter agent, to produce a sealed first enclosure; and (3) an outer barrier sealed to enclose the sealed first enclosure and optionally a second getter agent, provided that the packaged coated workpiece has at least one getter agent, to produce a packaged coated workpiece suitable for storage for a period of at least one week without substantial loss of sensitvity, resolution or performance. The present invention also includes a process for preparing a packaged coated workpiece and a method of increasing the storage time of a coated workpiece to at least one week without substantial loss of sensitivity, resolution or performance.
摘要翻译： 本发明包括一个包装的涂层工件。 包装的涂层工件具有：（1）涂覆有对光辐射，微粒或化学污染物敏感的抗蚀剂膜的工件; （2）密封以封闭涂覆的工件和任选地第一吸气剂的内部阻隔件，以产生密封的第一外壳; 和（3）密封以封闭密封的第一外壳和任选的第二吸气剂的外屏障，只要所包封的涂覆的工件具有至少一个吸气剂，以产生适合于存储至少一个时间段的包装的涂覆的工件 周没有显着损失敏感性，分辨率或性能。 本发明还包括用于制备包装的涂层工件的方法以及将涂覆的工件的存储时间增加至少一周而不会显着降低灵敏度，分辨率或性能的方法。
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8.发明授权Developers for polychloroacrylate and polychloromethacrylate based resists 失效聚氯丙烯酸酯和聚氯甲基丙烯酸酯基抗蚀剂的开发商公开(公告)号：US06221568B1
公开(公告)日：2001-04-24
申请号：US09421591
申请日：1999-10-20
IPC分类号： G03F732
CPC分类号： G03F7/325
摘要： The present invention is directed to developer compositions for poly-alpha-acrylate or methacrylate based resists giving high contrast and whose components are closely matched in boiling points. The use of the present developer improved the critical dimensional uniformity of images developed in a positive electron beam resist. More particularly, the present invention is directed to developer formulations whose compositions are directed to enhanced printed linearity, better across the plate uniformity, and improved contrast of the imaged positive resists. Such a improved developer can be used for the positive resist exposed by photons, electrons, ions, or X-rays.
摘要翻译： 本发明涉及具有高对比度且其组分在沸点上紧密匹配的聚α-丙烯酸酯或甲基丙烯酸酯基抗蚀剂的显影剂组合物。 使用本发明人改善了在正电子束抗蚀剂中显影的图像的临界尺寸均匀性。 更具体地说，本发明涉及其组合物指向增强的印刷线性，更好地跨平板均匀性以及改进的成像正性抗蚀剂的对比度的显影剂制剂。 这种改进的显影剂可用于由光子，电子，离子或X射线暴露的正性抗蚀剂。
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