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    High sensitivity, photo-active polymer and developers for high resolution resist applications
    3.
    发明授权
    High sensitivity, photo-active polymer and developers for high resolution resist applications 失效
    高灵敏度，光敏聚合物和显影剂，用于高分辨率抗蚀剂应用

    公开(公告)号：US6100011A

    公开(公告)日：2000-08-08

    申请号：US179423

    申请日：1998-10-27

    申请人： Ari Aviram ,  Andrew T. S. Pomerene ,  David Earle Seeger

    发明人： Ari Aviram ,  Andrew T. S. Pomerene ,  David Earle Seeger

    IPC分类号： G03F7/039 ,  G03F7/32 ,  G03F7/38

    CPC分类号： G03F7/38 ,  G03F7/039 ,  G03F7/322 ,  Y10S430/168

    摘要： Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam a polymer having pendant recurring groups selected from the group consisting of--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.x --H wherein x is 0-20;--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.y --HE--(CH.sub.2).sub.z --H; and mixtures thereof; wherein HE is O or S; and each y and z individually is 1-18; and mixtures thereof; and then developing the polymer in an aqueous base developer. The developer can be any of the conventional or commonly used ones as well as the special developers discussed below.Positive lithographic patterns are also produced by imagewise exposing to actinic light, x-ray or e-beam a photosensitive polymeric material to provide free carboxylic acid groups; and then developing by contacting with an aqueous developer solution of about 0.001% to about 1% by weight of a compound containing at least one amino group and at least two sulfonate groups selected from the group consisting of alkali metal sulfonate group, ammonium sulfate group, and mixtures thereof; or developing by contacting with an amine in vapor form and contacting with an aqueous solvent.

    摘要翻译： 通过成像曝光于光化光，X射线或电子束来形成正极光刻图案，该聚合物具有选自-COO-CH 2 -CH（OH） - （CH 2）x H的侧基重复基团，其中x为0- 20; -COO-CH 2 -CH（OH） - （CH 2）y-HE-（CH 2）z -H; 及其混合物; 其中HE为O或S; 每个y和z分别为1-18; 及其混合物; 然后在含水碱性显影剂中显影聚合物。 开发人员可以是常规或常用的任何开发者以及下面讨论的特殊开发者。 通过成像暴露于光化光，X射线或电子束光敏聚合物材料以提供游离羧酸基团也产生正光刻图案。 然后通过与含有至少一个氨基的化合物和至少两个选自碱金属磺酸盐基团，硫酸铵基团，硫酸铵基团， 及其混合物; 或通过与蒸气形式的胺接触并与水性溶剂接触来显影。

    High sensitivity, photo-active polymer and developers for high resolution resist applications
    4.
    发明授权
    High sensitivity, photo-active polymer and developers for high resolution resist applications 失效
    高灵敏度，光敏聚合物和显影剂，用于高分辨率抗蚀剂应用

    公开(公告)号：US06280901B1

    公开(公告)日：2001-08-28

    申请号：US09559315

    申请日：2000-04-27

    申请人： Ari Aviram ,  Andrew T. S. Pomerene ,  David Earle Seeger

    发明人： Ari Aviram ,  Andrew T. S. Pomerene ,  David Earle Seeger

    IPC分类号： G03F7039

    CPC分类号： G03F7/38 ,  G03F7/039 ,  G03F7/322 ,  Y10S430/168

    摘要： Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam a polymer having pendant recurring groups selected from the group consisting of —COO—CH2—CH(OH)—(CH2)x—H wherein x is 0-20; —COO—CH2—CH(OH)—(CH2)y—HE—(CH2)z—H; and mixtures thereof; wherein HE is O or S; and each y and z individually is 1-18; and mixtures thereof; and then developing the polymer in an aqueous base developer. The developer can be any of the conventional or commonly used ones as well as the special developers discussed below. Positive lithographic patterns are also produced by imagewise exposing to actinic light, x-ray or e-beam a photosensitive polymeric material to provide free carboxylic acid groups; and then developing by contacting with an aqueous developer solution of about 0.001% to about 1% by weight of a compound containing at least one amino group and at least two sulfonate groups selected from the group consisting of alkali metal sulfonate group, ammonium sulfate group, and mixtures thereof; or developing by contacting with an amine in vapor form and contacting with an aqueous solvent.

    摘要翻译： 通过成像曝光于光化光，X射线或电子束来形成正极光刻图案，该聚合物具有选自-COO-CH 2 -CH（OH） - （CH 2）x H的侧基重复基团，其中x为0- 20; -COO-CH 2 -CH（OH） - （CH 2）y-HE-（CH 2）z H; 及其混合物; 其中HE为O或S; 每个y和z分别为1-18; 及其混合物; 然后在含水碱性显影剂中显影聚合物。 显影剂可以是常规或常用的任何一种以及下面讨论的特殊显影剂。阳性光刻图案也通过成像曝光于光化光，X射线或电子束光敏聚合物材料以产生游离羧酸 团体 然后通过与含有至少一个氨基的化合物和至少两个选自碱金属磺酸盐基团，硫酸铵基团，硫酸铵基团， 及其混合物; 或通过与蒸气形式的胺接触并与水性溶剂接触来显影。

    High sensitivity, photo-active polymer and developers for high resolution resist applications
    5.
    发明授权
    High sensitivity, photo-active polymer and developers for high resolution resist applications 失效
    高灵敏度，光敏聚合物和显影剂，用于高分辨率抗蚀剂应用

    公开(公告)号：US5955242A

    公开(公告)日：1999-09-21

    申请号：US700348

    申请日：1996-09-23

    申请人： Ari Aviram ,  Andrew T. S. Pomerene ,  David Earle Seeger

    发明人： Ari Aviram ,  Andrew T. S. Pomerene ,  David Earle Seeger

    IPC分类号： G03F7/039 ,  G03F7/32 ,  G03F7/38 ,  G03F7/30

    CPC分类号： G03F7/38 ,  G03F7/039 ,  G03F7/322 ,  Y10S430/168

    摘要： Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam a polymer having pendant recurring groups selected from the group consisting of--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.x --H wherein x is 0-20;--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.y --HE--(CH.sub.2).sub.Z --H; and mixturesthereof; wherein HE is O or S; and each y and z individually is 1-18; and mixtures thereof; and then developing the polymer in an aqueous base developer. The developer can be any of the conventional or commonly used ones as well as the special developers discussed below.Positive lithographic patterns are also produced by imagewise exposing to actinic light, x-ray or e-beam a photosensitive polymeric material to provide free carboxylic acid groups; and then developing by contacting with an aqueous developer solution of about 0.001 % to about 1 % by weight of a compound containing at least one amino group and at least two sulfonate groups selected from the group consisting of alkali metal sulfonate group, ammonium sulfate group, and mixtures thereof; or developing by contacting with an amine in vapor form and contacting with an aqueous solvent.

    摘要翻译： 通过成像曝光于光化光，X射线或电子束来形成正极光刻图案，该聚合物具有选自-COO-CH 2 -CH（OH） - （CH 2）x H的侧基重复基团，其中x为0- 20; -COO-CH2-CH（OH） - （CH2）y-HE-（CH2）Z-H; 及其混合物; 其中HE为O或S; 每个y和z分别为1-18; 及其混合物; 然后在含水碱性显影剂中显影聚合物。 开发人员可以是常规或常用的任何开发者以及下面讨论的特殊开发者。 通过成像暴露于光化光，X射线或电子束光敏聚合物材料以提供游离羧酸基团也产生正光刻图案。 然后通过与含有至少一个氨基的化合物和至少两个选自碱金属磺酸盐基团，硫酸铵基团，硫酸铵基团， 及其混合物; 或通过与蒸气形式的胺接触并与水性溶剂接触来显影。