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    EXPOSURE APPARATUS
    1.
    发明申请
    EXPOSURE APPARATUS 有权
    曝光装置

    公开(公告)号：US20130286374A1

    公开(公告)日：2013-10-31

    申请号：US13928203

    申请日：2013-06-26

    申请人： Arjen BOOGAARD ,  Timotheus Franciscus Sengers ,  Wilhelmus Sebastianus Marcus Maria Ketelaars ,  Carolus Ida Maria Antonius Spee

    发明人： Arjen BOOGAARD ,  Timotheus Franciscus Sengers ,  Wilhelmus Sebastianus Marcus Maria Ketelaars ,  Carolus Ida Maria Antonius Spee

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70058 ,  G03B27/42 ,  G03F7/70716 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70958

    摘要： An extreme ultraviolet exposure apparatus includes a radiation system configured to supply a beam of extreme ultraviolet radiation; a support configured to support a patterning device, the patterning device configured to pattern the beam of extreme ultraviolet radiation according to a desired pattern; a substrate table having an area configured to support a substrate; a projection system configured to project the patterned beam of extreme ultraviolet radiation onto a target portion of the substrate, the projection system comprising a reflective optical system; wherein at least a part of the apparatus that during use of the apparatus is exposed to the beam of extreme ultraviolet radiation is coated with a coating, the coating comprising a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof.

    摘要翻译： 一种极紫外曝光装置包括一个被配置为提供一束极紫外线辐射的辐射系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置被配置为根据期望的图案来对所述紫外线辐射束进行图案化; 具有被配置为支撑衬底的区域的衬底台; 投影系统，被配置为将所述图案化的极紫外辐射束投影到所述基板的目标部分上，所述投影系统包括反射光学系统; 其中所述装置的至少一部分在所述装置的使用期间暴露于所述紫外线辐射束时被涂覆，所述涂层包含金属氧化物或光催化剂，或半导体或其任何组合。

    Exposure apparatus
    4.
    发明申请
    Exposure apparatus 失效
    曝光装置

    公开(公告)号：US20090027642A1

    公开(公告)日：2009-01-29

    申请号：US12232967

    申请日：2008-09-26

    申请人： Arjen Boogaard ,  Timotheus Franciscus Sengers ,  Wilhelmus Sebastianus Marcus Maria Ketelaars ,  Carolus Ida Maria Spee

    发明人： Arjen Boogaard ,  Timotheus Franciscus Sengers ,  Wilhelmus Sebastianus Marcus Maria Ketelaars ,  Carolus Ida Maria Spee

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70058 ,  G03B27/42 ,  G03F7/70716 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70958

    摘要： An exposure apparatus includes a radiation system configured to supply a projection beam of radiation, and a patterning device configured to pattern the projection beam according to a desired pattern. The apparatus includes a substrate table having an area configured to support a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. At least a part of the apparatus that during use of the apparatus is exposed to radiation is coated with a coating. The coating includes a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof.

    摘要翻译： 曝光装置包括被配置为提供投影射线束的辐射系统，以及被配置为根据期望的图案对投影光束进行图案化的图案形成装置。 该装置包括具有配置为支撑基板的区域的基板台，以及配置成将图案化的光束投影到基板的目标部分上的投影系统。 在使用设备暴露于辐射的过程中，装置的至少一部分涂覆有涂层。 涂层包括金属氧化物或光催化剂，或半导体，或其任何组合。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    7.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：US20090251674A1

    公开(公告)日：2009-10-08

    申请号：US12478552

    申请日：2009-06-04

    申请人： Timotheus Franciscus Sengers ,  Sjoerd Nicolaas Lambertus Donders ,  Hans Jansen ,  Arjen Boogaard

    发明人： Timotheus Franciscus Sengers ,  Sjoerd Nicolaas Lambertus Donders ,  Hans Jansen ,  Arjen Boogaard

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

    摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

    摘要翻译： 在光刻投影装置中，液体供应系统将液体保持在光刻投影装置的投影系统和基板之间的空间中。 位于衬底台上的传感器，其被固定在衬底上，被配置为当浸入液体中时（例如，在与衬底暴露于辐射相同的条件下）暴露于辐射。 通过具有由不超过一种金属类型形成的传感器的与液体接触的吸收元件的表面，可以获得传感器的长寿命。