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公开(公告)号：US06391146B1
公开(公告)日：2002-05-21
申请号：US09547423
申请日：2000-04-11
IPC分类号： H05H100
CPC分类号： C23C16/4412 , B01D53/34 , B01D53/70
摘要： An apparatus and method for reducing hazardous gases exhausted from a process chamber 25 includes an effluent gas treatment system 200 with a gas energizing reactor 210 with an erosion resistant inner surface 280. Optionally, an additive gas source 230 may be provided to introduce additive gas into the gas energizing reactor 210. In one embodiment, the inner surface comprises a fluorine-containing compound. In another embodiment, the inner surface comprises an oxide and a stabilizing agent.
摘要翻译： 用于减少从处理室25排出的有害气体的装置和方法包括具有带有耐腐蚀内表面280的气体激励反应器210的废气处理系统200.任选地，可以提供添加气体源230以将添加气体引入 气体通电反应器210.在一个实施方案中，内表面包含含氟化合物。 在另一个实施方案中，内表面包含氧化物和稳定剂。
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2.发明授权Heated catalytic treatment of an effluent gas from a substrate fabrication process 有权对基板制造工艺中的废气进行加热催化处理公开(公告)号：US06824748B2
公开(公告)日：2004-11-30
申请号：US09872254
申请日：2001-06-01
申请人： Tony S. Kaushal , Shamouil Shamouilian , Harshad Borgaonkar , Kwok Manus Wong , Michael G. Chafin , Ashish Bhatnagar
发明人： Tony S. Kaushal , Shamouil Shamouilian , Harshad Borgaonkar , Kwok Manus Wong , Michael G. Chafin , Ashish Bhatnagar
IPC分类号： F28D2100
CPC分类号： H01J37/32844 , B01D53/8662 , B01D53/885 , B01J19/12 , B01J19/129 , B01J2219/0809 , B01J2219/083 , B01J2219/0835 , B01J2219/0871 , B01J2219/0875 , B01J2219/0892 , C23C16/4412 , H01J37/3244 , Y02C20/30
摘要： A substrate processing apparatus has a process chamber with a substrate support, a gas supply to introduce a gas into the chamber, and a gas energizer to energize the gas in the processing of a substrate, thereby generating an effluent gas. A catalytic reactor has an effluent gas inlet to receive the effluent gas and an effluent gas outlet to exhaust treated effluent gas. A heater is adapted to heat the effluent gas in the catalytic reactor. The heated catalytic treatment of the effluent gas abates the hazardous gases in the effluent. An additive gas source and a prescrubber may also be used to further treat the effluent.
摘要翻译： 基板处理装置具有具有基板支撑件的处理室，向室内引入气体的气体供给部，以及在基板的加工中使气体通电的气体增压器，从而产生流出气体。 催化反应器具有用于接收废气的废气入口和用于排出经处理的废气的废气出口。 加热器适于加热催化反应器中的废气。 流出气体的加热催化处理减少流出物中的有害气体。 还可以使用添加气体源和预饱和物来进一步处理流出物。
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公开(公告)号：US06367412B1
公开(公告)日：2002-04-09
申请号：US09506111
申请日：2000-02-17
申请人： Kartik Ramaswamy , Kwok Manus Wong , Ashish Bhatnagar , Mehran Moalem , Tony S. Kaushal , Shamouil Shamouilian
发明人： Kartik Ramaswamy , Kwok Manus Wong , Ashish Bhatnagar , Mehran Moalem , Tony S. Kaushal , Shamouil Shamouilian
IPC分类号： C23C1600
CPC分类号： H01J37/32495 , B01D53/8662 , B01D2257/2066 , B01D2259/818 , C23C16/4412 , Y02C20/30
摘要： A plasma tube comprising a vacuum sealing ceramic outer tube, a porous ceramic insert disposed on the inside wall of the outer tube, and a source of high frequency radiation, for example, an RF coil wrapped around the tube, to excite gas flowing through the bore of the insert into a plasma. The invention is particularly useful as an exhaust scrubber for oxidizing exhaust gases from a semiconductor processing chamber. A catalyst may be embedded in the porous insert to promote the scrubbing reaction. The invention may also be used in an applicator of a remote plasma source.
摘要翻译： 一种等离子体管，包括真空密封陶瓷外管，设置在外管内壁上的多孔陶瓷插入件和高频辐射源，例如缠绕在管上的RF线圈，以激发流过 将插入孔插入等离子体。 本发明特别可用作用于氧化来自半导体处理室的废气的排气洗涤器。 催化剂可以嵌入多孔插入物中以促进洗涤反应。 本发明也可以用于远程等离子体源的施加器中。
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公开(公告)号：US06673323B1
公开(公告)日：2004-01-06
申请号：US09535461
申请日：2000-03-24
IPC分类号： B01D4700
CPC分类号： B01D53/70 , B01D53/34 , C23C16/4412
摘要： A method for reducing hazardous gases exhausted from a process chamber includes an effluent gas treatment system with a gas energizing reactor and an additive gas source. Additive gas comprising reactive gas is introduced into the effluent from the process chamber in a volumetric flow rate in relation to the hazardous gas content in the effluent.
摘要翻译： 用于减少从处理室排出的有害气体的方法包括具有气体激励反应器和添加气体源的废气处理系统。 包含反应性气体的添加剂气体以相对于流出物中的有害气体含量的体积流量被引入来自处理室的流出物中。
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公开(公告)号：US20140287662A1
公开(公告)日：2014-09-25
申请号：US14219913
申请日：2014-03-19
申请人： Irfanulla Khuddus Rahmathullah , Bopanna Ichettira Vansantha , Padma Gopalakrishnan , Abraham Palaty , Aswathnarayanaiah Ravi , Ashish Bhatnagar , Young J. Paik , Stacy Meyer , Daniel Martin
发明人： Irfanulla Khuddus Rahmathullah , Bopanna Ichettira Vansantha , Padma Gopalakrishnan , Abraham Palaty , Aswathnarayanaiah Ravi , Ashish Bhatnagar , Young J. Paik , Stacy Meyer , Daniel Martin
IPC分类号： B24B37/32
CPC分类号： B24B37/32
摘要： A retaining ring includes a generally annular upper portion having a top surface configured to be connected to a base of a carrier head and a lower surface, and a plurality of substantially identical arcuate segments detachably secured to the upper portion to form an annular lower portion. Each of the arcuate segments has an upper surface that abuts the lower surface of the upper portion and a bottom surface for contacting a polishing pad during polishing.
摘要翻译： 保持环包括大致环形的上部，其具有构造成连接到承载头和下表面的基部的顶表面，以及可拆卸地固定到上部以形成环形下部的多个基本相同的弧形段。 每个弧形段具有邻接上部下表面的上表面和用于在抛光过程中接触抛光垫的底表面。
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公开(公告)号：US08722389B1
公开(公告)日：2014-05-13
申请号：US13089380
申请日：2011-04-19
摘要： A system and method for culturing algae are presented. The system and method utilize a fog of growth medium that is delivered to an algal mat generator along with a stream of CO2 to promote growth of algal cells contained in the generator.
摘要翻译： 提出了一种培养藻类的系统和方法。 该系统和方法利用生长培养基的雾，其与CO 2流一起递送至藻类发生器以促进发生器中包含的藻细胞的生长。
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公开(公告)号：US20110105000A1
公开(公告)日：2011-05-05
申请号：US12891612
申请日：2010-09-27
摘要： A polishing pad includes a polymer matrix and polyhedral oligomeric silsequioxane (“POSS”) molecules or soluble particles and a surfactant dispersed within the polymer matrix. A polishing pad can be formed by casting a liquid polymer on a conveyer belt having a casting surface with a set of projections and curing the liquid polymer on the conveyer belt such that a polymer matrix has a surface with a second set of projections complimentary to the first set of projections.
摘要翻译： 抛光垫包括分散在聚合物基体内的聚合物基质和多面体低聚硅氧烷（“POSS”）分子或可溶性颗粒和表面活性剂。 可以通过在具有铸造表面的输送带上浇铸具有一组突起的液体聚合物并将液体聚合物固化在输送带上的方法来形成抛光垫，使得聚合物基质具有与第二组突起互补的表面 第一套预测。
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公开(公告)号：US08662957B2
公开(公告)日：2014-03-04
申请号：US12825276
申请日：2010-06-28
IPC分类号： B24B49/00
CPC分类号： B24B37/205 , B24B37/26 , B24B49/12
摘要： In one aspect, a polishing pad includes a homogeneous unitary polishing layer having a polishing surface, an opposed bottom surface, a recess in the polishing surface extending partially but not entirely through the polishing layer, and a solid light-transmissive window is secured in the recess. In another aspect, a polishing pad includes a polishing layer having a polishing surface, and the polishing surface includes a first region having a first plurality of grooves with a first depth extending partially but not entirely through the polishing layer and a second region surrounded by the first region and having a second plurality of grooves with a second depth extending partially but not entirely through the polishing layer, the second depth greater than the first depth.
摘要翻译： 在一个方面，抛光垫包括具有研磨表面，相对的底表面，抛光表面中的部分但不完全延伸穿过抛光层的凹部的均匀单一抛光层，并且固体透光窗口固定在 休息。 在另一方面，抛光垫包括具有抛光表面的抛光层，并且抛光表面包括具有第一多个凹槽的第一区域，该第一区域具有部分但不完全延伸穿过该抛光层的第一深度和由该抛光层包围的第二区域 第一区域并且具有第二多个凹槽，其具有部分但不完全延伸穿过抛光层的第二深度，第二深度大于第一深度。
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9.发明授权公开(公告)号：US08464594B2
公开(公告)日：2013-06-18
申请号：US13041293
申请日：2011-03-04
申请人： Kadthala R. Narendrnath , Ashish Bhatnagar , Daniel L. Martin , Robert T. Hirahara , Gangadhar Sheelavant
发明人： Kadthala R. Narendrnath , Ashish Bhatnagar , Daniel L. Martin , Robert T. Hirahara , Gangadhar Sheelavant
IPC分类号： G01F1/00
摘要： A gas nozzle measurement apparatus comprises a controllable gas source to provide across a gas plate having gas nozzles, a flow of gas at a constant pressure or constant flow rate, and a sensor plate sized to cover an area comprising at least a portion of the front face of the gas plate. The sensor plate comprises gas flow sensors arranged in locations that correspond to positions of individual gas nozzles of the gas nozzles of the gas plate such that each gas flow sensor can measure a pressure, flow rate, density, or velocity of a gas stream passing through the individual gas nozzle that faces the gas flow sensor, and generate a signal indicative of, or display, the pressure, flow rate, density, or velocity of the gas stream passing through the individual gas nozzle.
摘要翻译： 气体喷嘴测量装置包括可控气体源，以跨越具有气体喷嘴的气体板，恒定压力或恒定流速的气体流，以及传感器板，其尺寸被设计成覆盖包括至少一部分前部 气板的面。 传感器板包括气体传感器，其布置在与气板的气体喷嘴的各个气体喷嘴的位置对应的位置处，使得每个气体流量传感器可以测量通过的气流的压力，流量，密度或速度 单独的气体喷嘴面向气体流量传感器，并且产生指示或显示通过各个气体喷嘴的气流的压力，流量，密度或速度的信号。
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10.发明申请MIXOTROPHIC ALGAE FOR THE PRODUCTION OF ALGAE BIOFUEL FEEDSTOCK ON WASTEWATER 审中-公开用于生产废水中的生物燃料原料的混合物公开(公告)号：US20120028338A1
公开(公告)日：2012-02-02
申请号：US13257351
申请日：2010-04-20
IPC分类号： C12N1/12
摘要： The disclosure encompasses, among other aspects, mixed algal populations able to survive and proliferate on culture media that have a high proportion of an industry wastewater. In particular, at least one strain of an alga in the algal population proliferates mixotrophically. Embodiments further encompass methods of cultivating mixed populations of freshwater and marine alga comprising a plurality of genera and species to provide a biomass from which may be extracted lipids, or converted into biodiesel by such procedures as pyrolysis. Lipid material extracted from the algae may be converted to biodiesel or other organic products. Native algal strains were isolated from industrial and in particular agricultural wastewater inoculated with mixed populations derived from environments exposed to such wastewater. Both fresh water and marine algae showed good growth in wastewaters. About 65% of the algal oil obtained from the algal consortium cultured on an industry wastewater could be converted into biodiesel.
摘要翻译： 本公开包括其他方面，能够在具有高比例的工业废水的培养基上存活和增殖的混合藻类群。 特别地，藻类中藻类的至少一种菌株在营养中增殖。 实施方案还包括培养淡水和海藻的混合群体的方法，其包括多个属和物种，以提供生物质，其可从其中提取脂质，或通过热解等方法转化为生物柴油。 从藻类提取的脂质物质可转化为生物柴油或其他有机产物。 从工业上，特别是从暴露于这种废水的环境的混合种群中接种的农业废水中分离出天然藻类菌株。 淡水和海藻都在废水中表现出良好的生长。 从工业废水中培养的藻类财团获得的大约65％的藻油可以转化为生物柴油。
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