公开(公告)号：US08852995B1

公开(公告)日：2014-10-07

申请号：US13959835

申请日：2013-08-06

申请人： Atomic Energy Council—Institute of Nuclear Energy Research

发明人： Yu-Han Su ,  Tsun-Neng Yang ,  Wei-Yang Ma ,  Chien-Chang Chao ,  Shan-Ming Lan

IPC分类号： H01L21/00 ,  H01L31/028 ,  H01L31/068 ,  H01L31/0224

CPC分类号： H01L31/028 ,  H01L31/022425 ,  H01L31/068 ,  H01L31/1804 ,  H01L31/1872 ,  Y02E10/547 ,  Y02P70/521

摘要： The present invention relates to a preparation method for patternization of metal electrodes in silicon solar cells. After disposing an amorphous silicon layer on a silicon substrate processed by diffusion, laser light is projected on the amorphous silicon layer for patternization, and transforming the amorphous silicon with low optical conductivity into polysilicon with high optical conductivity thanks to the recrystallization process of the laser light. Then, after immersing the amorphous silicon layer in plating liquid, metal electrode can be formed accurately at the spots of the amorphous silicon layer patterned by laser light. No external voltage is required; plating reaction is induced by illumination directly.

摘要翻译： 本发明涉及硅太阳能电池中金属电极的图形化制备方法。 在通过扩散处理的硅衬底上设置非晶硅层之后，将激光投射在非晶硅层上进行图案化，并且由于激光的再结晶过程，将具有低光导率的非晶硅转化为具有高光导率的多晶硅 。 然后，在将非晶硅层浸渍在电镀液中后，可以通过激光图案化的非晶硅层的点处精确地形成金属电极。 无需外部电压; 通过照射直接诱导电镀反应。