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    IMAGE MONITORING SYSTEM AND CAMERA
    1.
    发明申请
    IMAGE MONITORING SYSTEM AND CAMERA 审中-公开
    图像监控系统和摄像机

    公开(公告)号：US20130230294A1

    公开(公告)日：2013-09-05

    申请号：US13817353

    申请日：2011-08-19

    申请人： Atsushi Sassa ,  Akinori Kouchi ,  Tomohiro Aikawa ,  Masaru Fujii ,  Kei Takahashi ,  Masashi Hohya ,  Akira Yoshizumi ,  Takayuki Koizumi

    发明人： Atsushi Sassa ,  Akinori Kouchi ,  Tomohiro Aikawa ,  Masaru Fujii ,  Kei Takahashi ,  Masashi Hohya ,  Akira Yoshizumi ,  Takayuki Koizumi

    IPC分类号： H04N7/18

    CPC分类号： H04N7/18 ,  H04N5/2354 ,  H04N5/33 ,  H04N5/77 ,  H04N9/8042

    摘要： The purpose of the present invention is to provide an image monitoring system which can be used in a place where a network cannot be established and has excellent portability. When an image is captured during the daytime or in a bright place, a camera (10) is equipped with a near-infrared cut filter, captures an image of a subject, and outputs a color image. On the other hand, when an image is captured during the nighttime or in a dark place, the near-infrared cut filter is removed from the camera (10), an LED light (11) irradiates the subject with near-infrared light in synchronization with the shutter speed of the camera (10), and the camera (10) captures an image of the near-infrared light reflected by the subject and outputs a monochrome image. The image outputted from the camera (10) is inputted to a recording device via a dedicated cable.

    摘要翻译： 本发明的目的是提供一种图像监视系统，其可以在不能建立网络并且具有优异的便携性的地方使用。 当在白天或在明亮的地方捕获图像时，相机（10）配备有近红外截止滤光器，捕获被摄体的图像，并输出彩色图像。 另一方面，当在夜间或暗处拍摄图像时，从相机（10）去除近红外截止滤光器，LED灯（11）同步地以近红外光照射被摄体 具有相机（10）的快门速度，并且相机（10）捕获由被摄体反射的近红外光的图像并输出单色图像。 从照相机（10）输出的图像通过专用电缆输入到记录装置。

    Method of manufacturing a castable epoxy resin composition comprising acrylic rubber particles predispersed in an anhydride hardener
    2.
    发明授权
    Method of manufacturing a castable epoxy resin composition comprising acrylic rubber particles predispersed in an anhydride hardener 失效
    制备可分散在酸酐硬化剂中的丙烯酸橡胶颗粒的可浇铸环氧树脂组合物的方法

    公开(公告)号：US5747557A

    公开(公告)日：1998-05-05

    申请号：US722339

    申请日：1996-09-27

    申请人： Koshi Hanyu ,  Akira Yoshizumi

    发明人： Koshi Hanyu ,  Akira Yoshizumi

    IPC分类号： C08L63/00 ,  C08G59/18 ,  C08G59/40 ,  C08G59/50 ,  C08L101/16 ,  H01B3/40 ,  C08G59/42 ,  C08K3/22 ,  C08L33/06

    CPC分类号： C08L63/00 ,  Y10S525/902

    摘要： A method of manufacturing a castable epoxy resin composition which comprises as components an epoxy resin, an acid anhydride in an amount sufficient for hardening, an inorganic filler, and acrylic rubber particles having a thermoplastic resin skin, said thermoplastic resin skin being 1 to 50 wt % of said acrylic rubber particles, wherein each of said acrylic rubber particles has epoxy groups on a surface thereof, and said acrylic rubber particles are present in an amount ranging between 2 and 40 parts by weight based on 100 parts by weight of said epoxy resin, wherein said inorganic filler is an alumina powder having a mean particle size by volume of 6 to 16 .mu.m, and a particle size of at least 10 volume % of said alumina powder particles is 20 .mu.m or greater, and wherein at least 90 volume % of said rubber particles are dispersed as discrete particles with a particle size by volume of 1 .mu.m or less, said method comprising the steps of: preparing a modified hardener by mixing said acrylic rubber particles with at least a portion of said acid anhydride by using shearing force applying means in sufficient force to uniformly disperse said rubber particles in said acid anhydride; and mixing said modified hardener and the remainder of said components.

    摘要翻译： 一种制造可浇铸环氧树脂组合物的方法，其包含环氧树脂，足够硬化量的酸酐，无机填料和具有热塑性树脂表皮的丙烯酸橡胶颗粒作为组分，所述热塑性树脂表层为1至50重量％ ％的所述丙烯酸橡胶颗粒，其中每个所述丙烯酸橡胶颗粒在其表面上具有环氧基，并且所述丙烯酸橡胶颗粒以基于100重量份所述环氧树脂为基准的2至40重量份的量存在 其中所述无机填料是平均粒径为6〜16μm的氧化铝粉末，所述氧化铝粉末颗粒的至少10体积％的粒径为20μm以上，其中，至少90 所述橡胶颗粒的体积％分散为体积小于1μm的离散颗粒，所述方法包括以下步骤：通过将所述橡胶颗粒 通过使用剪切力施加装置足够的力使至少一部分所述酸酐的橡胶颗粒均匀地分散在所述酸酐中; 并混合所述改性固化剂和所述组分的其余部分。

    Polysilane and polysilane composition
    3.
    发明授权
    Polysilane and polysilane composition 失效
    聚硅烷和聚硅烷组成

    公开(公告)号：US5336736A

    公开(公告)日：1994-08-09

    申请号：US53810

    申请日：1993-04-29

    申请人： Yoshihiko Nakano ,  Shuzi Hayase ,  Shinji Murai ,  Yukihiro Mikogami ,  Akira Yoshizumi

    发明人： Yoshihiko Nakano ,  Shuzi Hayase ,  Shinji Murai ,  Yukihiro Mikogami ,  Akira Yoshizumi

    IPC分类号： C08G18/64 ,  C08G59/00 ,  C08G59/20 ,  C08G59/30 ,  C08G59/40 ,  C08G59/42 ,  C08G77/60 ,  C08L63/00 ,  C08L83/04 ,  C08L83/16 ,  G03F7/075 ,  C08F283/00

    CPC分类号： G03F7/0754 ,  C08G77/60 ,  C08L83/16

    摘要： Disclosed is a polysilane having a repeating unit represented by general formula (1) given below. Also disclosed is a polysilane composition, comprising a polysilane having a repeating unit represented by general formula (2) given below and a cross linking agent: ##STR1## where, each of R.sup.1 and R.sup.3 is hydrogen, a substituted or unsubstituted alkyl group having 1 to 24 carbon atoms or a substituted or unsubstituted aryl group having 6 to 24 carbon atoms; R.sup.2 is a divalent hydrocarbon group having to 24 carbon atoms which can be substituted; R.sup.4 is a covalent bond, or a substituted or unsubstituted alkylene group having 1 to carbon atoms, or a substituted or unsubstituted arylene group having 6 to 24 carbon atoms; each of R.sup.5 to R.sup.9 is hydrogen, a substituted or unsubstituted alkyl group having 1 to 24 carbon atoms, a substituted or unsubstituted aryl group having 6 to 24 carbon atoms, or hydroxyl group, at least one of R.sup.5 to R.sup.9 being hydroxyl group; and X is a monovalent organic group having a reactive group capable of crosslinking upon exposure to light or by heating. If any of the polysilane and the polysilane composition of the present invention is exposed to light or heated, the polysilane molecules are crosslinked so as to provide a two or three dimensional polymer.

    摘要翻译： 公开了具有下述通式（1）表示的重复单元的聚硅烷。 还公开了一种聚硅烷组合物，其包含具有由下述通式（2）表示的重复单元的聚硅烷和交联剂：其中，R1和R3各自为氢 取代或未取代的碳原子数为1〜24的烷基或取代或未取代的碳原子数为6〜24的芳基。 R2是可被取代的具有24个碳原子的二价烃基; R4为共价键，或取代或未取代的碳原子数1〜2的亚烷基，取代或未取代的碳原子数为6〜24的亚芳基。 R5至R9各自为氢，取代或未取代的碳原子数为1〜24的烷基，取代或未取代的碳原子数为6〜24的芳基或羟基，R5〜R9中的至少一个为羟基; X是具有能够在曝光或加热时能够交联的反应性基团的一价有机基团。 如果本发明的聚硅烷和聚硅烷组合物中的任何一种都被曝光或加热，则聚硅烷分子被交联以提供二维或三维聚合物。

    Polysilane monomolecular film and polysilane built-up film
    8.
    发明授权
    Polysilane monomolecular film and polysilane built-up film 失效
    聚硅烷单分子膜和聚硅烷成膜

    公开(公告)号：US5362559A

    公开(公告)日：1994-11-08

    申请号：US89634

    申请日：1993-07-12

    申请人： Shuji Hayase ,  Yoshihiko Nakano ,  Yukihiro Mikogami ,  Akira Yoshizumi ,  Shinji Murai ,  Rikako Kani

    发明人： Shuji Hayase ,  Yoshihiko Nakano ,  Yukihiro Mikogami ,  Akira Yoshizumi ,  Shinji Murai ,  Rikako Kani

    IPC分类号： B05D1/20 ,  C09D183/16 ,  B32B5/00

    CPC分类号： B82Y30/00 ,  B05D1/202 ,  B82Y40/00 ,  C09D183/16 ,  Y10T428/261

    摘要： Disclosed are a polysilane monomolecular film and a polysilane built-up film formed by building up a plurality of said monomolecular films, said monomolecular film consisting of a polysilane having a repeating unit represented by general formula (1) given below: ##STR1## where, R.sup.1 represents a substituted or unsubstituted alkyl group having 1 to 24 carbon atoms or a substituted or unsubstituted aryl group having 6 to 24 carbon atoms, R.sup.2 represents a divalent hydrocarbon group having 1 to 4 carbon atoms which can be substituted, and X represents hydroxyl group, amino group, carboxyl group, or a hydrophilic group having at least one selected from the group consisting of hydroxyl group, amino group, carboxyl group, amide linkage, ester linkage, carbamate linkage and carbonate linkage. The polysilane monomolecular film and built-up film can be formed on a substrate by an LB technique. In the films, the molecules of the polysilane having the repeating unit (1), that is, the Si-Si backbones are oriented in a fixed direction.

    摘要翻译： 公开了一种聚硅烷单分子膜和聚硅烷叠层膜，其通过构建多个所述单分子膜而形成，所述单分子膜由具有由以下给出的通式（1）表示的重复单元的聚硅烷组成：＆lt; IMAGE＆gt;（1 ）其中，R1表示取代或未取代的碳原子数1〜24的烷基或碳原子数6〜24的取代或未取代的芳基，R2表示可被取代的碳原子数1〜4的二价烃基，X 表示羟基，氨基，羧基或具有选自羟基，氨基，羧基，酰胺键，酯键，氨基甲酸酯键和碳酸酯键中的至少一种的亲水基团。 可以通过LB技术在基板上形成聚硅烷单分子膜和积层膜。 在膜中，具有重复单元（1）的聚硅烷的分子，即Si-Si主链在固定方向上取向。