公开(公告)号：US20120240958A1

公开(公告)日：2012-09-27

申请号：US13427370

申请日：2012-03-22

申请人： Ayumi HIGUCHI ,  Yoshiyuki FUJITANI ,  Takemitsu MIURA ,  Rei TAKEAKI

发明人： Ayumi HIGUCHI ,  Yoshiyuki FUJITANI ,  Takemitsu MIURA ,  Rei TAKEAKI

IPC分类号： B08B3/04 ,  B08B3/02

CPC分类号： H01L21/67248 ,  B08B3/024 ,  B08B3/04 ,  B08B3/10 ,  B08B3/108 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/67086 ,  H01L21/67253

摘要： A substrate treatment apparatus includes a treatment vessel in which a substrate is accommodated, a treatment liquid supply unit, a chamber enclosing the treatment vessel, a substrate holding unit, a circulation unit and a control unit. The circulation unit circulates the treatment liquid from the treatment vessel through a circulation path extending through a filter and a temperature controller and spouts the treatment liquid toward the substrate accommodated in the treatment vessel to recover the treatment liquid in the treatment vessel. The control unit controls the liquid surface level of the treatment liquid retained in the treatment vessel below the substrate held at a substrate treatment position.

摘要翻译： 基板处理装置包括容纳基板的处理容器，处理液供给单元，封闭处理容器的室，基板保持单元，循环单元和控制单元。 循环单元使来自处理容器的处理液循环通过过滤器和温度控制器的循环路径，并将处理液朝向容纳在处理容器中的基板喷出，以回收处理容器中的处理液。 控制单元控制在保持在基板处理位置的基板下方保留在处理容器中的处理液的液面。