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公开(公告)号：US20100007866A1
公开(公告)日：2010-01-14
申请号：US12504844
申请日：2009-07-17
申请人： Berndt Warm , Siegfried Rennon , Guenther Dengel , Juergen Baier , Udo Dinger , Stefan Burkart , Christos Kourouklis , Hin Yiu Anthony Chung , Stefan Wiesner , Hartmut Enkisch
发明人： Berndt Warm , Siegfried Rennon , Guenther Dengel , Juergen Baier , Udo Dinger , Stefan Burkart , Christos Kourouklis , Hin Yiu Anthony Chung , Stefan Wiesner , Hartmut Enkisch
IPC分类号： G03B27/70
CPC分类号： G02B5/08 , B29D11/00596 , G02B5/09 , G03F7/702 , G03F7/70825
摘要： The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors.
摘要翻译： 本公开涉及用于制造镜子，特别是小平面反射镜的方法和配备有反射镜的投影曝光设备。
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2.发明授权Optical integrator for an illumination system of a microlithographic projection exposure apparatus 有权用于微光刻投影曝光装置的照明系统的光学积分器公开(公告)号：US08520307B2
公开(公告)日：2013-08-27
申请号：US12973234
申请日：2010-12-20
申请人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
发明人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
IPC分类号： G02B27/10
CPC分类号： G03F7/70958 , G03F7/70075 , Y10T83/0304 , Y10T83/04
摘要： The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
摘要翻译： 本发明涉及一种被配置为在微光刻投影曝光装置的照明系统中产生多个次级光源的光学积分器。 本公开还涉及制造用于这种照明系统的细长微透镜阵列的方法。 细长微透镜的数组经常被包含在这种照明系统的光学积分器或散射板中。
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3.发明申请公开(公告)号：US20090021839A1
公开(公告)日：2009-01-22
申请号：US12186365
申请日：2008-08-05
申请人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
发明人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
IPC分类号： G02B27/10
CPC分类号： G03F7/70958 , G03F7/70075 , Y10T83/0304 , Y10T83/04
摘要： The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
摘要翻译： 本发明涉及一种被配置为在微光刻投影曝光装置的照明系统中产生多个次级光源的光学积分器。 本公开还涉及制造用于这种照明系统的细长微透镜阵列的方法。 细长微透镜的数组经常被包含在这种照明系统的光学积分器或散射板中。
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4.发明申请公开(公告)号：US20110083542A1
公开(公告)日：2011-04-14
申请号：US12973234
申请日：2010-12-20
申请人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
发明人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
CPC分类号： G03F7/70958 , G03F7/70075 , Y10T83/0304 , Y10T83/04
摘要： The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
摘要翻译： 本发明涉及一种被配置为在微光刻投影曝光设备的照明系统中产生多个次级光源的光学积分器。 本公开还涉及制造用于这种照明系统的细长微透镜阵列的方法。 细长微透镜的数组经常被包含在这种照明系统的光学积分器或散射板中。
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5.发明授权Optical integrator for an illumination system of a microlithographic projection exposure apparatus 有权用于微光刻投影曝光装置的照明系统的光学积分器公开(公告)号：US07880969B2
公开(公告)日：2011-02-01
申请号：US12186365
申请日：2008-08-05
申请人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
发明人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
IPC分类号： G02B27/10
CPC分类号： G03F7/70958 , G03F7/70075 , Y10T83/0304 , Y10T83/04
摘要： The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
摘要翻译： 本发明涉及一种被配置为在微光刻投影曝光装置的照明系统中产生多个次级光源的光学积分器。 本公开还涉及制造用于这种照明系统的细长微透镜阵列的方法。 细长微透镜的数组经常被包含在这种照明系统的光学积分器或散射板中。
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6.发明授权公开(公告)号：US08693098B2
公开(公告)日：2014-04-08
申请号：US12904513
申请日：2010-10-14
CPC分类号： G02B1/10 , G02B5/00 , G02B5/08 , G02B5/085 , G02B5/0891 , G02B17/0657 , G03F7/70233 , G03F7/70958
摘要： A projection objective for a microlithographic EUV projection exposure apparatus includes a first mirror and a second mirror. The first mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The second mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The first and second mirrors are configured so that, with otherwise equal irradiation by EUV light, the mirror substrate of the first mirror compacts less than the mirror substrate of the second mirror under the effect of the EUV light.
摘要翻译： 微光刻EUV投影曝光装置的投影物镜包括第一镜和第二镜。 第一反射镜包括镜面基板和由反射镜基板承载的反射涂层。 第二反射镜包括镜面基板和由反射镜基板承载的反射涂层。 第一和第二反射镜被配置为使得在EUV光的另外相等的照射下，在EUV光的作用下，第一反射镜的反射镜基板小于第二反射镜的反射镜基板。
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7.发明申请公开(公告)号：US20110090559A1
公开(公告)日：2011-04-21
申请号：US12904513
申请日：2010-10-14
IPC分类号： G02B17/06
CPC分类号： G02B1/10 , G02B5/00 , G02B5/08 , G02B5/085 , G02B5/0891 , G02B17/0657 , G03F7/70233 , G03F7/70958
摘要： A projection objective for a microlithographic EUV projection exposure apparatus includes a first mirror and a second mirror. The first mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The second mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The first and second mirrors are configured so that, with otherwise equal irradiation by EUV light, the mirror substrate of the first mirror compacts less than the mirror substrate of the second mirror under the effect of the EUV light.
摘要翻译： 微光刻EUV投影曝光装置的投影物镜包括第一镜和第二镜。 第一反射镜包括镜面基板和由反射镜基板承载的反射涂层。 第二反射镜包括镜面基板和由反射镜基板承载的反射涂层。 第一和第二反射镜被配置为使得在EUV光的另外相等的照射下，在EUV光的作用下，第一反射镜的反射镜基板小于第二反射镜的反射镜基板。
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