-
公开(公告)号:US08885144B2
公开(公告)日:2014-11-11
申请号:US13114652
申请日:2011-05-24
申请人: Bert Jan Claessens , Heine Melle Mulder , Paul Van Der Veen , Wilfred Edward Endendijk , Willem Jan Bouman , Bert Pieter Van Drieënhuizen , Jozef Ferdinand Dymphna Verbeeck , Marc Hendricus Margaretha Dassen , Thijs Johan Henry Hollink
发明人: Bert Jan Claessens , Heine Melle Mulder , Paul Van Der Veen , Wilfred Edward Endendijk , Willem Jan Bouman , Bert Pieter Van Drieënhuizen , Jozef Ferdinand Dymphna Verbeeck , Marc Hendricus Margaretha Dassen , Thijs Johan Henry Hollink
CPC分类号: G03F7/70116 , G03F7/70291 , G03F7/70508 , G03F7/70516
摘要: An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.
摘要翻译: 公开了一种具有独立可控光学元件阵列的照明系统,其中每个元件可在选择多个取向之间移动,以形成所需的照明模式。 照明系统包括控制器,用于控制一个或多个元件的取向,该控制器被配置为向一个或多个元件施加力,该至少一个或多个元件至少部分地补偿通过入射的辐射突发施加到一个或多个元件上的力 一个或多个元素。
-
公开(公告)号:US08432529B2
公开(公告)日:2013-04-30
申请号:US12822447
申请日:2010-06-24
CPC分类号: G03F7/7085
摘要: A lithographic apparatus including a radiation beam monitoring apparatus, the radiation beam monitoring apparatus including an optical element configured to generate a diffraction pattern, and an imaging detector located after the optical element and not in a focal plane of the optical element such that the imaging detector is capable of detecting a mixture of spatial coherence and divergence of the radiation beam.
摘要翻译: 一种包括辐射束监测装置的光刻设备,所述辐射束监视装置包括被配置为产生衍射图案的光学元件和位于所述光学元件之后而不在所述光学元件的焦平面中的成像检测器,使得所述成像检测器 能够检测辐射束的空间相干性和发散性的混合。
-
公开(公告)号:US08508716B2
公开(公告)日:2013-08-13
申请号:US12908980
申请日:2010-10-21
IPC分类号: G03B27/54
CPC分类号: G03B27/54 , G02B27/0905 , G02B27/0961 , G03F7/70075
摘要: A two-stage homogenizer comprising a first homogenizer stage and a second homogenizer stage. The first homogenizer stage includes a pair of microlens arrays and associated focusing optics. The second homogenizer stage includes a second pair of microlens arrays and associated focusing optics. The second homogenizer stage is positioned to receive radiation which is output from the first homogenizer stage.
摘要翻译: 一种两级均化器,包括第一均化器级和第二均化器级。 第一均化器级包括一对微透镜阵列和相关联的聚焦光学器件。 第二均化器级包括第二对微透镜阵列和相关联的聚焦光学器件。 定位第二均化器级以接收从第一均化器级输出的辐射。
-
-