Lithographic apparatus and monitoring method
    2.
    发明授权
    Lithographic apparatus and monitoring method 有权
    平版印刷设备和监控方法

    公开(公告)号:US08432529B2

    公开(公告)日:2013-04-30

    申请号:US12822447

    申请日:2010-06-24

    IPC分类号: G03B27/72 G03B27/52

    CPC分类号: G03F7/7085

    摘要: A lithographic apparatus including a radiation beam monitoring apparatus, the radiation beam monitoring apparatus including an optical element configured to generate a diffraction pattern, and an imaging detector located after the optical element and not in a focal plane of the optical element such that the imaging detector is capable of detecting a mixture of spatial coherence and divergence of the radiation beam.

    摘要翻译: 一种包括辐射束监测装置的光刻设备,所述辐射束监视装置包括被配置为产生衍射图案的光学元件和位于所述光学元件之后而不在所述光学元件的焦平面中的成像检测器,使得所述成像检测器 能够检测辐射束的空间相干性和发散性的混合。

    Homogenizer
    3.
    发明授权
    Homogenizer 有权
    均化器

    公开(公告)号:US08508716B2

    公开(公告)日:2013-08-13

    申请号:US12908980

    申请日:2010-10-21

    IPC分类号: G03B27/54

    摘要: A two-stage homogenizer comprising a first homogenizer stage and a second homogenizer stage. The first homogenizer stage includes a pair of microlens arrays and associated focusing optics. The second homogenizer stage includes a second pair of microlens arrays and associated focusing optics. The second homogenizer stage is positioned to receive radiation which is output from the first homogenizer stage.

    摘要翻译: 一种两级均化器,包括第一均化器级和第二均化器级。 第一均化器级包括一对微透镜阵列和相关联的聚焦光学器件。 第二均化器级包括第二对微透镜阵列和相关联的聚焦光学器件。 定位第二均化器级以接收从第一均化器级输出的辐射。