Thin film transistor array panel and manufacturing method thereof
    4.
    发明授权
    Thin film transistor array panel and manufacturing method thereof 有权
    薄膜晶体管阵列面板及其制造方法

    公开(公告)号:US08519393B2

    公开(公告)日:2013-08-27

    申请号:US12823043

    申请日:2010-06-24

    IPC分类号: H01L27/146 H01L29/786

    摘要: A thin film transistor array panel according to an exemplary embodiment of the present invention includes: a gate electrode disposed on an insulation substrate; a gate insulating layer disposed on the gate electrode; a semiconductor disposed on the gate insulating layer; an etching stop layer disposed on the semiconductor; an insulating layer disposed on the gate insulating layer; and a source electrode and a drain electrode overlapping the semiconductor. The semiconductor and the gate insulating layer have a first portion on which the etching stop layer and the insulating layer are disposed, and a second portion on which etching stop layer and the insulating layer are not disposed. The source electrode and the drain electrode are disposed on the second portion of the semiconductor and the gate insulating layer.

    摘要翻译: 根据本发明的示例性实施例的薄膜晶体管阵列面板包括:栅极,设置在绝缘基板上; 设置在栅电极上的栅极绝缘层; 设置在所述栅极绝缘层上的半导体; 设置在所述半导体上的蚀刻停止层; 设置在所述栅极绝缘层上的绝缘层; 以及与半导体重叠的源电极和漏电极。 半导体和栅极绝缘层具有其上设置有蚀刻停止层和绝缘层的第一部分,以及不设置蚀刻停止层和绝缘层的第二部分。 源电极和漏极设置在半导体的第二部分和栅极绝缘层上。

    THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF
    5.
    发明申请
    THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF 有权
    薄膜晶体管阵列及其制造方法

    公开(公告)号:US20110140094A1

    公开(公告)日:2011-06-16

    申请号:US12823043

    申请日:2010-06-24

    摘要: A thin film transistor array panel according to an exemplary embodiment of the present invention includes: a gate electrode disposed on an insulation substrate; a gate insulating layer disposed on the gate electrode; a semiconductor disposed on the gate insulating layer; an etching stop layer disposed on the semiconductor; an insulating layer disposed on the gate insulating layer; and a source electrode and a drain electrode overlapping the semiconductor. The semiconductor and the gate insulating layer have a first portion on which the etching stop layer and the insulating layer are disposed, and a second portion on which etching stop layer and the insulating layer are not disposed. The source electrode and the drain electrode are disposed on the second portion of the semiconductor and the gate insulating layer

    摘要翻译: 根据本发明的示例性实施例的薄膜晶体管阵列面板包括:栅极,设置在绝缘基板上; 设置在栅电极上的栅极绝缘层; 设置在所述栅极绝缘层上的半导体; 设置在所述半导体上的蚀刻停止层; 设置在所述栅极绝缘层上的绝缘层; 以及与半导体重叠的源电极和漏电极。 半导体和栅极绝缘层具有其上设置有蚀刻停止层和绝缘层的第一部分,以及不设置蚀刻停止层和绝缘层的第二部分。 源电极和漏极设置在半导体的第二部分和栅极绝缘层上

    Display substrate and method of manufacturing the same
    7.
    发明授权
    Display substrate and method of manufacturing the same 有权
    显示基板及其制造方法

    公开(公告)号:US08367444B2

    公开(公告)日:2013-02-05

    申请号:US12902761

    申请日:2010-10-12

    IPC分类号: H01L21/02

    摘要: A display substrate includes a gate line, a gate insulation layer, a data line, a switching element, a protection insulation layer, a gate pad portion and a data pad portion. The gate insulation layer is disposed on the gate line. The switching element is connected to the gate line and the data line. The protection insulation layer is disposed on the switching element. The gate pad portion includes a first gate pad electrode which makes contact with an end portion of the gate line through a first hole formed through the gate insulation layer, and a second gate pad electrode which makes contact with the first gate pad electrode through a second hole formed through the protection insulation layer. The data pad portion includes a data pad electrode which makes contact with an end portion of the data line through a third hole formed through the protection insulation layer.

    摘要翻译: 显示基板包括栅极线,栅极绝缘层,数据线,开关元件,保护绝缘层,栅极焊盘部分和数据焊盘部分。 栅极绝缘层设置在栅极线上。 开关元件连接到栅极线和数据线。 保护绝缘层设置在开关元件上。 栅极焊盘部分包括通过形成在栅极绝缘层上的第一孔与栅极线的端部接触的第一栅极焊盘电极和通过第二栅极焊盘电极与第一栅极焊盘电极接触的第二栅极焊盘电极 孔通过保护层形成。 数据焊盘部分包括通过形成在保护绝缘层上的第三孔与数据线的端部接触的数据焊盘电极。

    Display device and manufacturing method thereof
    9.
    发明授权
    Display device and manufacturing method thereof 有权
    显示装置及其制造方法

    公开(公告)号:US07834348B2

    公开(公告)日:2010-11-16

    申请号:US12388973

    申请日:2009-02-19

    IPC分类号: H01L35/24

    摘要: The present invention provides a display device and a manufacturing method thereof. The display device includes a gate line, a data line that is insulated from and crosses the gate line, a thin film transistor including a semiconductor layer and connected to the gate line and the data line, a pixel electrode connected to the thin film transistor, and a dummy drain electrode adjacent to a channel region of the thin film transistor. The dummy drain electrode is not connected to the pixel electrode.

    摘要翻译: 本发明提供一种显示装置及其制造方法。 显示装置包括栅极线,与栅极线绝缘并与栅极线交叉的数据线,包括半导体层并连接到栅极线和数据线的薄膜晶体管,连接到薄膜晶体管的像素电极, 以及与薄膜晶体管的沟道区相邻的虚拟漏电极。 虚设漏电极不连接到像素电极。

    Organic thin film transistor and method of manufacturing the same
    10.
    发明授权
    Organic thin film transistor and method of manufacturing the same 有权
    有机薄膜晶体管及其制造方法

    公开(公告)号:US07952091B2

    公开(公告)日:2011-05-31

    申请号:US12347438

    申请日:2008-12-31

    IPC分类号: H01L51/00

    CPC分类号: H01L51/0545 H01L51/107

    摘要: Disclosed are an organic thin film transistor and a method of manufacturing the same. The organic thin film transistor includes a gate electrode, an insulating layer, an organic semiconductor layer, a protective layer, and source and drain electrodes. The insulating layer is on the gate electrode, and the organic semiconductor layer is on the insulating layer. The protective layer is on the organic semiconductor layer, and includes an electrode pattern part to expose the organic semiconductor layer. The source and drain electrodes are in the electrode pattern part and connected to the organic semiconductor layer.

    摘要翻译: 公开了一种有机薄膜晶体管及其制造方法。 有机薄膜晶体管包括栅电极,绝缘层,有机半导体层,保护层以及源极和漏极。 绝缘层位于栅电极上,有机半导体层位于绝缘层上。 保护层在有机半导体层上,并且包括用于暴露有机半导体层的电极图案部分。 源极和漏极在电极图案部分中并连接到有机半导体层。