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公开(公告)号:US07671963B2
公开(公告)日:2010-03-02
申请号:US11132415
申请日:2005-05-19
申请人: Bob Streefkerk , Henrikus Herman Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes M Zaal , Minne Cuperus
发明人: Bob Streefkerk , Henrikus Herman Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes M Zaal , Minne Cuperus
CPC分类号: G03F7/70341 , G03F7/70641 , G03F7/70783
摘要: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
摘要翻译: 浸没式光刻设备包括液体供应系统构件,其构造成在光刻设备的投影系统和基板之间的空间中容纳液体,液体供应系统构件补偿器被布置成补偿液体供应系统构件和衬底台之间的相互作用 。
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公开(公告)号:US20100091255A1
公开(公告)日:2010-04-15
申请号:US12647876
申请日:2009-12-28
申请人: Bob STREEFKERK , Henrikus Herman Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes M. Zaal , Minne Cuperus
发明人: Bob STREEFKERK , Henrikus Herman Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes M. Zaal , Minne Cuperus
CPC分类号: G03F7/70341 , G03F7/70641 , G03F7/70783
摘要: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
摘要翻译: 浸没式光刻设备包括液体供应系统构件,其构造成在光刻设备的投影系统和基板之间的空间中容纳液体,液体供应系统构件补偿器被布置成补偿液体供应系统构件和基板台之间的相互作用 。
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公开(公告)号:US08749754B2
公开(公告)日:2014-06-10
申请号:US12647876
申请日:2009-12-28
申请人: Bob Streefkerk , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes Maria Zaal , Minne Cuperus
发明人: Bob Streefkerk , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes Maria Zaal , Minne Cuperus
CPC分类号: G03F7/70341 , G03F7/70641 , G03F7/70783
摘要: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
摘要翻译: 浸没式光刻设备包括液体供应系统构件,其构造成在光刻设备的投影系统和基板之间的空间中容纳液体,液体供应系统构件补偿器被布置成补偿液体供应系统构件和衬底台之间的相互作用 。
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公开(公告)号:US08553201B2
公开(公告)日:2013-10-08
申请号:US12243291
申请日:2008-10-01
申请人: Bob Streefkerk , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes Maria Zaal , Minne Cuperus
发明人: Bob Streefkerk , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes Maria Zaal , Minne Cuperus
CPC分类号: G03F7/70341 , G03F7/70641 , G03F7/70783
摘要: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
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公开(公告)号:US07486381B2
公开(公告)日:2009-02-03
申请号:US10850451
申请日:2004-05-21
申请人: Bob Streefkerk , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes Maria Zaal , Minne Cuperus
发明人: Bob Streefkerk , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes Maria Zaal , Minne Cuperus
CPC分类号: G03F7/70341 , G03F7/70641 , G03F7/70783
摘要: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
摘要翻译: 浸没式光刻设备包括液体供应系统构件,其构造成在光刻设备的投影系统和基板之间的空间中容纳液体,液体供应系统构件补偿器被布置成补偿液体供应系统构件和衬底台之间的相互作用 。
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公开(公告)号:US20050270506A1
公开(公告)日:2005-12-08
申请号:US11132415
申请日:2005-05-19
申请人: Bob Streefkerk , Henrikus Cox , Christiaan Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes Zaal , Minne Cuperus
发明人: Bob Streefkerk , Henrikus Cox , Christiaan Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes Zaal , Minne Cuperus
IPC分类号: G03F7/20 , H01L21/027 , G03B27/42
CPC分类号: G03F7/70341 , G03F7/70641 , G03F7/70783
摘要: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
摘要翻译: 浸没式光刻设备包括液体供应系统构件,其构造成在光刻设备的投影系统和基板之间的空间中容纳液体,液体供应系统构件补偿器被布置成补偿液体供应系统构件和基板台之间的相互作用 。
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公开(公告)号:US20050259233A1
公开(公告)日:2005-11-24
申请号:US10850451
申请日:2004-05-21
申请人: Bob Streefkerk , Henrikus Herman Cox , Christiaan Hoogendam , Jeroen Johannes Sophia Mertens , Koen Jacobus Johannes Zaal , Minne Cuperus
发明人: Bob Streefkerk , Henrikus Herman Cox , Christiaan Hoogendam , Jeroen Johannes Sophia Mertens , Koen Jacobus Johannes Zaal , Minne Cuperus
IPC分类号: G03F7/20 , H01L21/027 , G03B27/42
CPC分类号: G03F7/70341 , G03F7/70641 , G03F7/70783
摘要: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
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公开(公告)号:US20090033905A1
公开(公告)日:2009-02-05
申请号:US12243291
申请日:2008-10-01
申请人: Bob STREEFKERK , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Mertens , Koen Jacobus Johannes Zaal , Minne Cuperus
发明人: Bob STREEFKERK , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Mertens , Koen Jacobus Johannes Zaal , Minne Cuperus
IPC分类号: G03D3/06
CPC分类号: G03F7/70341 , G03F7/70641 , G03F7/70783
摘要: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
摘要翻译: 浸没式光刻设备包括液体供应系统构件,其构造成在光刻设备的投影系统和基板之间的空间中容纳液体,液体供应系统构件补偿器被布置成补偿液体供应系统构件和衬底台之间的相互作用 。
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公开(公告)号:US07352440B2
公开(公告)日:2008-04-01
申请号:US11008576
申请日:2004-12-10
申请人: Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
发明人: Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
CPC分类号: G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
摘要: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
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公开(公告)号:US20120050740A1
公开(公告)日:2012-03-01
申请号:US13288714
申请日:2011-11-03
申请人: CHRISTIAAN ALEXANDER HOOGENDAM , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
发明人: CHRISTIAAN ALEXANDER HOOGENDAM , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
IPC分类号: G01B11/00
CPC分类号: G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
摘要: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
摘要翻译: 用于确定衬底的中心和卡盘中的凹陷的中心之间的偏移的方法包括向所述凹陷提供测试衬底,所述测试衬底具有小于所述凹陷的尺寸的尺寸,测量对准的位置 在凹陷期间测试基板的标记,并且从对准标记的位置确定基板的中心与凹陷的中心之间的偏移。
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