公开(公告)号：US20050175776A1

公开(公告)日：2005-08-11

申请号：US10986178

申请日：2004-11-12

申请人： Bod Streefkerk ,  Johannes Baselmans ,  Richard Bruls ,  Marcel Mathijs Dierichs ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Ronald Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Sengers

发明人： Bod Streefkerk ,  Johannes Baselmans ,  Richard Bruls ,  Marcel Mathijs Dierichs ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Ronald Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Sengers

IPC分类号： H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

摘要翻译： 公开了一种浸没式光刻投影装置，其中液体设置在装置的投影系统和基板之间。 为了防止在液体中形成气泡，有助于减少与液体接触后的元件上的残留物，就可以在设备的各种元件上使用液体和液体两层。

公开(公告)号：US20060109448A1

公开(公告)日：2006-05-25

申请号：US10995077

申请日：2004-11-23

申请人： Richard Bruls ,  Joseph Laganza ,  Tammo Uitterdijk ,  Herman Boom

发明人： Richard Bruls ,  Joseph Laganza ,  Tammo Uitterdijk ,  Herman Boom

IPC分类号： G03B27/62

CPC分类号： G03F1/64 ,  Y10T156/10

摘要： A method is provided to reduce differences between the way in which reticle chucking forces and gravity force act upon the reticle during use and during assembly of the pellicle, and to combine this with a similar reduction concerning pellicle chucking forces and gravity force acting upon the pellicle during bonding to the reticle and during quality control of the pellicle. The shape of the pellicle is measured for control in the same orientation of the pellicle with respect to gravity force as during use of the pellicle, and during bonding the pellicle and the reticle are held in the same way and in the same orientation as during control of the pellicle and use of the reticle in the lithographic apparatus, respectively.

公开(公告)号：US20050280789A1

公开(公告)日：2005-12-22

申请号：US11154951

申请日：2005-06-17

申请人： Richard Bruls ,  Orlando Cicilia ,  Tammo Uitterdijk ,  Herman Boom

发明人： Richard Bruls ,  Orlando Cicilia ,  Tammo Uitterdijk ,  Herman Boom

IPC分类号： G03B27/42 ,  G03F1/64 ,  G03F7/20 ,  H01L21/027

CPC分类号： G03F1/64 ,  G03F7/70783 ,  G03F7/70983

摘要： The mechanical properties of a pellicle frame and/or the pellicle are optimized so that the mechanical effect of the frame and pellicle on the mask shape in use is optimum for imaging. In particular the pellicle frame assembly may be arranged to be mechanically neutral, i.e., the mask adopts the same shape with pellicle attached as it would without the pellicle.

摘要翻译： 优化防护薄膜组件和/或防护薄膜组件的机械性能，使得框架和防护薄膜组件对使用中的掩模形状的机械效果对于成像是最佳的。 特别地，防护膜框架组件可以被布置为机械中性的，即，掩模采用相同的形状，并且防护薄膜组件附着在没有防护薄膜组件的情况下。

公开(公告)号：US20050140949A1

公开(公告)日：2005-06-30

申请号：US10835287

申请日：2004-04-30

申请人： Johannes Jasper ,  Marcel Baggen ,  Richard Bruls ,  Orlando Cicilia ,  Hendrikus Alphonsus Van Dijck ,  Gerardus Carolus Hofmans ,  Albert Johannes Jansen ,  Carlo Cornelis Luijten ,  Willem Pongers ,  Martijn Dominique Wehrens ,  Tammo Uitterdijk ,  Herman Boom ,  Marcel Johannes Louis Demarteau

发明人： Johannes Jasper ,  Marcel Baggen ,  Richard Bruls ,  Orlando Cicilia ,  Hendrikus Alphonsus Van Dijck ,  Gerardus Carolus Hofmans ,  Albert Johannes Jansen ,  Carlo Cornelis Luijten ,  Willem Pongers ,  Martijn Dominique Wehrens ,  Tammo Uitterdijk ,  Herman Boom ,  Marcel Johannes Louis Demarteau

IPC分类号： G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F7/70258 ,  G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/70308 ,  G03F7/70983

摘要： A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.

摘要翻译： 允许厚的防护薄膜具有非平坦形状，并且其形状的特征在于计算在曝光中应用的校正以补偿防护薄膜的光学效果。 防护薄膜组件可以在重力的影响下被安装成采用一维形状以使补偿更容易。

公开(公告)号：US20080049201A1

公开(公告)日：2008-02-28

申请号：US11802082

申请日：2007-05-18

申请人： Marco Stavenga ,  Hans Jansen ,  Peter Wanten ,  Johannes Leonardus Cuijpers ,  Raymond Beeren ,  Richard Bruls ,  Martinus Leenders ,  Anthonius Petrus De Jong

发明人： Marco Stavenga ,  Hans Jansen ,  Peter Wanten ,  Johannes Leonardus Cuijpers ,  Raymond Beeren ,  Richard Bruls ,  Martinus Leenders ,  Anthonius Petrus De Jong

IPC分类号： G03B27/52

CPC分类号： H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

摘要： An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.

摘要翻译： 公开了一种具有构造成清洁表面的兆声传感器的浸没式光刻投影设备和使用兆声波清洁浸没式光刻投影设备的表面的方法。

公开(公告)号：US07781029B2

公开(公告)日：2010-08-24

申请号：US11473068

申请日：2006-06-23

申请人： Matthew Lipson ,  Taras Shvets ,  Richard Bruls

发明人： Matthew Lipson ,  Taras Shvets ,  Richard Bruls

IPC分类号： B05D3/00

CPC分类号： G03F7/70341 ,  G02B1/105 ,  G02B1/14 ,  G02B5/003 ,  G02B7/025 ,  Y10T156/10

摘要： A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens element to leave behind an optically inert, light absorbing metal oxide film. A liquid shield coating is applied on top of the metal oxide coating. The two coating layers protect the wet lens element from liquid degradation when the side portion of the wet lens element is submerged into a liquid. In an embodiment, the wet lens element is an immersion lithography wet lens element and the liquid is an immersion lithography liquid.

摘要翻译： 提供了一种用于保护湿透镜元件免于液体劣化的方法。 所述方法包括将有机氧化金属化合物的薄涂层施加到湿透镜元件的侧部以留下光学惰性的光吸收金属氧化物膜。 将液体屏蔽涂层施加在金属氧化物涂层的顶部。 当湿透镜元件的侧部被浸入液体中时，两个涂层保护湿透镜元件免于液体劣化。 在一个实施例中，湿透镜元件是浸没光刻湿透镜元件，液体是浸没式光刻液。

公开(公告)号：US20060139607A1

公开(公告)日：2006-06-29

申请号：US11019535

申请日：2004-12-23

申请人： Richard Bruls ,  Robertus De Kruif

发明人： Richard Bruls ,  Robertus De Kruif

IPC分类号： G03B27/72

CPC分类号： G03F7/70641 ,  G03F7/70558 ,  G03F7/70575

摘要： Projection beam bandwidth contributes to optical proximity curve/Iso-Dense bias of a system, and can vary from one system to another. This can result in proximity mis-match between systems. The invention addresses this problem by providing a lithographic apparatus comprising: an illumination system for providing a projection beam of radiation; the projection beam with a pattern in its cross-section; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate, wherein there are provided means for modifying the projection beam bandwidth distribution.

摘要翻译： 投影光束带宽有助于系统的光学邻近曲线/等密度偏差，并且可以在一个系统之间变化。 这可能导致系统之间的接近错误匹配。 本发明通过提供一种光刻设备来解决这个问题，该光刻设备包括：用于提供投影辐射束的照明系统; 投影光束在其横截面上具有图案; 用于保持衬底的衬底台; 以及用于将图案化的光束投影到基板的目标部分上的投影系统，其中提供了用于修改投影光束带宽分布的装置。

公开(公告)号：US09195148B2

公开(公告)日：2015-11-24

申请号：US12834996

申请日：2010-07-13

申请人： Matthew Lipson ,  Taras Shvets ,  Richard Bruls

发明人： Matthew Lipson ,  Taras Shvets ,  Richard Bruls

IPC分类号： G03B27/52 ,  G03B27/54 ,  G03B27/32 ,  G03F7/20 ,  G02B1/10 ,  G02B5/00 ,  G02B7/02

CPC分类号： G03F7/70341 ,  G02B1/105 ,  G02B1/14 ,  G02B5/003 ,  G02B7/025 ,  Y10T156/10

摘要： A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens element to leave behind an optically inert, light absorbing metal oxide film. A liquid shield coating is applied on top of the metal oxide coating. The two coating layers protect the wet lens element from liquid degradation when the side portion of the wet lens element is submerged into a liquid. In an embodiment, the wet lens element is an immersion lithography wet lens element and the liquid is an immersion lithography liquid.

摘要翻译： 提供了一种用于保护湿透镜元件免于液体劣化的方法。 所述方法包括将有机氧化金属化合物的薄涂层施加到湿透镜元件的侧部以留下光学惰性的光吸收金属氧化物膜。 将液体屏蔽涂层施加在金属氧化物涂层的顶部。 当湿透镜元件的侧部被浸入液体中时，两个涂层保护湿透镜元件免于液体劣化。 在一个实施例中，湿透镜元件是浸没光刻湿透镜元件，液体是浸没式光刻液。

公开(公告)号：US20100271605A1

公开(公告)日：2010-10-28

申请号：US12834996

申请日：2010-07-13

申请人： Matthew Lipson ,  Taras Shvets ,  Richard Bruls

发明人： Matthew Lipson ,  Taras Shvets ,  Richard Bruls

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G02B1/105 ,  G02B1/14 ,  G02B5/003 ,  G02B7/025 ,  Y10T156/10

摘要： A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens element to leave behind an optically inert, light absorbing metal oxide film. A liquid shield coating is applied on top of the metal oxide coating. The two coating layers protect the wet lens element from liquid degradation when the side portion of the wet lens element is submerged into a liquid. In an embodiment, the wet lens element is an immersion lithography wet lens element and the liquid is an immersion lithography liquid.

摘要翻译： 提供了一种用于保护湿透镜元件免于液体劣化的方法。 所述方法包括将有机氧化金属化合物的薄涂层施加到湿透镜元件的侧部以留下光学惰性的光吸收金属氧化物膜。 将液体屏蔽涂层施加在金属氧化物涂层的顶部。 当湿透镜元件的侧部被浸入液体中时，两个涂层保护湿透镜元件免于液体劣化。 在一个实施例中，湿透镜元件是浸没光刻湿透镜元件，液体是浸没式光刻液。

公开(公告)号：US20060170899A1

公开(公告)日：2006-08-03

申请号：US11316346

申请日：2005-12-23

申请人： Robertus Cornelis De Kruif ,  Richard Bruls ,  Johannes Wilhelmus Teeuwsen ,  Erik Buurman

发明人： Robertus Cornelis De Kruif ,  Richard Bruls ,  Johannes Wilhelmus Teeuwsen ,  Erik Buurman

IPC分类号： G03B27/72

CPC分类号： G03F7/70625 ,  G03F7/70575

摘要： A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.