Method of fabricating dual-band type-II superlattice detectors based on p-B-p design
    1.
    发明授权
    Method of fabricating dual-band type-II superlattice detectors based on p-B-p design 有权
    基于p-B-p设计制造双频II型超晶格检测器的方法

    公开(公告)号:US09064992B1

    公开(公告)日:2015-06-23

    申请号:US14460173

    申请日:2014-08-14

    摘要: A dual-band infrared detector structure based on Type-II superlattices (T2SL) has been developed and experimentally validated. The structure according to the principles of the present invention is designed for a single Indium bump architecture and utilizes a T2SL barrier design that omits the traditional p-n junction region. The barrier design comprises multiple periods where each period comprises multiple monolayers doped P type. By selecting the composition, number of monolayers per period and number of periods, a transition region is created in the conduction band between a first absorber layer and a second absorber layer that allows operation at low biases (

    摘要翻译: 基于II型超晶格(T2SL)的双频带红外探测器结构已被开发和实验验证。 根据本发明的原理的结构被设计用于单个铟凸块结构并且利用省略传统p-n结区域的T2SL屏障设计。 屏障设计包括多个周期,其中每个周期包括多个单层掺杂的P型。 通过选择组合物,每个周期的单层数和周期数,在第一吸收层和第二吸收层之间的导带中产生过渡区,其允许以低偏差(对于两个带为<100mV)进行操作和显示 较长波段的暗电流密度可与使用单色检测器获得的相当。