METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR ARRAY PANEL
    2.
    发明申请
    METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR ARRAY PANEL 有权
    制造薄膜晶体管阵列的方法

    公开(公告)号:US20130260497A1

    公开(公告)日:2013-10-03

    申请号:US13567823

    申请日:2012-08-06

    IPC分类号: H01L33/08

    摘要: A method for manufacturing a thin film transistor array panel according to an exemplary embodiment of the present invention includes, forming a gate electrode, a gate insulating layer, and an oxide semiconductor layer on a substrate, first heat treating the substrate comprising the oxide semiconductor layer, forming a source electrode and a drain electrode on the oxide semiconductor layer, the source and drain electrodes facing each other, and forming a passivation layer on the source electrode and the drain electrode. The first heat treating is performed at more than 1 atmosphere and at most 50 or less atmospheres.

    摘要翻译: 根据本发明的示例性实施例的制造薄膜晶体管阵列面板的方法包括:在基板上形成栅电极,栅极绝缘层和氧化物半导体层,首先对包含氧化物半导体层 在所述氧化物半导体层上形成源电极和漏极,所述源极和漏极彼此相对,并且在所述源电极和所述漏电极上形成钝化层。 第一热处理在大于1个大气压和至多50个或更少的大气压下进行。