SEMICONDUCTOR DEVICE WITH FIN FIELD EFFECT TRANSISTORS
    2.
    发明申请
    SEMICONDUCTOR DEVICE WITH FIN FIELD EFFECT TRANSISTORS 审中-公开
    带有场效应晶体管的半导体器件

    公开(公告)号:US20160155741A1

    公开(公告)日:2016-06-02

    申请号:US14955107

    申请日:2015-12-01

    摘要: A semiconductor device includes a substrate with a NMOS region and a PMOS region, a device isolation layer on the substrate to define active fins, and gate patterns on the substrate to have a length direction crossing the active fins, wherein the device isolation layer includes diffusion brake regions between respective pairs of the active fins, the diffusion brake regions being disposed adjacent to each other in a width direction of the gate patterns, and wherein a width of the diffusion brake region in the NMOS region is different from a width of the diffusion brake region in the PMOS region.

    摘要翻译: 半导体器件包括具有NMOS区域和PMOS区域的衬底,衬底上的器件隔离层,以限定有源散热片,以及衬底上具有与激活鳍片相交的长度方向的栅极图案,其中器件隔离层包括扩散 在各对活动翅片之间的制动区域,扩散制动区域在栅极图案的宽度方向上彼此相邻设置,并且其中,NMOS区域中的扩散制动区域的宽度不同于扩散区域的宽度 制动区域。