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公开(公告)号：US11204548B2
公开(公告)日：2021-12-21
申请号：US15823338
申请日：2017-11-27
发明人： Kazuhiro Sato , Takafumi Miyaharu
摘要： An imprint apparatus forms a pattern of an imprint material in a shot area of the substrate using the mold, and includes a heating mechanism that changes a shape of the substrate by irradiating the shot area of the substrate with light, wherein the heating mechanism includes a plurality of optical modulators that forms an illuminance distribution in the shot area of the substrate, and light beams from the plurality of optical modulators illuminate mutually different areas of the shot area.
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公开(公告)号：US20170144363A1
公开(公告)日：2017-05-25
申请号：US15357740
申请日：2016-11-21
发明人： Kazuki Nakagawa , Kazuhiro Sato , Tsutomu Terao
CPC分类号： G03F7/0002 , B29C35/02 , B29C35/0288 , B29C35/08 , B29C35/0805 , B29C35/0888 , B29C59/02 , B29C59/022 , B29C59/026 , B29C59/16 , B29C2035/0827 , B29C2059/023 , B29K2105/24 , B29L2031/34 , G03F7/20 , G03F7/2002 , G03F7/2012 , G03F7/70558 , G03F7/70608 , G03F2007/2067
摘要： An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold includes a heating unit, a generation unit, and a measurement unit. The heating unit irradiates a region to be processed on the substrate with light to heat the region to be processed. The generation unit generates irradiation amount distribution data, which indicates an irradiation amount distribution of light with which the heating unit is to irradiate the region to be processed. The measurement unit measures information about absorption of the light by the region to be processed. The generation unit generates the irradiation amount distribution data by correcting, using a result of measurement by the measurement unit, temporary irradiation amount distribution data temporarily generated based on a shape of the region to be processed taken before the region to be processed is heated by the heating unit.
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3.发明授权Measuring apparatus, imprint system, measuring method, and device manufacturing method 有权测量装置，压印系统，测量方法和装置制造方法公开(公告)号：US08976370B2
公开(公告)日：2015-03-10
申请号：US14086132
申请日：2013-11-21
发明人： Takahiro Miyakawa , Kazuhiro Sato , Ken Minoda , Hideki Ina
CPC分类号： G01B11/0616 , G01B11/0633
摘要： An measuring apparatus includes: a storage unit configured to store a relationship, regarding an irradiation condition predetermined based on a correlation between a characteristic of each of beams of reflected light obtained from a plurality of patterns different from one another in a thickness of a residual layer in a recessed portion and the thickness of the residual layer of each of the plurality of patterns, between the characteristic of the reflected light from each pattern and the thickness of the residual layer of the pattern; and a processing unit configured to, based on a characteristic of reflected light from a pattern formed on a substrate irradiated with light under the irradiation condition and the relationship stored in the storage unit, obtain a thickness of a residual layer in a recessed portion of the pattern formed on the substrate.
摘要翻译： 一种测量装置，包括：存储单元，被配置为存储关于基于由残留层的厚度彼此不同的多个图案获得的每个反射光的特性之间的相关性所预定的照射条件的关系 在每个图案的反射光的特性和图案的残留层的厚度之间的凹陷部分中的每一个图案的残留层的厚度; 以及处理单元，被配置为基于在照射条件下照射光的基板上形成的图案的特性和存储在存储单元中的关系，获得残留层的厚度 图案形成在基板上。
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公开(公告)号：US20210223688A1
公开(公告)日：2021-07-22
申请号：US17147849
申请日：2021-01-13
发明人： Kazuhiro Sato , Hiroshi Sato
IPC分类号： G03F7/00
摘要： Provided is an imprint method of performing an imprint process including a contacting step of bringing a mold into contact with an imprint material on a substrate, a curing step of curing the imprint material, and a separating step of separating the mold from the cured imprint material. The method includes acquiring global alignment information, performing a pre-alignment measurement including moving, based on the acquired global alignment information, a second shot region to a measurement position at which a measurement device performs measurement, and measuring a first relative positional shift between the second shot region and the mold using the measurement device, and moving, based on the global alignment information and the measured first relative positional shift, a first shot region to an imprint position at which the imprint process is performed, and starting the contacting step.
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公开(公告)号：US20190240880A1
公开(公告)日：2019-08-08
申请号：US16381353
申请日：2019-04-11
CPC分类号： B29C43/58 , B29C35/0805 , B29C43/52 , B29C2035/0827 , B29C2043/5816 , B29C2043/585 , B29L2031/34 , G01B11/14 , G02B5/1861 , G02B5/20 , G02B27/141 , G03F7/0002 , H01L21/565
摘要： The present invention provides an imprint apparatus that molds an imprint material on a shot region of a substrate by using a mold, comprising a detection unit configured to detect first light with which a first mark of the mold and a second mark of the substrate are irradiated and measure a position deviation between the first mark and the second mark, a heating unit configured to irradiate the substrate with second light for heating the substrate and deforming the shot region, and a control unit configured to control alignment between the mold and the substrate based on the position deviation, wherein a parameter of the detection unit or the heating unit is set not to detect the second light by the detection unit while the first light is detected and the substrate is irradiated with the second light.
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公开(公告)号：US20180149969A1
公开(公告)日：2018-05-31
申请号：US15823338
申请日：2017-11-27
发明人： Kazuhiro Sato , Takafumi Miyaharu
CPC分类号： G03F7/0002 , B29C37/0028 , B29C2037/0046 , B82Y40/00
摘要： An imprint apparatus forms a pattern of an imprint material in a shot area of the substrate using the mold, and includes a heating mechanism that changes a shape of the substrate by irradiating the shot area of the substrate with light, wherein the heating mechanism includes a plurality of optical modulators that forms an illuminance distribution in the shot area of the substrate, and light beams from the plurality of optical modulators illuminate mutually different areas of the shot area.
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公开(公告)号：US10919195B2
公开(公告)日：2021-02-16
申请号：US16381353
申请日：2019-04-11
IPC分类号： B29C43/58 , G03F7/00 , B29C35/08 , B29C43/52 , G01B11/14 , G02B5/18 , G02B27/14 , H01L21/56 , B29L31/34 , G02B5/20
摘要： The present invention provides an imprint apparatus that molds an imprint material on a shot region of a substrate by using a mold, comprising a detection unit configured to detect first light with which a first mark of the mold and a second mark of the substrate are irradiated and measure a position deviation between the first mark and the second mark, a heating unit configured to irradiate the substrate with second light for heating the substrate and deforming the shot region, and a control unit configured to control alignment between the mold and the substrate based on the position deviation, wherein a parameter of the detection unit or the heating unit is set not to detect the second light by the detection unit while the first light is detected and the substrate is irradiated with the second light.
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公开(公告)号：US10761316B2
公开(公告)日：2020-09-01
申请号：US15472659
申请日：2017-03-29
摘要： The present invention provides an illumination apparatus which performs oblique illumination, the apparatus including a first optical element formed with an array of a plurality of optical components each configured to generate a point light source, and a second optical element configured to receive light from the first optical element and form an illumination region, with a power thereof in one direction being different from a power thereof in a direction perpendicular to the one direction, wherein at least one of the first optical element and the second optical element has a rotation angle about an optical axis thereof so as to perform compensate for distortion of the illumination region by the oblique illumination.
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公开(公告)号：US10372034B2
公开(公告)日：2019-08-06
申请号：US15357740
申请日：2016-11-21
发明人： Kazuki Nakagawa , Kazuhiro Sato , Tsutomu Terao
IPC分类号： B29C59/16 , G03F7/00 , B29K105/24 , B29L31/34 , B29C59/02 , B29C35/08 , B29C35/02 , G03F7/20
摘要： An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold includes a heating unit, a generation unit, and a measurement unit. The heating unit irradiates a region to be processed on the substrate with light to heat the region to be processed. The generation unit generates irradiation amount distribution data, which indicates an irradiation amount distribution of light with which the heating unit is to irradiate the region to be processed. The measurement unit measures information about absorption of the light by the region to be processed. The generation unit generates the irradiation amount distribution data by correcting, using a result of measurement by the measurement unit, temporary irradiation amount distribution data temporarily generated based on a shape of the region to be processed taken before the region to be processed is heated by the heating unit.
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公开(公告)号：US10300640B2
公开(公告)日：2019-05-28
申请号：US15100666
申请日：2015-01-20
IPC分类号： B29C43/58 , G03F7/00 , B29C35/08 , B29C43/52 , G01B11/14 , G02B5/18 , G02B27/14 , H01L21/56 , B29L31/34 , G02B5/20
摘要： The present invention provides an imprint apparatus that molds an imprint material on a shot region of a substrate by using a mold, comprising a detection unit configured to detect first light with which a first mark of the mold and a second mark of the substrate are irradiated and measure a position deviation between the first mark and the second mark, a heating unit configured to irradiate the substrate with second light for heating the substrate and deforming the shot region, and a control unit configured to control alignment between the mold and the substrate based on the position deviation, wherein a parameter of the detection unit or the heating unit is set not to detect the second light by the detection unit while the first light is detected and the substrate is irradiated with the second light.
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