公开(公告)号：US20130242279A1

公开(公告)日：2013-09-19

申请号：US13871366

申请日：2013-04-26

Applicant: CARL ZEISS SMT GMBH

Inventor： Alexander EPPLE ,  Vladimir KAMENOV ,  Toralf GRUNER ,  Thomas SCHICKETANZ

IPC: G02B17/08

CPC classification number: G02B17/0892 ,  G02B1/11 ,  G02B17/08 ,  G02B17/0896 ,  G03F7/70 ,  G03F7/70225 ,  G03F7/70275

Abstract: Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.1% for an operating wavelength of between 150 nm and 250 nm and for an angle-of-incidence range of between 0° and 30°. As an alternative or in addition, all the surfaces of the lenses of the second partial objective are configured such that the deviation from the marginal ray concentricity is greater than or equal to 20°.

公开(公告)号：US20130201464A1

公开(公告)日：2013-08-08

申请号：US13731775

申请日：2012-12-31

Applicant: Carl Zeiss SMT GmbH

Inventor： Alexander EPPLE ,  Heiko FELDMANN ,  Hans-Juergen ROSTALSKI

IPC: G02B17/08 ,  G03B27/54

CPC classification number: G03F7/70216 ,  G02B13/143 ,  G02B13/146 ,  G02B17/08 ,  G02B17/0892 ,  G02B27/0012 ,  G02B27/0025 ,  G03B27/54 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70375 ,  G03F7/706

Abstract: An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength λ includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion λni=ni(λ0)−ni(λ0+1 pm) for a wavelength variation of 1 pm from a wavelength λ0. The objective satisfies the relation  ∑ i = 1 N  Δ   n i  ( s i - d i )  λ 0  NA 4 ≤ A for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected.

Abstract translation: 具有多个光学元件的物镜被布置成将来自物场的图案成像到图像侧数值孔径NA> 0.8处的图像场，其中波长λ波长带的电磁辐射包括数量N的折射光学元件 ，每个度数光学元件i由具有归一化的光学色散lambdani = ni（λ0）-ni（λ0+1μm））的透明材料制成，用于波长λ0的波长变化为1μm。 目标满足关系Σithe the the the the the the the the the the the the the the the the the the the the the the the the the 物体场，其中si是具有轴向厚度di的第i个光学光学元件中的射线的几何路径长度，并且在物体的所有光度光学元件上延伸。 如果A = 0.2或更低，则反射色素得到充分校正。